Thomas Hoffmann
Impact in
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- Assembly Line Balancing Optimization
- Scheduling and Optimization Algorithms
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- Semiconductor materials and devices
- Advancements in Semiconductor Devices and Circuit Design
- Integrated Circuits and Semiconductor Failure Analysis
- Advancements in Photolithography Techniques
Papers in
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- Semiconductor materials and devices 72
- Advancements in Semiconductor Devices and Circuit Design 60
- Integrated Circuits and Semiconductor Failure Analysis 34
- Advancements in Photolithography Techniques 19
- Silicon and Solar Cell Technologies 18
- Ferroelectric and Negative Capacitance Devices 10
- Co-authors
- Hella‐Christin Scheer (5 shared papers)S. Biesemans (33 shared papers)H. Schulz (5 shared papers)J. Seekamp (3 shared papers)S. Zankovych (3 shared papers)M. Jurczak (15 shared papers)Gary D. Scudder (6 shared papers)Schahram Dustdar (2 shared papers)
- Journals
- Microelectronic Engineering (9 papers)Solid-State Electronics (5 papers)International Journal of Production Research (5 papers)IEEE Electron Device Letters (5 papers)IEEE Transactions on Electron Devices (5 papers)
- Partner nations
- BelgiumGermanyUnited States
In The Last Decade
Thomas Hoffmann
164 papers receiving 3.1k citations
Peers
Comparison fields: 5 of 127
- Industrial and Manufacturing Engineering 409
- Electrical and Electronic Engineering 1.9k
- Biomedical Engineering 1.0k
- Atomic and Molecular Physics, and Optics 441
- Surfaces, Coatings and Films 63
Countries citing papers authored by Thomas Hoffmann
This map shows the geographic impact of Thomas Hoffmann's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Thomas Hoffmann with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Thomas Hoffmann more than expected).
Fields of papers citing papers by Thomas Hoffmann
This network shows the impact of papers produced by Thomas Hoffmann. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Thomas Hoffmann. The network helps show where Thomas Hoffmann may publish in the future.
Co-authors
The 25 scholars most cited alongside Thomas Hoffmann, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 175 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 2004 | 378 | |
| 2 | 2001 | 152 | |
| 3 | 1963 | 144 | |
| 4 | 2003 | 133 | |
| 5 | 1998 | 127 | |
| 6 | 2009 | 115 | |
| 7 | 2004 | 114 | |
| 8 | 1992 | 107 | |
| 9 | 2010 | 99 | |
| 10 | 2010 | 81 | |
| 11 | 2010 | 67 | |
| 12 | 2002 | 61 | |
| 13 | 2000 | 50 | |
| 14 | 2004 | 49 | |
| 15 | 2010 | 49 | |
| 16 | 2011 | 49 | |
| 17 | 1990 | 49 | |
| 18 | 2009 | 46 | |
| 19 | 2004 | 45 | |
| 20 | 2005 | 45 |
About Thomas Hoffmann
Thomas Hoffmann is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering, Atomic and Molecular Physics, and Optics, Mechanical Engineering and Industrial and Manufacturing Engineering, having authored 175 papers that have together received 3.2k indexed citations. Recurring topics across this work include Semiconductor materials and devices (72 papers), Advancements in Semiconductor Devices and Circuit Design (60 papers), Integrated Circuits and Semiconductor Failure Analysis (34 papers), Advancements in Photolithography Techniques (19 papers), Silicon and Solar Cell Technologies (18 papers), Semiconductor materials and interfaces (13 papers), Scheduling and Optimization Algorithms (11 papers) and Ferroelectric and Negative Capacitance Devices (10 papers). The work is most often cited by research in Industrial and Manufacturing Engineering (409 citations), Electrical and Electronic Engineering (1.9k citations), Biomedical Engineering (1.0k citations), Atomic and Molecular Physics, and Optics (441 citations) and Surfaces, Coatings and Films (63 citations). Thomas Hoffmann has collaborated with scholars based in Belgium, Germany and United States. Frequent co-authors include Hella‐Christin Scheer, S. Biesemans, H. Schulz, J. Seekamp, S. Zankovych, M. Jurczak, Gary D. Scudder, Schahram Dustdar, A. Veloso and P. Absil. Their work appears in journals such as Microelectronic Engineering, Solid-State Electronics, International Journal of Production Research, IEEE Electron Device Letters and IEEE Transactions on Electron Devices.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.