Todd C. Bailey
Impact in
- Biomedical Engineering top 5%
- Nanofabrication and Lithography Techniques
- Advanced Surface Polishing Techniques
- Microfluidic and Capillary Electrophoresis Applications
- Surfaces, Coatings and Films top 5%
- Optical Coatings and Gratings
Papers in
-
- Electron and X-Ray Spectroscopy Techniques 10
- Optical Coatings and Gratings 4
-
- Advancements in Photolithography Techniques 31
- Integrated Circuits and Semiconductor Failure Analysis 15
- Co-authors
- Carlton Grant Willson (9 shared papers)John Gilbert Ekerdt (10 shared papers)S. V. Sreenivasan (8 shared papers)Matthew E. Colburn (8 shared papers)Stephen Christopher Johnson (5 shared papers)Michael D. Wedlake (1 shared paper)M. D. Stewart (1 shared paper)Bernard Choi (1 shared paper)
- Journals
- Journal of Micro/Nanolithography MEMS and MOEMS (5 papers)Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (27 papers)PubMed (1 paper)Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena (2 papers)
- Partner nations
- United StatesJapanSouth Korea
In The Last Decade
Todd C. Bailey
35 papers receiving 811 citations
Peers
Comparison fields: 5 of 41
- Biomedical Engineering 725
- Surfaces, Coatings and Films 97
- Electrical and Electronic Engineering 641
- Atomic and Molecular Physics, and Optics 240
- Structural Biology 4
Countries citing papers authored by Todd C. Bailey
This map shows the geographic impact of Todd C. Bailey's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Todd C. Bailey with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Todd C. Bailey more than expected).
Fields of papers citing papers by Todd C. Bailey
This network shows the impact of papers produced by Todd C. Bailey. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Todd C. Bailey. The network helps show where Todd C. Bailey may publish in the future.
Co-authors
The 25 scholars most cited alongside Todd C. Bailey, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 38 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 1999 | 469 | |
| 2 | 2000 | 65 | |
| 3 | 2001 | 60 | |
| 4 | 2001 | 54 | |
| 5 | 2002 | 39 | |
| 6 | 2003 | 23 | |
| 7 | 2003 | 20 | |
| 8 | 2014 | 19 | |
| 9 | 2018 | 16 | |
| 10 | 2001 | 15 | |
| 11 | 2014 | 11 | |
| 12 | 2017 | 10 | |
| 13 | 2017 | 10 | |
| 14 | 2008 | 7 | |
| 15 | 2014 | 7 | |
| 16 | 2015 | 6 | |
| 17 | 2018 | 5 | |
| 18 | 2010 | 4 | |
| 19 | 2010 | 4 | |
| 20 | 2014 | 3 |
About Todd C. Bailey
Todd C. Bailey is a scholar working on Surfaces, Coatings and Films, Electrical and Electronic Engineering, Biomedical Engineering, Industrial and Manufacturing Engineering and Radiation, having authored 38 papers that have together received 875 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (31 papers), Integrated Circuits and Semiconductor Failure Analysis (15 papers), Nanofabrication and Lithography Techniques (11 papers), Electron and X-Ray Spectroscopy Techniques (10 papers), Advanced Surface Polishing Techniques (9 papers), Industrial Vision Systems and Defect Detection (4 papers), Force Microscopy Techniques and Applications (4 papers) and Optical Coatings and Gratings (4 papers). The work is most often cited by research in Biomedical Engineering (725 citations), Surfaces, Coatings and Films (97 citations), Electrical and Electronic Engineering (641 citations), Atomic and Molecular Physics, and Optics (240 citations) and Structural Biology (4 citations). Todd C. Bailey has collaborated with scholars based in United States, Japan and South Korea. Frequent co-authors include Carlton Grant Willson, John Gilbert Ekerdt, S. V. Sreenivasan, Matthew E. Colburn, Stephen Christopher Johnson, Michael D. Wedlake, M. D. Stewart, Bernard Choi, Shilpa Damle and Timothy B. Michaelson. Their work appears in journals such as Journal of Micro/Nanolithography MEMS and MOEMS, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE, PubMed and Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.