J. Demarest
Impact in
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- Copper Interconnects and Reliability
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- Semiconductor materials and devices
- Advancements in Semiconductor Devices and Circuit Design
- Integrated Circuits and Semiconductor Failure Analysis
- Electronic Packaging and Soldering Technologies
- Electrodeposition and Electroless Coatings
Papers in
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- Semiconductor materials and devices 28
- Electronic Packaging and Soldering Technologies 12
- Integrated Circuits and Semiconductor Failure Analysis 10
- Advancements in Semiconductor Devices and Circuit Design 7
- Electrodeposition and Electroless Coatings 6
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- Copper Interconnects and Reliability 26
- Co-authors
- P. McLaughlin (8 shared papers)R. Hull (4 shared papers)Oleg Gluschenkov (5 shared papers)Juntao Li (7 shared papers)James J. Kelly (10 shared papers)H. Shobha (9 shared papers)Bala Haran (5 shared papers)Jody Fronheiser (3 shared papers)
- Journals
- Journal of The Electrochemical Society (4 papers)IEEE Electron Device Letters (1 paper)Microscopy and Microanalysis (1 paper)AIP Advances (1 paper)Applied Physics Letters (1 paper)
- Partner nations
- United StatesGermanyJapan
In The Last Decade
J. Demarest
33 papers receiving 380 citations
Peers
Comparison fields: 5 of 38
- Electronic, Optical and Magnetic Materials 156
- Electrical and Electronic Engineering 338
- Atomic and Molecular Physics, and Optics 87
- Surfaces, Coatings and Films 17
- Biomedical Engineering 78
Countries citing papers authored by J. Demarest
This map shows the geographic impact of J. Demarest's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by J. Demarest with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites J. Demarest more than expected).
Fields of papers citing papers by J. Demarest
This network shows the impact of papers produced by J. Demarest. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by J. Demarest. The network helps show where J. Demarest may publish in the future.
Co-authors
The 25 scholars most cited alongside J. Demarest, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 41 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 2016 | 51 | |
| 2 | 1998 | 48 | |
| 3 | 2007 | 31 | |
| 4 | 2016 | 31 | |
| 5 | 2019 | 24 | |
| 6 | 2018 | 21 | |
| 7 | 2009 | 20 | |
| 8 | 2017 | 19 | |
| 9 | 2018 | 18 | |
| 10 | 2011 | 17 | |
| 11 | 2012 | 16 | |
| 12 | 2009 | 14 | |
| 13 | 2000 | 13 | |
| 14 | 2020 | 13 | |
| 15 | 2020 | 10 | |
| 16 | 2018 | 9 | |
| 17 | 2019 | 9 | |
| 18 | 2017 | 9 | |
| 19 | 2013 | 6 | |
| 20 | 2007 | 5 |
About J. Demarest
J. Demarest is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Atomic and Molecular Physics, and Optics, Biomedical Engineering and Materials Chemistry, having authored 41 papers that have together received 415 indexed citations. Recurring topics across this work include Semiconductor materials and devices (28 papers), Copper Interconnects and Reliability (26 papers), Electronic Packaging and Soldering Technologies (12 papers), Integrated Circuits and Semiconductor Failure Analysis (10 papers), Advancements in Semiconductor Devices and Circuit Design (7 papers), Electrodeposition and Electroless Coatings (6 papers), Semiconductor materials and interfaces (4 papers) and Metal and Thin Film Mechanics (3 papers). The work is most often cited by research in Electronic, Optical and Magnetic Materials (156 citations), Electrical and Electronic Engineering (338 citations), Atomic and Molecular Physics, and Optics (87 citations), Surfaces, Coatings and Films (17 citations) and Biomedical Engineering (78 citations). J. Demarest has collaborated with scholars based in United States, Germany and Japan. Frequent co-authors include P. McLaughlin, R. Hull, Oleg Gluschenkov, Juntao Li, James J. Kelly, H. Shobha, Bala Haran, Jody Fronheiser, C.T. Reimann and Sven Oscarsson. Their work appears in journals such as Journal of The Electrochemical Society, IEEE Electron Device Letters, Microscopy and Microanalysis, AIP Advances and Applied Physics Letters.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.