D. Dobuzinsky
Impact in
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- Copper Interconnects and Reliability
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- Semiconductor materials and devices
- Plasma Diagnostics and Applications
- Thin-Film Transistor Technologies
- Advancements in Semiconductor Devices and Circuit Design
- Integrated Circuits and Semiconductor Failure Analysis
Papers in
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- Semiconductor materials and devices 12
- Advancements in Semiconductor Devices and Circuit Design 6
- Advancements in Photolithography Techniques 2
- Integrated Circuits and Semiconductor Failure Analysis 2
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- Copper Interconnects and Reliability 8
- Co-authors
- S. Nguyen (6 shared papers)D. Harmon (1 shared paper)S. R. Stiffler (1 shared paper)M. Gibson (2 shared papers)D. Döpp (1 shared paper)J. Holt (1 shared paper)Steven J. Koester (1 shared paper)Xinlin Wang (1 shared paper)
- Journals
- Microelectronic Engineering (2 papers)Journal of The Electrochemical Society (2 papers)Thin Solid Films (2 papers)IEEE Electron Device Letters (1 paper)IEEE Transactions on Semiconductor Manufacturing (1 paper)
- Partner nations
- United StatesGermanyAustria
In The Last Decade
D. Dobuzinsky
15 papers receiving 250 citations
Peers
Comparison fields: 5 of 30
- Electronic, Optical and Magnetic Materials 95
- Electrical and Electronic Engineering 238
- Ceramics and Composites 15
- Surfaces, Coatings and Films 17
- Mechanics of Materials 46
Countries citing papers authored by D. Dobuzinsky
This map shows the geographic impact of D. Dobuzinsky's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by D. Dobuzinsky with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites D. Dobuzinsky more than expected).
Fields of papers citing papers by D. Dobuzinsky
This network shows the impact of papers produced by D. Dobuzinsky. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by D. Dobuzinsky. The network helps show where D. Dobuzinsky may publish in the future.
Co-authors
The 25 scholars most cited alongside D. Dobuzinsky, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 1990 | 77 | |
| 2 | 1995 | 53 | |
| 3 | 1991 | 39 | |
| 4 | 2009 | 31 | |
| 5 | 1990 | 22 | |
| 6 | 1997 | 12 | |
| 7 | 1996 | 11 | |
| 8 | 2000 | 5 | |
| 9 | 2004 | 3 | |
| 10 | 2002 | 3 | |
| 11 | 2004 | 3 | |
| 12 | 1999 | 2 | |
| 13 | 1998 | 1 | |
| 14 | 2002 | 1 | |
| 15 | 1991 | 1 | |
| 16 | 2005 | 0 | |
| 17 | 2003 | 0 |
About D. Dobuzinsky
D. Dobuzinsky is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Biomedical Engineering, Materials Chemistry and Atomic and Molecular Physics, and Optics, having authored 17 papers that have together received 264 indexed citations. Recurring topics across this work include Semiconductor materials and devices (12 papers), Copper Interconnects and Reliability (8 papers), Advancements in Semiconductor Devices and Circuit Design (6 papers), Advanced Surface Polishing Techniques (3 papers), Advancements in Photolithography Techniques (2 papers), Integrated Circuits and Semiconductor Failure Analysis (2 papers), Semiconductor materials and interfaces (2 papers) and Ion-surface interactions and analysis (1 paper). The work is most often cited by research in Electronic, Optical and Magnetic Materials (95 citations), Electrical and Electronic Engineering (238 citations), Ceramics and Composites (15 citations), Surfaces, Coatings and Films (17 citations) and Mechanics of Materials (46 citations). D. Dobuzinsky has collaborated with scholars based in United States, Germany and Austria. Frequent co-authors include S. Nguyen, D. Harmon, S. R. Stiffler, M. Gibson, D. Döpp, J. Holt, Steven J. Koester, Xinlin Wang, Wilfried Haensch and A. Majumdar. Their work appears in journals such as Microelectronic Engineering, Journal of The Electrochemical Society, Thin Solid Films, IEEE Electron Device Letters and IEEE Transactions on Semiconductor Manufacturing.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.