David Eon

1.9k citations
74 papers · 1.5k · h-index 24

Impact in

Papers in

    • Diamond and Carbon-based Materials Research 52
    • Semiconductor materials and devices 9
    • Plasma Diagnostics and Applications 8
    • Advancements in Photolithography Techniques 7
    • Silicon Carbide Semiconductor Technologies 6
    • Silicon and Solar Cell Technologies 3

David Eon

72 papers receiving 1.5k citations

Peers

David Eon
Comparison fields: 5 of 46
  • Materials Chemistry 993
  • Nuclear Energy and Engineering 4
  • Electrical and Electronic Engineering 481
  • Surfaces, Coatings and Films 41
  • Electronic, Optical and Magnetic Materials 95
Replace Ioan Costina with:
Ioan Costina Germany
Xuemei Wu China
Rita Rizzoli Italy
Byung‐Teak Lee South Korea
Atsuhito Sawabe Japan
Jean‐Luc Bubendorff France
Luke Owuor Nyakiti United States
Wei‐Yen Woon Taiwan
Robert J. Markunas United States
Hosun Lee South Korea
David Eon relative to Ioan Costina Germany Ioan Costina's profile →
Citations per field
00.5×2×2.8×
Ioan Costina · 1×
Citations per year

Countries citing papers authored by David Eon

Since Specialization
Citations

This map shows the geographic impact of David Eon's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by David Eon with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites David Eon more than expected).

Fields of papers citing papers by David Eon

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by David Eon. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by David Eon. The network helps show where David Eon may publish in the future.

Co-authors

The 25 scholars most cited alongside David Eon, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with David Eon Line = papers co-authored together David Eon links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown

Showing the 20 most-cited of 74 papers — load more, or switch the sort, to bring in the rest.

#Work
1 2014145
2 201762
3 201360
4 202059
5 201758
6 201256
7 201751
8 200448
9 201741
10 201740
11 200638
12 201536
13 202034
14 201233
15 201732
16 201631
17 200330
18 201429
19 200627
20 201427

About David Eon

David Eon is a scholar working on Materials Chemistry, Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials and Surfaces, Coatings and Films, having authored 74 papers that have together received 1.5k indexed citations. Recurring topics across this work include Diamond and Carbon-based Materials Research (52 papers), Semiconductor materials and devices (9 papers), Plasma Diagnostics and Applications (8 papers), Semiconductor materials and interfaces (8 papers), Advancements in Photolithography Techniques (7 papers), Silicon Carbide Semiconductor Technologies (6 papers), Copper Interconnects and Reliability (4 papers) and Silicon and Solar Cell Technologies (3 papers). The work is most often cited by research in Materials Chemistry (993 citations), Nuclear Energy and Engineering (4 citations), Electrical and Electronic Engineering (481 citations), Surfaces, Coatings and Films (41 citations) and Electronic, Optical and Magnetic Materials (95 citations). David Eon has collaborated with scholars based in France, Spain and Japan. Frequent co-authors include Etienne Gheeraert, Julien Pernot, Nicolas Rouger, Gauthier Chicot, D. Araújo, Pierre Muret, Aboulaye Traoré, Alexandre Fiori, Christophe Cardinaud and Gilles Cartry. Their work appears in journals such as Diamond and Related Materials, Applied Physics Letters, physica status solidi (a), Journal of Applied Physics and Applied Surface Science.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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