C. Cabral
Impact in
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- Copper Interconnects and Reliability
- General Materials Science top 10%
Papers in
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- Copper Interconnects and Reliability 10
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- Semiconductor materials and devices 8
- Advancements in Semiconductor Devices and Circuit Design 5
- Electrodeposition and Electroless Coatings 2
- Co-authors
- S. M. Rossnagel (2 shared papers)Ismail Cevdet Noyan (2 shared papers)J. M. E. Harper (4 shared papers)Christophe Detavernier (1 shared paper)C. Lavoie (3 shared papers)Karen Holloway (1 shared paper)David A. Smith (1 shared paper)Robert G. Schad (1 shared paper)
- Journals
- Journal of Applied Physics (3 papers)Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (1 paper)IEEE Circuits and Devices Magazine (1 paper)Symposium on VLSI Technology (1 paper)Proceedings of the International Power Modulator Symposium and High Voltage Workshop (1 paper)
- Partner nations
- United States
In The Last Decade
C. Cabral
20 papers receiving 505 citations
Peers
Comparison fields: 5 of 21
- Electronic, Optical and Magnetic Materials 137
- General Materials Science 18
- Electrical and Electronic Engineering 252
- Mechanics of Materials 71
- Atomic and Molecular Physics, and Optics 83
Countries citing papers authored by C. Cabral
This map shows the geographic impact of C. Cabral's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by C. Cabral with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites C. Cabral more than expected).
Fields of papers citing papers by C. Cabral
This network shows the impact of papers produced by C. Cabral. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by C. Cabral. The network helps show where C. Cabral may publish in the future.
Co-authors
The 25 scholars most cited alongside C. Cabral, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 21 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 2002 | 148 | |
| 2 | 2003 | 67 | |
| 3 | 2003 | 65 | |
| 4 | 2002 | 55 | |
| 5 | 1992 | 45 | |
| 6 | 1998 | 28 | |
| 7 | 2004 | 22 | |
| 8 | 2003 | 19 | |
| 9 | 2005 | 14 | |
| 10 | 2010 | 13 | |
| 11 | 1999 | 11 | |
| 12 | 1999 | 11 | |
| 13 | 2002 | 9 | |
| 14 | 1991 | 8 | |
| 15 | 2011 | 4 | |
| 16 | 2003 | 3 | |
| 17 | 2003 | 2 | |
| 18 | 2000 | 1 | |
| 19 | 2001 | 1 | |
| 20 | 2003 | 1 |
About C. Cabral
C. Cabral is a scholar working on Electronic, Optical and Magnetic Materials, Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics, General Materials Science and Nuclear Energy and Engineering, having authored 21 papers that have together received 527 indexed citations. Recurring topics across this work include Copper Interconnects and Reliability (10 papers), Semiconductor materials and devices (8 papers), Advancements in Semiconductor Devices and Circuit Design (5 papers), Semiconductor materials and interfaces (4 papers), Electrodeposition and Electroless Coatings (2 papers) and Metallurgical and Alloy Processes (1 paper). The work is most often cited by research in Electronic, Optical and Magnetic Materials (137 citations), General Materials Science (18 citations), Electrical and Electronic Engineering (252 citations), Mechanics of Materials (71 citations) and Atomic and Molecular Physics, and Optics (83 citations). C. Cabral has collaborated with scholars based in United States. Frequent co-authors include S. M. Rossnagel, Ismail Cevdet Noyan, J. M. E. Harper, Christophe Detavernier, C. Lavoie, Karen Holloway, David A. Smith, Robert G. Schad, Philip M. Rice and Robert B. Beyers. Their work appears in journals such as Journal of Applied Physics, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, IEEE Circuits and Devices Magazine, Symposium on VLSI Technology and Proceedings of the International Power Modulator Symposium and High Voltage Workshop.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.