Bart Onsia

529 citations
31 papers · 457 · h-index 9

Impact in

Papers in

Bart Onsia

30 papers receiving 438 citations

Peers

Bart Onsia
Comparison fields: 5 of 21
  • Electrical and Electronic Engineering 404
  • Atomic and Molecular Physics, and Optics 59
  • Radiation 14
  • Surfaces, Coatings and Films 10
  • Materials Chemistry 34
Replace Peter Stallhofer with:
Peter Stallhofer Germany
M. Ohkura Japan
Andre Budrevich United States
Hengjing Tang China
A. Buczkowski United States
Anna Schäfer Germany
Philippe Signoret France
V. Dhandapani United States
M. Kubota Japan
Hak-Seung Han South Korea
Bart Onsia relative to Peter Stallhofer Germany Peter Stallhofer's profile →
Citations per field
00.5×2×3×
Peter Stallhofer · 1×
Citations per year

Countries citing papers authored by Bart Onsia

Since Specialization
Citations

This map shows the geographic impact of Bart Onsia's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Bart Onsia with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Bart Onsia more than expected).

Fields of papers citing papers by Bart Onsia

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Bart Onsia. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Bart Onsia. The network helps show where Bart Onsia may publish in the future.

Co-authors

The 25 scholars most cited alongside Bart Onsia, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Bart Onsia Line = papers co-authored together Bart Onsia links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown

Showing the 20 most-cited of 31 papers — load more, or switch the sort, to bring in the rest.

#Work
1 200495
2 200591
3 200572
4 200541
5 200431
6 200417
7 200614
8 200712
9 19989
10 20078
11 20036
12 20046
13 20046
14 20055
15 20065
16 20034
17 20034
18 20074
19 20013
20 20043

About Bart Onsia

Bart Onsia is a scholar working on Electrical and Electronic Engineering, Radiation, Electronic, Optical and Magnetic Materials, Surfaces, Coatings and Films and Atomic and Molecular Physics, and Optics, having authored 31 papers that have together received 457 indexed citations. Recurring topics across this work include Semiconductor materials and devices (29 papers), Advancements in Semiconductor Devices and Circuit Design (4 papers), Advanced Surface Polishing Techniques (2 papers), Copper Interconnects and Reliability (2 papers), Advanced Materials and Semiconductor Technologies (2 papers), Semiconductor materials and interfaces (2 papers), X-ray Spectroscopy and Fluorescence Analysis (2 papers) and Electron and X-Ray Spectroscopy Techniques (1 paper). The work is most often cited by research in Electrical and Electronic Engineering (404 citations), Atomic and Molecular Physics, and Optics (59 citations), Radiation (14 citations), Surfaces, Coatings and Films (10 citations) and Materials Chemistry (34 citations). Bart Onsia has collaborated with scholars based in Belgium, United States and Germany. Frequent co-authors include Marc Heyns, Stefan De Gendt, Thierry S. Conard, Matty R. Caymax, Marc Meuris, Chao Zhao, Ivo Teerlinck, Bert Brijs, Jan Van Steenbergen and Olivier Richard. Their work appears in journals such as IEEE Electron Device Letters, Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena, Journal of Applied Physics, Spectrochimica Acta Part B Atomic Spectroscopy and Applied Physics Letters.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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