D. Dobuzinsky
Impact in
-
- Copper Interconnects and Reliability
-
- Semiconductor materials and devices
- Plasma Diagnostics and Applications
- Advancements in Semiconductor Devices and Circuit Design
- Thin-Film Transistor Technologies
- Integrated Circuits and Semiconductor Failure Analysis
Papers in
-
- Semiconductor materials and devices 12
- Advancements in Semiconductor Devices and Circuit Design 6
- Integrated Circuits and Semiconductor Failure Analysis 2
- Advancements in Photolithography Techniques 2
-
- Copper Interconnects and Reliability 8
- Co-authors
- S. Nguyen (6 shared papers)D. Harmon (1 shared paper)S. R. Stiffler (1 shared paper)J. Holt (1 shared paper)D. Döpp (1 shared paper)Arvind Kumar (1 shared paper)Xinlin Wang (1 shared paper)Steven J. Koester (1 shared paper)
- Journals
- Thin Solid Films (2 papers)Microelectronic Engineering (2 papers)Journal of The Electrochemical Society (2 papers)IEEE Electron Device Letters (1 paper)IEEE Transactions on Semiconductor Manufacturing (1 paper)
- Partner nations
- United StatesGermanyAustria
In The Last Decade
D. Dobuzinsky
16 papers receiving 258 citations
Peers
Comparison fields: 5 of 31
- Electronic, Optical and Magnetic Materials 109
- Electrical and Electronic Engineering 258
- Ceramics and Composites 16
- Surfaces, Coatings and Films 18
- Mechanics of Materials 48
Countries citing papers authored by D. Dobuzinsky
This map shows the geographic impact of D. Dobuzinsky's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by D. Dobuzinsky with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites D. Dobuzinsky more than expected).
Fields of papers citing papers by D. Dobuzinsky
This network shows the impact of papers produced by D. Dobuzinsky. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by D. Dobuzinsky. The network helps show where D. Dobuzinsky may publish in the future.
Co-authors
The 25 scholars most cited alongside D. Dobuzinsky, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 1990 | 80 | |
| 2 | 1995 | 59 | |
| 3 | 1991 | 39 | |
| 4 | 2009 | 33 | |
| 5 | 1990 | 25 | |
| 6 | 1997 | 15 | |
| 7 | 1996 | 12 | |
| 8 | 2000 | 6 | |
| 9 | 2004 | 4 | |
| 10 | 2004 | 3 | |
| 11 | 2002 | 3 | |
| 12 | 1999 | 2 | |
| 13 | 1998 | 1 | |
| 14 | 1991 | 1 | |
| 15 | 2005 | 1 | |
| 16 | 2002 | 1 | |
| 17 | 2003 | 0 |
About D. Dobuzinsky
D. Dobuzinsky is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Biomedical Engineering, Materials Chemistry and Atomic and Molecular Physics, and Optics, having authored 17 papers that have together received 285 indexed citations. Recurring topics across this work include Semiconductor materials and devices (12 papers), Copper Interconnects and Reliability (8 papers), Advancements in Semiconductor Devices and Circuit Design (6 papers), Advanced Surface Polishing Techniques (3 papers), Semiconductor materials and interfaces (2 papers), Integrated Circuits and Semiconductor Failure Analysis (2 papers), Advancements in Photolithography Techniques (2 papers) and ZnO doping and properties (1 paper). The work is most often cited by research in Electronic, Optical and Magnetic Materials (109 citations), Electrical and Electronic Engineering (258 citations), Ceramics and Composites (16 citations), Surfaces, Coatings and Films (18 citations) and Mechanics of Materials (48 citations). D. Dobuzinsky has collaborated with scholars based in United States, Germany and Austria. Frequent co-authors include S. Nguyen, D. Harmon, S. R. Stiffler, J. Holt, D. Döpp, Arvind Kumar, Xinlin Wang, Steven J. Koester, M. Gibson and Wilfried Haensch. Their work appears in journals such as Thin Solid Films, Microelectronic Engineering, Journal of The Electrochemical Society, IEEE Electron Device Letters and IEEE Transactions on Semiconductor Manufacturing.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.