Maxime Argoud

519 citations
49 papers · 383 · h-index 12

Impact in

Papers in

    • Advancements in Photolithography Techniques 31
    • 3D IC and TSV technologies 8
    • Electronic Packaging and Soldering Technologies 7
    • Semiconductor materials and devices 5
    • Ferroelectric and Negative Capacitance Devices 4
    • Block Copolymer Self-Assembly 25

Maxime Argoud

48 papers receiving 369 citations

Peers

Maxime Argoud
Comparison fields: 5 of 25
  • Surfaces, Coatings and Films 44
  • Materials Chemistry 257
  • Electrical and Electronic Engineering 280
  • Biomedical Engineering 146
  • Electronic, Optical and Magnetic Materials 28
Replace S. Barnola with:
S. Barnola France
Patricia Pimenta‐Barros France
Jeffrey Smith United States
Sung Chan Park South Korea
Naoko Kihara Japan
Vikram Singh India
Guanyang Lin United States
Stefanie Sergeant Belgium
Alfredo Mameli Netherlands
Abraham Arceo United States
Maxime Argoud relative to S. Barnola France S. Barnola's profile →
Citations per field
00.5×1.5×
S. Barnola · 1×
Citations per year

Countries citing papers authored by Maxime Argoud

Since Specialization
Citations

This map shows the geographic impact of Maxime Argoud's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Maxime Argoud with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Maxime Argoud more than expected).

Fields of papers citing papers by Maxime Argoud

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Maxime Argoud. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Maxime Argoud. The network helps show where Maxime Argoud may publish in the future.

Co-authors

The 25 scholars most cited alongside Maxime Argoud, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Maxime Argoud Line = papers co-authored together Maxime Argoud links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown

Showing the 20 most-cited of 49 papers — load more, or switch the sort, to bring in the rest.

#Work
1 201345
2 201425
3 201324
4 201422
5 201520
6 201420
7 201318
8 201317
9 201615
10 201515
11 201514
12 201413
13 201011
14 201410
15 20159
16 20168
17 20138
18 20147
19 20137
20 20216

About Maxime Argoud

Maxime Argoud is a scholar working on Electrical and Electronic Engineering, Materials Chemistry, Biomedical Engineering, Surfaces, Coatings and Films and Organic Chemistry, having authored 49 papers that have together received 383 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (31 papers), Block Copolymer Self-Assembly (25 papers), Nanofabrication and Lithography Techniques (14 papers), 3D IC and TSV technologies (8 papers), Electronic Packaging and Soldering Technologies (7 papers), Advanced Surface Polishing Techniques (6 papers), Semiconductor materials and devices (5 papers) and Ferroelectric and Negative Capacitance Devices (4 papers). The work is most often cited by research in Surfaces, Coatings and Films (44 citations), Materials Chemistry (257 citations), Electrical and Electronic Engineering (280 citations), Biomedical Engineering (146 citations) and Electronic, Optical and Magnetic Materials (28 citations). Maxime Argoud has collaborated with scholars based in France, United States and Switzerland. Frequent co-authors include Raluca Tiron, Christophe Navarro, Xavier Chevalier, Patricia Pimenta‐Barros, S. Barnola, A. Gharbi, Guillaume Fleury, Georges Hadziioannou, Gilles Cunge and N. Possémé. Their work appears in journals such as Journal of Micro/Nanolithography MEMS and MOEMS, Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena, Microelectronic Engineering, Journal of Crystal Growth and Japanese Journal of Applied Physics.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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