Th. Conard
Impact in
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- Semiconductor materials and devices
- Advancements in Semiconductor Devices and Circuit Design
- Integrated Circuits and Semiconductor Failure Analysis
- Ferroelectric and Negative Capacitance Devices
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- Copper Interconnects and Reliability
Papers in
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- Semiconductor materials and devices 14
- Integrated Circuits and Semiconductor Failure Analysis 5
- Advancements in Semiconductor Devices and Circuit Design 2
- Ferroelectric and Negative Capacitance Devices 2
-
- Ion-surface interactions and analysis 7
- Co-authors
- Bert Brijs (4 shared papers)Wilfried Vandervorst (5 shared papers)M.K. Bude (1 shared paper)M.-Y. Ho (1 shared paper)T. Sorsch (1 shared paper)Glen D. Wilk (1 shared paper)J. L. Grazul (1 shared paper)B. Busch (1 shared paper)
- Journals
- Applied Surface Science (4 papers)Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2 papers)Surface and Interface Analysis (2 papers)Journal of materials research/Pratt's guide to venture capital sources (1 paper)Journal of The Electrochemical Society (1 paper)
- Partner nations
- BelgiumGermanyUnited States
In The Last Decade
Th. Conard
19 papers receiving 394 citations
Peers
Comparison fields: 5 of 36
- Electrical and Electronic Engineering 368
- Electronic, Optical and Magnetic Materials 94
- Materials Chemistry 197
- Surfaces, Coatings and Films 16
- Atomic and Molecular Physics, and Optics 45
Countries citing papers authored by Th. Conard
This map shows the geographic impact of Th. Conard's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Th. Conard with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Th. Conard more than expected).
Fields of papers citing papers by Th. Conard
This network shows the impact of papers produced by Th. Conard. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Th. Conard. The network helps show where Th. Conard may publish in the future.
Co-authors
The 25 scholars most cited alongside Th. Conard, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 2002 | 252 | |
| 2 | 2001 | 95 | |
| 3 | 2001 | 14 | |
| 4 | 2004 | 11 | |
| 5 | 2003 | 8 | |
| 6 | 1999 | 5 | |
| 7 | 2004 | 4 | |
| 8 | 2004 | 4 | |
| 9 | 1999 | 4 | |
| 10 | 2012 | 4 | |
| 11 | 2024 | 3 | |
| 12 | 2004 | 3 | |
| 13 | 2004 | 3 | |
| 14 | 2012 | 2 | |
| 15 | 2009 | 1 | |
| 16 | 2003 | 1 | |
| 17 | 1994 | 1 | |
| 18 | 2011 | 1 | |
| 19 | 2002 | 1 |
About Th. Conard
Th. Conard is a scholar working on Electrical and Electronic Engineering, Computational Mechanics, Electronic, Optical and Magnetic Materials, Mechanics of Materials and Atomic and Molecular Physics, and Optics, having authored 19 papers that have together received 417 indexed citations. Recurring topics across this work include Semiconductor materials and devices (14 papers), Ion-surface interactions and analysis (7 papers), Copper Interconnects and Reliability (6 papers), Integrated Circuits and Semiconductor Failure Analysis (5 papers), Metal and Thin Film Mechanics (4 papers), Advancements in Semiconductor Devices and Circuit Design (2 papers), Semiconductor materials and interfaces (2 papers) and Ferroelectric and Negative Capacitance Devices (2 papers). The work is most often cited by research in Electrical and Electronic Engineering (368 citations), Electronic, Optical and Magnetic Materials (94 citations), Materials Chemistry (197 citations), Surfaces, Coatings and Films (16 citations) and Atomic and Molecular Physics, and Optics (45 citations). Th. Conard has collaborated with scholars based in Belgium, Germany and United States. Frequent co-authors include Bert Brijs, Wilfried Vandervorst, M.K. Bude, M.-Y. Ho, T. Sorsch, Glen D. Wilk, J. L. Grazul, B. Busch, David Anthony Muller and Petri Räisänen. Their work appears in journals such as Applied Surface Science, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Surface and Interface Analysis, Journal of materials research/Pratt's guide to venture capital sources and Journal of The Electrochemical Society.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.