Robert Havemann
Impact in
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- Copper Interconnects and Reliability
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- Semiconductor materials and devices
- Advancements in Semiconductor Devices and Circuit Design
- 3D IC and TSV technologies
- Low-power high-performance VLSI design
- Electronic Packaging and Soldering Technologies
Papers in
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- Copper Interconnects and Reliability 36
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- Advancements in Semiconductor Devices and Circuit Design 7
- Advancements in Photolithography Techniques 5
- Low-power high-performance VLSI design 4
- Microwave Engineering and Waveguides 1
- Semiconductor materials and devices 1
- Co-authors
- JAMES A. HUTCHBY (1 shared paper)Shin-Puu Jeng (5 shared papers)Mi-Chang Chang (4 shared papers)Paul S. Ho (5 shared papers)Volker A. Blaschke (5 shared papers)Patrick R. Justison (3 shared papers)J. D. Luttmer (10 shared papers)Roger A. Haken (7 shared papers)
- Journals
- Thin Solid Films (3 papers)Journal of The Electrochemical Society (2 papers)Journal of Electronic Materials (2 papers)Proceedings of the IEEE (2 papers)Journal of Applied Physics (1 paper)
- Partner nations
- United StatesJapanTaiwan
In The Last Decade
Robert Havemann
47 papers receiving 708 citations
Peers
Comparison fields: 5 of 26
- Electronic, Optical and Magnetic Materials 418
- Electrical and Electronic Engineering 320
- Computer Networks and Communications 36
- Astronomy and Astrophysics 27
- Atomic and Molecular Physics, and Optics 37
Countries citing papers authored by Robert Havemann
This map shows the geographic impact of Robert Havemann's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Robert Havemann with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Robert Havemann more than expected).
Fields of papers citing papers by Robert Havemann
This network shows the impact of papers produced by Robert Havemann. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Robert Havemann. The network helps show where Robert Havemann may publish in the future.
Co-authors
The 25 scholars most cited alongside Robert Havemann, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 53 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 2001 | 255 | |
| 2 | 2001 | 55 | |
| 3 | 1998 | 49 | |
| 4 | 2002 | 39 | |
| 5 | 1994 | 38 | |
| 6 | 1987 | 28 | |
| 7 | 1978 | 21 | |
| 8 | 2002 | 21 | |
| 9 | 1994 | 20 | |
| 10 | 2001 | 20 | |
| 11 | 1988 | 16 | |
| 12 | 1998 | 15 | |
| 13 | 2000 | 15 | |
| 14 | 2002 | 14 | |
| 15 | 1998 | 13 | |
| 16 | 1995 | 11 | |
| 17 | 1996 | 11 | |
| 18 | 2001 | 10 | |
| 19 | 2002 | 10 | |
| 20 | 2006 | 10 |
About Robert Havemann
Robert Havemann is a scholar working on Electronic, Optical and Magnetic Materials, Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics, Astronomy and Astrophysics and Mechanical Engineering, having authored 53 papers that have together received 776 indexed citations. Recurring topics across this work include Copper Interconnects and Reliability (36 papers), Advancements in Semiconductor Devices and Circuit Design (7 papers), Advancements in Photolithography Techniques (5 papers), Low-power high-performance VLSI design (4 papers), Semiconductor materials and interfaces (3 papers), Magnetic properties of thin films (2 papers), Microwave Engineering and Waveguides (1 paper) and Semiconductor materials and devices (1 paper). The work is most often cited by research in Electronic, Optical and Magnetic Materials (418 citations), Electrical and Electronic Engineering (320 citations), Computer Networks and Communications (36 citations), Astronomy and Astrophysics (27 citations) and Atomic and Molecular Physics, and Optics (37 citations). Robert Havemann has collaborated with scholars based in United States, Japan and Taiwan. Frequent co-authors include JAMES A. HUTCHBY, Shin-Puu Jeng, Mi-Chang Chang, Paul S. Ho, Volker A. Blaschke, Patrick R. Justison, J. D. Luttmer, Roger A. Haken, C.A. Hamilton and J.P. McVittie. Their work appears in journals such as Thin Solid Films, Journal of The Electrochemical Society, Journal of Electronic Materials, Proceedings of the IEEE and Journal of Applied Physics.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.