David Hellin

453 citations
36 papers · 392 · h-index 10

Impact in

Papers in

    • X-ray Spectroscopy and Fluorescence Analysis 14
    • Semiconductor materials and devices 14
    • Advancements in Photolithography Techniques 12
    • Plasma Diagnostics and Applications 3
    • Advancements in Semiconductor Devices and Circuit Design 3

David Hellin

35 papers receiving 377 citations

Peers

David Hellin
Comparison fields: 5 of 30
  • Radiation 136
  • Surfaces, Coatings and Films 32
  • Electrical and Electronic Engineering 200
  • Analytical Chemistry 22
  • Electronic, Optical and Magnetic Materials 14
Replace Yoshihiko Nakata with:
Yoshihiko Nakata Japan
Stephan Brunken Germany
Jiro Ryuta Japan
Bart Onsia Belgium
Solène Béchu France
Wei Qu China
Ralf Jonczyk United States
M. Zerrouki France
Donggun Lee South Korea
Apostolos Panagiotopoulos Greece
David Hellin relative to Yoshihiko Nakata Japan Yoshihiko Nakata's profile →
Citations per field
00.5×5×11.3×
Yoshihiko Nakata · 1×
Citations per year

Countries citing papers authored by David Hellin

Since Specialization
Citations

This map shows the geographic impact of David Hellin's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by David Hellin with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites David Hellin more than expected).

Fields of papers citing papers by David Hellin

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by David Hellin. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by David Hellin. The network helps show where David Hellin may publish in the future.

Co-authors

The 25 scholars most cited alongside David Hellin, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with David Hellin Line = papers co-authored together David Hellin links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown

Showing the 20 most-cited of 36 papers — load more, or switch the sort, to bring in the rest.

#Work
1 200645
2 200443
3 200542
4 200639
5 200731
6 200425
7 201124
8 200519
9 200517
10 200310
11 200510
12 20058
13 20138
14 20148
15 20157
16 20167
17 20136
18 20095
19 20034
20 20064

About David Hellin

David Hellin is a scholar working on Radiation, Electrical and Electronic Engineering, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials and Atomic and Molecular Physics, and Optics, having authored 36 papers that have together received 392 indexed citations. Recurring topics across this work include Semiconductor materials and devices (14 papers), X-ray Spectroscopy and Fluorescence Analysis (14 papers), Advancements in Photolithography Techniques (12 papers), Electron and X-Ray Spectroscopy Techniques (5 papers), Plasma Diagnostics and Applications (3 papers), Advancements in Semiconductor Devices and Circuit Design (3 papers), Semiconductor materials and interfaces (3 papers) and Copper Interconnects and Reliability (2 papers). The work is most often cited by research in Radiation (136 citations), Surfaces, Coatings and Films (32 citations), Electrical and Electronic Engineering (200 citations), Analytical Chemistry (22 citations) and Electronic, Optical and Magnetic Materials (14 citations). David Hellin has collaborated with scholars based in Belgium, United States and Netherlands. Frequent co-authors include Stefan De Gendt, Chris Vinckier, Jens Rip, Paul Mertens, Thierry S. Conard, Matty R. Caymax, Annelies Delabie, Werner Boullart, Marc Heyns and Wim Fyen. Their work appears in journals such as Spectrochimica Acta Part B Atomic Spectroscopy, Applied Physics Letters, Journal of Analytical Atomic Spectrometry, Materials Science in Semiconductor Processing and Japanese Journal of Applied Physics.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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