Matthew E. Colburn
Impact in
- Surfaces, Coatings and Films top 1%
- Biomedical Engineering top 1%
- Nanofabrication and Lithography Techniques
- Advanced Surface Polishing Techniques
Papers in
-
- Advancements in Photolithography Techniques 64
- Integrated Circuits and Semiconductor Failure Analysis 15
- Semiconductor materials and devices 12
- 3D IC and TSV technologies 10
- Advancements in Semiconductor Devices and Circuit Design 8
- Co-authors
- Carlton Grant Willson (15 shared papers)S. V. Sreenivasan (12 shared papers)John Gilbert Ekerdt (11 shared papers)Byung Jin Choi (14 shared papers)Todd C. Bailey (8 shared papers)T. C. Bailey (6 shared papers)Mario J. Meissl (7 shared papers)M. D. Stewart (3 shared papers)
- Journals
- Microelectronic Engineering (2 papers)ACS Nano (2 papers)Journal of Photopolymer Science and Technology (2 papers)IBM Journal of Research and Development (1 paper)Journal of Adhesion Science and Technology (1 paper)
- Partner nations
- United StatesJapanGermany
In The Last Decade
Matthew E. Colburn
80 papers receiving 2.8k citations
Peers
Comparison fields: 5 of 65
- Surfaces, Coatings and Films 396
- Biomedical Engineering 1.7k
- Electrical and Electronic Engineering 2.1k
- Atomic and Molecular Physics, and Optics 591
- Materials Chemistry 829
Countries citing papers authored by Matthew E. Colburn
This map shows the geographic impact of Matthew E. Colburn's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Matthew E. Colburn with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Matthew E. Colburn more than expected).
Fields of papers citing papers by Matthew E. Colburn
This network shows the impact of papers produced by Matthew E. Colburn. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Matthew E. Colburn. The network helps show where Matthew E. Colburn may publish in the future.
Co-authors
The 25 scholars most cited alongside Matthew E. Colburn, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 82 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 1999 | 469 | |
| 2 | 2007 | 363 | |
| 3 | 2000 | 306 | |
| 4 | 2010 | 204 | |
| 5 | 2014 | 140 | |
| 6 | 1999 | 130 | |
| 7 | 2016 | 116 | |
| 8 | 2002 | 97 | |
| 9 | 2001 | 88 | |
| 10 | 2014 | 82 | |
| 11 | 2000 | 65 | |
| 12 | 2001 | 60 | |
| 13 | 2010 | 55 | |
| 14 | 2004 | 54 | |
| 15 | 2001 | 54 | |
| 16 | 2016 | 53 | |
| 17 | 2001 | 47 | |
| 18 | 2009 | 42 | |
| 19 | 2008 | 38 | |
| 20 | Sub-25nm FinFET with advanced fin formation and short channel effect engineering | 2011 | 31 |
About Matthew E. Colburn
Matthew E. Colburn is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films, Biomedical Engineering, Electronic, Optical and Magnetic Materials and Atomic and Molecular Physics, and Optics, having authored 82 papers that have together received 3.0k indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (64 papers), Nanofabrication and Lithography Techniques (34 papers), Integrated Circuits and Semiconductor Failure Analysis (15 papers), Semiconductor materials and devices (12 papers), Block Copolymer Self-Assembly (11 papers), 3D IC and TSV technologies (10 papers), Advancements in Semiconductor Devices and Circuit Design (8 papers) and Copper Interconnects and Reliability (8 papers). The work is most often cited by research in Surfaces, Coatings and Films (396 citations), Biomedical Engineering (1.7k citations), Electrical and Electronic Engineering (2.1k citations), Atomic and Molecular Physics, and Optics (591 citations) and Materials Chemistry (829 citations). Matthew E. Colburn has collaborated with scholars based in United States, Japan and Germany. Frequent co-authors include Carlton Grant Willson, S. V. Sreenivasan, John Gilbert Ekerdt, Byung Jin Choi, Todd C. Bailey, T. C. Bailey, Mario J. Meissl, M. D. Stewart, Shilpa Damle and Kathryn Wilder Guarini. Their work appears in journals such as Microelectronic Engineering, ACS Nano, Journal of Photopolymer Science and Technology, IBM Journal of Research and Development and Journal of Adhesion Science and Technology.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.