Thomas Uhrmann

524 citations
54 papers · 399 · h-index 13

Impact in

Papers in

    • 3D IC and TSV technologies 34
    • Electronic Packaging and Soldering Technologies 23
    • Semiconductor materials and devices 10
    • Advancements in Photolithography Techniques 9
    • Advanced Surface Polishing Techniques 7
    • Nanofabrication and Lithography Techniques 6

Thomas Uhrmann

48 papers receiving 381 citations

Peers

Thomas Uhrmann
Comparison fields: 5 of 30
  • Electrical and Electronic Engineering 311
  • Automotive Engineering 47
  • Atomic and Molecular Physics, and Optics 110
  • Electronic, Optical and Magnetic Materials 59
  • Ceramics and Composites 15
Replace N. Bresson with:
N. Bresson France
Viorel Drăgoi Austria
Ionut Radu France
Thomas Signamarcheix France
C. W. Tipton United States
Jeffery C. C. Lo Hong Kong
L.W. Schaper United States
Akitsu Shigetou Japan
J. Dechamp France
S. Kadomura Japan
Thomas Uhrmann relative to N. Bresson France N. Bresson's profile →
Citations per field
00.5×1.5×2.3×
N. Bresson · 1×
Citations per year

Countries citing papers authored by Thomas Uhrmann

Since Specialization
Citations

This map shows the geographic impact of Thomas Uhrmann's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Thomas Uhrmann with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Thomas Uhrmann more than expected).

Fields of papers citing papers by Thomas Uhrmann

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Thomas Uhrmann. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Thomas Uhrmann. The network helps show where Thomas Uhrmann may publish in the future.

Co-authors

The 25 scholars most cited alongside Thomas Uhrmann, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Thomas Uhrmann Line = papers co-authored together Thomas Uhrmann links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown

Showing the 20 most-cited of 54 papers — load more, or switch the sort, to bring in the rest.

#Work
1 200652
2 201835
3 200827
4 201025
5 201821
6 202318
7 200918
8 202117
9 202316
10 202316
11 200915
12 201314
13 201113
14 201610
15 20248
16 20247
17 20237
18 20156
19 20095
20 20235

About Thomas Uhrmann

Thomas Uhrmann is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering, Atomic and Molecular Physics, and Optics, Automotive Engineering and Industrial and Manufacturing Engineering, having authored 54 papers that have together received 399 indexed citations. Recurring topics across this work include 3D IC and TSV technologies (34 papers), Electronic Packaging and Soldering Technologies (23 papers), Semiconductor materials and devices (10 papers), Advancements in Photolithography Techniques (9 papers), Advanced Surface Polishing Techniques (7 papers), Additive Manufacturing and 3D Printing Technologies (7 papers), Nanofabrication and Lithography Techniques (6 papers) and Manufacturing Process and Optimization (5 papers). The work is most often cited by research in Electrical and Electronic Engineering (311 citations), Automotive Engineering (47 citations), Atomic and Molecular Physics, and Optics (110 citations), Electronic, Optical and Magnetic Materials (59 citations) and Ceramics and Composites (15 citations). Thomas Uhrmann has collaborated with scholars based in Austria, Belgium and United States. Frequent co-authors include Théodoros Dimopoulos, H. Brückl, M. Rührig, Markus Wimplinger, L. Bär, Paul Lindner, Eric Beyne, A. Kohn, Sascha Weyers and Joeri De Vos. Their work appears in journals such as Applied Physics Letters, Journal of Physics D Applied Physics, IEEE Transactions on Magnetics, Journal of Magnetism and Magnetic Materials and Journal of Applied Physics.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact