Tom Wallow
Impact in
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- Advancements in Photolithography Techniques
- VLSI and FPGA Design Techniques
- Low-power high-performance VLSI design
- Advancements in Semiconductor Devices and Circuit Design
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- Advanced X-ray Imaging Techniques
Papers in
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- Advancements in Photolithography Techniques 38
- VLSI and FPGA Design Techniques 1
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- Computer Graphics and Visualization Techniques 1
- Co-authors
- Bruno La Fontaine (11 shared papers)Patrick P Naulleau (10 shared papers)Yunfei Deng (6 shared papers)Harry Levinson (4 shared papers)Christopher N. Anderson (8 shared papers)Ryoung-Han Kim (3 shared papers)Obert R. Wood (8 shared papers)Kenneth A. Goldberg (8 shared papers)
- Journals
- Microelectronic Engineering (2 papers)Journal of Photopolymer Science and Technology (2 papers)Journal of Micro/Nanopatterning Materials and Metrology (1 paper)SPIE Photomask Technology Conference (1 paper)Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena (5 papers)
- Partner nations
- United StatesSouth KoreaNetherlands
In The Last Decade
Tom Wallow
38 papers receiving 366 citations
Peers
Comparison fields: 5 of 16
- Electrical and Electronic Engineering 358
- Radiation 9
- Surfaces, Coatings and Films 5
- Biomedical Engineering 20
- Industrial and Manufacturing Engineering 4
Countries citing papers authored by Tom Wallow
This map shows the geographic impact of Tom Wallow's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Tom Wallow with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Tom Wallow more than expected).
Fields of papers citing papers by Tom Wallow
This network shows the impact of papers produced by Tom Wallow. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Tom Wallow. The network helps show where Tom Wallow may publish in the future.
Co-authors
The 25 scholars most cited alongside Tom Wallow, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 38 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 2009 | 42 | |
| 2 | 2008 | 38 | |
| 3 | 2012 | 30 | |
| 4 | 2010 | 29 | |
| 5 | 2012 | 26 | |
| 6 | 2006 | 25 | |
| 7 | 2009 | 23 | |
| 8 | 2010 | 19 | |
| 9 | 2009 | 13 | |
| 10 | 2006 | 12 | |
| 11 | 1997 | 11 | |
| 12 | 2008 | 11 | |
| 13 | 2009 | 11 | |
| 14 | 1999 | 10 | |
| 15 | 2007 | 10 | |
| 16 | 2007 | 9 | |
| 17 | 2007 | 9 | |
| 18 | 2014 | 9 | |
| 19 | 2004 | 8 | |
| 20 | 2011 | 8 |
About Tom Wallow
Tom Wallow is a scholar working on Electrical and Electronic Engineering, Computer Graphics and Computer-Aided Design, Nuclear Energy and Engineering, Waste Management and Disposal and Infectious Diseases, having authored 38 papers that have together received 406 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (38 papers), Computer Graphics and Visualization Techniques (1 paper) and VLSI and FPGA Design Techniques (1 paper). The work is most often cited by research in Electrical and Electronic Engineering (358 citations), Radiation (9 citations), Surfaces, Coatings and Films (5 citations), Biomedical Engineering (20 citations) and Industrial and Manufacturing Engineering (4 citations). Tom Wallow has collaborated with scholars based in United States, South Korea and Netherlands. Frequent co-authors include Bruno La Fontaine, Patrick P Naulleau, Yunfei Deng, Harry Levinson, Christopher N. Anderson, Ryoung-Han Kim, Obert R. Wood, Kenneth A. Goldberg, Mark D. Smith and Paul Denham. Their work appears in journals such as Microelectronic Engineering, Journal of Photopolymer Science and Technology, Journal of Micro/Nanopatterning Materials and Metrology, SPIE Photomask Technology Conference and Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.