C. Huffman
Impact in
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- Semiconductor materials and devices
- Advancements in Semiconductor Devices and Circuit Design
- Plasma Diagnostics and Applications
- Advancements in Photolithography Techniques
- Low-power high-performance VLSI design
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- Copper Interconnects and Reliability
Papers in
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- Semiconductor materials and devices 25
- Advancements in Semiconductor Devices and Circuit Design 11
- Advancements in Photolithography Techniques 8
- Plasma Diagnostics and Applications 4
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- Copper Interconnects and Reliability 12
- Co-authors
- Young‐Hee Lee (1 shared paper)Steven George (1 shared paper)P. Majhi (12 shared papers)Husam Niman Alshareef (9 shared papers)Hechuan Wen (7 shared papers)B.H. Lee (8 shared papers)Naim Moumen (5 shared papers)Baotao Kang (1 shared paper)
- Journals
- Japanese Journal of Applied Physics (5 papers)Electrochemical and Solid-State Letters (3 papers)Thin Solid Films (2 papers)IEEE Electron Device Letters (2 papers)ECS Journal of Solid State Science and Technology (1 paper)
- Partner nations
- United StatesBelgiumJapan
In The Last Decade
C. Huffman
43 papers receiving 679 citations
Peers
Comparison fields: 5 of 28
- Electrical and Electronic Engineering 560
- Electronic, Optical and Magnetic Materials 54
- Materials Chemistry 86
- Atomic and Molecular Physics, and Optics 52
- Condensed Matter Physics 11
Countries citing papers authored by C. Huffman
This map shows the geographic impact of C. Huffman's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by C. Huffman with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites C. Huffman more than expected).
Fields of papers citing papers by C. Huffman
This network shows the impact of papers produced by C. Huffman. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by C. Huffman. The network helps show where C. Huffman may publish in the future.
Co-authors
The 25 scholars most cited alongside C. Huffman, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 46 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 2016 | 95 | |
| 2 | 2015 | 91 | |
| 3 | 2006 | 50 | |
| 4 | 2005 | 49 | |
| 5 | 1985 | 33 | |
| 6 | 2005 | 33 | |
| 7 | 2005 | 32 | |
| 8 | 2006 | 32 | |
| 9 | 2006 | 31 | |
| 10 | 2005 | 26 | |
| 11 | 2005 | 25 | |
| 12 | 2004 | 22 | |
| 13 | 2005 | 20 | |
| 14 | 2013 | 18 | |
| 15 | 2013 | 16 | |
| 16 | 2006 | 15 | |
| 17 | 2009 | 13 | |
| 18 | 2011 | 13 | |
| 19 | 2005 | 12 | |
| 20 | 2008 | 9 |
About C. Huffman
C. Huffman is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Atomic and Molecular Physics, and Optics, Materials Chemistry and Nuclear Energy and Engineering, having authored 46 papers that have together received 718 indexed citations. Recurring topics across this work include Semiconductor materials and devices (25 papers), Copper Interconnects and Reliability (12 papers), Advancements in Semiconductor Devices and Circuit Design (11 papers), Advancements in Photolithography Techniques (8 papers), Semiconductor materials and interfaces (7 papers), Plasma Diagnostics and Applications (4 papers) and 2D Materials and Applications (1 paper). The work is most often cited by research in Electrical and Electronic Engineering (560 citations), Electronic, Optical and Magnetic Materials (54 citations), Materials Chemistry (86 citations), Atomic and Molecular Physics, and Optics (52 citations) and Condensed Matter Physics (11 citations). C. Huffman has collaborated with scholars based in United States, Belgium and Japan. Frequent co-authors include Young‐Hee Lee, Steven George, P. Majhi, Husam Niman Alshareef, Hechuan Wen, B.H. Lee, Naim Moumen, Baotao Kang, H.F. Luan and Wei Zhong Han. Their work appears in journals such as Japanese Journal of Applied Physics, Electrochemical and Solid-State Letters, Thin Solid Films, IEEE Electron Device Letters and ECS Journal of Solid State Science and Technology.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.