David Hellin
Impact in
- Radiation top 5%
- X-ray Spectroscopy and Fluorescence Analysis
- Surfaces, Coatings and Films top 10%
- Electron and X-Ray Spectroscopy Techniques
Papers in
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- Semiconductor materials and devices 16
- Integrated Circuits and Semiconductor Failure Analysis 11
- Advancements in Photolithography Techniques 9
- Thin-Film Transistor Technologies 4
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- Electron and X-Ray Spectroscopy Techniques 11
- Co-authors
- Stefan De Gendt (17 shared papers)Chris Vinckier (11 shared papers)Jens Rip (11 shared papers)Paul Mertens (6 shared papers)Thierry Conard (5 shared papers)Matty Caymax (5 shared papers)Marc Heyns (4 shared papers)Werner Boullart (7 shared papers)
- Journals
- Spectrochimica Acta Part B Atomic Spectroscopy (4 papers)Applied Physics Letters (2 papers)Journal of Micro/Nanolithography MEMS and MOEMS (2 papers)Journal of Analytical Atomic Spectrometry (2 papers)Materials Science in Semiconductor Processing (1 paper)
- Partner nations
- BelgiumUnited StatesNetherlands
In The Last Decade
David Hellin
33 papers receiving 364 citations
Peers
Comparison fields: 5 of 46
- Radiation 130
- Surfaces, Coatings and Films 89
- Electrical and Electronic Engineering 243
- Analytical Chemistry 33
- Archeology 26
Countries citing papers authored by David Hellin
This map shows the geographic impact of David Hellin's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by David Hellin with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites David Hellin more than expected).
Fields of papers citing papers by David Hellin
This network shows the impact of papers produced by David Hellin. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by David Hellin. The network helps show where David Hellin may publish in the future.
Co-authors
The 25 scholars most cited alongside David Hellin, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 34 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 2004 | 43 | |
| 2 | 2006 | 43 | |
| 3 | 2005 | 41 | |
| 4 | 2006 | 39 | |
| 5 | 2007 | 30 | |
| 6 | 2004 | 26 | |
| 7 | 2011 | 24 | |
| 8 | 2005 | 19 | |
| 9 | 2005 | 17 | |
| 10 | 2003 | 9 | |
| 11 | 2005 | 8 | |
| 12 | 2013 | 8 | |
| 13 | 2014 | 7 | |
| 14 | 2005 | 7 | |
| 15 | 2015 | 7 | |
| 16 | 2013 | 6 | |
| 17 | 2016 | 5 | |
| 18 | 2006 | 4 | |
| 19 | 2009 | 4 | |
| 20 | 2017 | 4 |
About David Hellin
David Hellin is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films, Radiation, Computational Mechanics and Biomedical Engineering, having authored 34 papers that have together received 376 indexed citations. Recurring topics across this work include Semiconductor materials and devices (16 papers), Electron and X-Ray Spectroscopy Techniques (11 papers), Integrated Circuits and Semiconductor Failure Analysis (11 papers), X-ray Spectroscopy and Fluorescence Analysis (10 papers), Advancements in Photolithography Techniques (9 papers), Thin-Film Transistor Technologies (4 papers), Analytical chemistry methods development (3 papers) and Ion-surface interactions and analysis (3 papers). The work is most often cited by research in Radiation (130 citations), Surfaces, Coatings and Films (89 citations), Electrical and Electronic Engineering (243 citations), Analytical Chemistry (33 citations) and Archeology (26 citations). David Hellin has collaborated with scholars based in Belgium, United States and Netherlands. Frequent co-authors include Stefan De Gendt, Chris Vinckier, Jens Rip, Paul Mertens, Thierry Conard, Matty Caymax, Marc Heyns, Werner Boullart, Annelies Delabie and Wim Fyen. Their work appears in journals such as Spectrochimica Acta Part B Atomic Spectroscopy, Applied Physics Letters, Journal of Micro/Nanolithography MEMS and MOEMS, Journal of Analytical Atomic Spectrometry and Materials Science in Semiconductor Processing.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.