T. Dalton
Impact in
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- Copper Interconnects and Reliability
- Mechanics of Materials top 5%
- Metal and Thin Film Mechanics
Papers in
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- Semiconductor materials and devices 11
- Plasma Diagnostics and Applications 6
- Integrated Circuits and Semiconductor Failure Analysis 3
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- Copper Interconnects and Reliability 12
- Co-authors
- G. S. Oehrlein (4 shared papers)T. E. F. M. Standaert (4 shared papers)Christer Hedlund (1 shared paper)Eric Joseph (1 shared paper)Marcus A. Worsley (6 shared papers)Nicholas Fuller (6 shared papers)Stacey F. Bent (6 shared papers)P. J. Matsuo (3 shared papers)
- Journals
- Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (3 papers)Journal of Applied Physics (2 papers)Journal of The Electrochemical Society (2 papers)Thin Solid Films (1 paper)Industrial & Engineering Chemistry Research (1 paper)
- Partner nations
- United StatesCanadaTaiwan
In The Last Decade
T. Dalton
24 papers receiving 675 citations
Peers
Comparison fields: 5 of 51
- Electronic, Optical and Magnetic Materials 244
- Mechanics of Materials 263
- Electrical and Electronic Engineering 600
- Materials Chemistry 177
- Ceramics and Composites 21
Countries citing papers authored by T. Dalton
This map shows the geographic impact of T. Dalton's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by T. Dalton with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites T. Dalton more than expected).
Fields of papers citing papers by T. Dalton
This network shows the impact of papers produced by T. Dalton. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by T. Dalton. The network helps show where T. Dalton may publish in the future.
Co-authors
The 25 scholars most cited alongside T. Dalton, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 25 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 2003 | 253 | |
| 2 | 2005 | 76 | |
| 3 | 1999 | 67 | |
| 4 | 1993 | 60 | |
| 5 | 2006 | 47 | |
| 6 | 2000 | 47 | |
| 7 | 1999 | 44 | |
| 8 | 2007 | 29 | |
| 9 | 1994 | 24 | |
| 10 | 1988 | 18 | |
| 11 | 2007 | 7 | |
| 12 | 1998 | 7 | |
| 13 | 2005 | 7 | |
| 14 | 1991 | 7 | |
| 15 | 2001 | 4 | |
| 16 | 2003 | 3 | |
| 17 | 2005 | 3 | |
| 18 | 2004 | 3 | |
| 19 | 1997 | 2 | |
| 20 | 2005 | 1 |
About T. Dalton
T. Dalton is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Biomedical Engineering, Mechanics of Materials and Computational Mechanics, having authored 25 papers that have together received 713 indexed citations. Recurring topics across this work include Copper Interconnects and Reliability (12 papers), Semiconductor materials and devices (11 papers), Metal and Thin Film Mechanics (6 papers), Plasma Diagnostics and Applications (6 papers), Advanced Surface Polishing Techniques (5 papers), Integrated Circuits and Semiconductor Failure Analysis (3 papers), Surface Roughness and Optical Measurements (2 papers) and Optical Coatings and Gratings (2 papers). The work is most often cited by research in Electronic, Optical and Magnetic Materials (244 citations), Mechanics of Materials (263 citations), Electrical and Electronic Engineering (600 citations), Materials Chemistry (177 citations) and Ceramics and Composites (21 citations). T. Dalton has collaborated with scholars based in United States, Canada and Taiwan. Frequent co-authors include G. S. Oehrlein, T. E. F. M. Standaert, Christer Hedlund, Eric Joseph, Marcus A. Worsley, Nicholas Fuller, Stacey F. Bent, P. J. Matsuo, Susan D. Allen and Herbert H. Sawin. Their work appears in journals such as Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Journal of Applied Physics, Journal of The Electrochemical Society, Thin Solid Films and Industrial & Engineering Chemistry Research.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.