C. Cabral

6.1k citations
155 papers · 5.0k · 1 hit paper · h-index 34

Impact in

Papers in

C. Cabral

152 papers receiving 4.7k citations

C. Cabral's Hit Papers

Tantalum as a diffusion barrier between copper and silicon: Failure mechanism and effect of nitrogen additions 1992 · 401 citations
4010+11+22Years since publication100200300400

Peers

C. Cabral
Comparison fields: 5 of 64
  • Electronic, Optical and Magnetic Materials 1.7k
  • Electrical and Electronic Engineering 3.9k
  • Atomic and Molecular Physics, and Optics 1.9k
  • Mechanics of Materials 938
  • Materials Chemistry 1.7k
Replace M. Eizenberg with:
M. Eizenberg Israel
Kevin R. Coffey United States
A. J. Kellock United States
M. Wittmer United States
Akira KINBARA Japan
F. M. d’Heurle United States
S. Nakahara United States
T. W. Sigmon United States
J. C. Bravman United States
Peter Mascher Canada
C. Cabral relative to M. Eizenberg Israel M. Eizenberg's profile →
Citations per field
00.5×1.7×
M. Eizenberg · 1×
Citations per year

Countries citing papers authored by C. Cabral

Since Specialization
Citations

This map shows the geographic impact of C. Cabral's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by C. Cabral with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites C. Cabral more than expected).

Fields of papers citing papers by C. Cabral

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by C. Cabral. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by C. Cabral. The network helps show where C. Cabral may publish in the future.

Co-authors

The 25 scholars most cited alongside C. Cabral, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with C. Cabral Line = papers co-authored together C. Cabral links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown

Showing the 20 most-cited of 155 papers — load more, or switch the sort, to bring in the rest.

#Work
1
Tantalum as a diffusion barrier between copper and silicon: Failure mechanism and effect of nitrogen additions
Hit paper breakdown →
1992401
2 2003351
3 1999324
4 2003277
5 2006170
6 1999170
7 1992157
8 2006119
9 2007110
10 2002110
11 2006104
12 1995103
13 1993100
14 200390
15 200982
16 200779
17 200072
18 200172
19 199267
20 199565

About C. Cabral

C. Cabral is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, Materials Chemistry and Mechanics of Materials, having authored 155 papers that have together received 5.0k indexed citations. Recurring topics across this work include Semiconductor materials and devices (67 papers), Semiconductor materials and interfaces (65 papers), Copper Interconnects and Reliability (48 papers), Metal and Thin Film Mechanics (24 papers), Intermetallics and Advanced Alloy Properties (21 papers), Silicon and Solar Cell Technologies (16 papers), Integrated Circuits and Semiconductor Failure Analysis (15 papers) and Electronic Packaging and Soldering Technologies (15 papers). The work is most often cited by research in Electronic, Optical and Magnetic Materials (1.7k citations), Electrical and Electronic Engineering (3.9k citations), Atomic and Molecular Physics, and Optics (1.9k citations), Mechanics of Materials (938 citations) and Materials Chemistry (1.7k citations). C. Cabral has collaborated with scholars based in United States, Germany and Sweden. Frequent co-authors include J. M. E. Harper, C. Lavoie, F. M. d’Heurle, Katayun Barmak, Christophe Detavernier, L. A. Clevenger, Jean Jordan‐Sweet, M. Copel, K. L. Saenger and Karen Holloway. Their work appears in journals such as Journal of Applied Physics, Applied Physics Letters, Journal of materials research/Pratt's guide to venture capital sources, Thin Solid Films and Journal of Vacuum Science & Technology A Vacuum Surfaces and Films.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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