Matthew Sendelbach
Impact in
- Surfaces, Coatings and Films top 2%
- Optical Coatings and Gratings
- Electron and X-Ray Spectroscopy Techniques
Papers in
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- Advancements in Photolithography Techniques 15
- Integrated Circuits and Semiconductor Failure Analysis 12
- Semiconductor materials and devices 8
- 3D IC and TSV technologies 4
-
- Optical Coatings and Gratings 28
- Co-authors
- Charles N. Archie (5 shared papers)Alok Vaid (20 shared papers)Cornel Bozdog (14 shared papers)Igor Turovets (4 shared papers)A.G. Muñoz (2 shared papers)John A. Allgair (4 shared papers)S. Zangooie (5 shared papers)Paul K. Isbester (7 shared papers)
- Journals
- Journal of Micro/Nanolithography MEMS and MOEMS (4 papers)IEEE Transactions on Semiconductor Manufacturing (1 paper)Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (31 papers)
- Partner nations
- United StatesJapanGermany
In The Last Decade
Matthew Sendelbach
41 papers receiving 358 citations
Peers
Comparison fields: 5 of 28
- Surfaces, Coatings and Films 210
- Structural Biology 11
- Computational Mechanics 92
- Electrical and Electronic Engineering 248
- Biomedical Engineering 142
Countries citing papers authored by Matthew Sendelbach
This map shows the geographic impact of Matthew Sendelbach's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Matthew Sendelbach with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Matthew Sendelbach more than expected).
Fields of papers citing papers by Matthew Sendelbach
This network shows the impact of papers produced by Matthew Sendelbach. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Matthew Sendelbach. The network helps show where Matthew Sendelbach may publish in the future.
Co-authors
The 25 scholars most cited alongside Matthew Sendelbach, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 45 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 2011 | 51 | |
| 2 | 2003 | 49 | |
| 3 | 2004 | 27 | |
| 4 | 2006 | 20 | |
| 5 | 2004 | 19 | |
| 6 | 2010 | 18 | |
| 7 | 2012 | 17 | |
| 8 | 2004 | 15 | |
| 9 | 2013 | 14 | |
| 10 | 2014 | 14 | |
| 11 | 2011 | 14 | |
| 12 | 2017 | 13 | |
| 13 | 2019 | 9 | |
| 14 | 2013 | 9 | |
| 15 | 2014 | 9 | |
| 16 | 2008 | 8 | |
| 17 | 2009 | 7 | |
| 18 | 2016 | 7 | |
| 19 | 2008 | 6 | |
| 20 | 2005 | 6 |
About Matthew Sendelbach
Matthew Sendelbach is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films, Biomedical Engineering, Computational Mechanics and Mechanical Engineering, having authored 45 papers that have together received 394 indexed citations. Recurring topics across this work include Optical Coatings and Gratings (28 papers), Advancements in Photolithography Techniques (15 papers), Integrated Circuits and Semiconductor Failure Analysis (12 papers), Surface Roughness and Optical Measurements (12 papers), Advanced Surface Polishing Techniques (10 papers), Advanced Measurement and Metrology Techniques (8 papers), Semiconductor materials and devices (8 papers) and 3D IC and TSV technologies (4 papers). The work is most often cited by research in Surfaces, Coatings and Films (210 citations), Structural Biology (11 citations), Computational Mechanics (92 citations), Electrical and Electronic Engineering (248 citations) and Biomedical Engineering (142 citations). Matthew Sendelbach has collaborated with scholars based in United States, Japan and Germany. Frequent co-authors include Charles N. Archie, Alok Vaid, Cornel Bozdog, Igor Turovets, A.G. Muñoz, John A. Allgair, S. Zangooie, Paul K. Isbester, Narender Rana and Byung-Cheol Kang. Their work appears in journals such as Journal of Micro/Nanolithography MEMS and MOEMS, IEEE Transactions on Semiconductor Manufacturing and Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.