L. Vallier
Impact in
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- Copper Interconnects and Reliability
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- Semiconductor materials and devices
- Plasma Diagnostics and Applications
- Advancements in Semiconductor Devices and Circuit Design
- Integrated Circuits and Semiconductor Failure Analysis
Papers in
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- Semiconductor materials and devices 46
- Plasma Diagnostics and Applications 27
- Advancements in Semiconductor Devices and Circuit Design 11
- Integrated Circuits and Semiconductor Failure Analysis 5
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- Copper Interconnects and Reliability 15
- Co-authors
- O. Joubert (32 shared papers)T. Chevolleau (8 shared papers)N. Possémé (6 shared papers)G. Cunge (9 shared papers)E. Pargon (8 shared papers)Jacques Pelletier (1 shared paper)Y. Arnal (1 shared paper)A. Durandet (1 shared paper)
- Journals
- Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (6 papers)Microelectronic Engineering (5 papers)Applied Physics Letters (3 papers)Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena (3 papers)Review of Scientific Instruments (1 paper)
- Partner nations
- FranceUnited StatesGermany
In The Last Decade
L. Vallier
51 papers receiving 954 citations
Peers
Comparison fields: 5 of 46
- Electronic, Optical and Magnetic Materials 325
- Electrical and Electronic Engineering 926
- Mechanics of Materials 304
- Surfaces, Coatings and Films 72
- Materials Chemistry 210
Countries citing papers authored by L. Vallier
This map shows the geographic impact of L. Vallier's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by L. Vallier with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites L. Vallier more than expected).
Fields of papers citing papers by L. Vallier
This network shows the impact of papers produced by L. Vallier. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by L. Vallier. The network helps show where L. Vallier may publish in the future.
Co-authors
The 25 scholars most cited alongside L. Vallier, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 55 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 1988 | 104 | |
| 2 | 2003 | 59 | |
| 3 | 1996 | 59 | |
| 4 | 2001 | 47 | |
| 5 | 2004 | 45 | |
| 6 | 2003 | 42 | |
| 7 | 2000 | 40 | |
| 8 | 1996 | 37 | |
| 9 | 2007 | 33 | |
| 10 | 2001 | 32 | |
| 11 | 2002 | 31 | |
| 12 | 1993 | 30 | |
| 13 | 2001 | 30 | |
| 14 | 2006 | 29 | |
| 15 | 2005 | 25 | |
| 16 | 2005 | 23 | |
| 17 | 2008 | 23 | |
| 18 | 1990 | 23 | |
| 19 | 2008 | 21 | |
| 20 | 2003 | 21 |
About L. Vallier
L. Vallier is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Mechanics of Materials, Surfaces, Coatings and Films and Computational Mechanics, having authored 55 papers that have together received 1000 indexed citations. Recurring topics across this work include Semiconductor materials and devices (46 papers), Plasma Diagnostics and Applications (27 papers), Copper Interconnects and Reliability (15 papers), Advancements in Semiconductor Devices and Circuit Design (11 papers), Metal and Thin Film Mechanics (10 papers), Electron and X-Ray Spectroscopy Techniques (9 papers), Ion-surface interactions and analysis (7 papers) and Integrated Circuits and Semiconductor Failure Analysis (5 papers). The work is most often cited by research in Electronic, Optical and Magnetic Materials (325 citations), Electrical and Electronic Engineering (926 citations), Mechanics of Materials (304 citations), Surfaces, Coatings and Films (72 citations) and Materials Chemistry (210 citations). L. Vallier has collaborated with scholars based in France, United States and Germany. Frequent co-authors include O. Joubert, T. Chevolleau, N. Possémé, G. Cunge, E. Pargon, Jacques Pelletier, Y. Arnal, A. Durandet, R. A. B. Devine and P. Mangiagalli. Their work appears in journals such as Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Microelectronic Engineering, Applied Physics Letters, Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena and Review of Scientific Instruments.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.