Kurt Ronse
Impact in
- Surfaces, Coatings and Films top 2%
- Electron and X-Ray Spectroscopy Techniques
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- Advancements in Photolithography Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- Semiconductor materials and devices
- Advancements in Semiconductor Devices and Circuit Design
- 3D IC and TSV technologies
Papers in
-
- Advancements in Photolithography Techniques 123
- Integrated Circuits and Semiconductor Failure Analysis 53
- 3D IC and TSV technologies 17
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- Electron and X-Ray Spectroscopy Techniques 39
- Optical Coatings and Gratings 18
- Co-authors
- R. Jonckheere (45 shared papers)Eric Hendrickx (21 shared papers)Geert Vandenberghe (34 shared papers)Luc Van den hove (29 shared papers)Julien Ryckaert (9 shared papers)Jan Hermans (15 shared papers)Gian F. Lorusso (13 shared papers)Alan Myers (9 shared papers)
- Journals
- Microelectronic Engineering (12 papers)Journal of Photopolymer Science and Technology (12 papers)IEEE Transactions on Circuits and Systems I Regular Papers (1 paper)Micro and Nano Engineering (1 paper)Japanese Journal of Applied Physics (1 paper)
- Partner nations
- BelgiumUnited StatesNetherlands
In The Last Decade
Kurt Ronse
123 papers receiving 845 citations
Peers
Comparison fields: 5 of 50
- Surfaces, Coatings and Films 293
- Electrical and Electronic Engineering 846
- Hardware and Architecture 49
- Industrial and Manufacturing Engineering 63
- Biomedical Engineering 271
Countries citing papers authored by Kurt Ronse
This map shows the geographic impact of Kurt Ronse's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Kurt Ronse with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Kurt Ronse more than expected).
Fields of papers citing papers by Kurt Ronse
This network shows the impact of papers produced by Kurt Ronse. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Kurt Ronse. The network helps show where Kurt Ronse may publish in the future.
Co-authors
The 25 scholars most cited alongside Kurt Ronse, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 132 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 2020 | 84 | |
| 2 | 2007 | 37 | |
| 3 | 2003 | 30 | |
| 4 | 1999 | 28 | |
| 5 | 2015 | 27 | |
| 6 | 2006 | 25 | |
| 7 | 2015 | 24 | |
| 8 | 2001 | 24 | |
| 9 | 2007 | 24 | |
| 10 | 2007 | 23 | |
| 11 | 2009 | 23 | |
| 12 | 2014 | 21 | |
| 13 | 2011 | 20 | |
| 14 | 2008 | 20 | |
| 15 | 2012 | 19 | |
| 16 | 2010 | 18 | |
| 17 | 2008 | 17 | |
| 18 | 2013 | 17 | |
| 19 | 2007 | 17 | |
| 20 | 2015 | 17 |
About Kurt Ronse
Kurt Ronse is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films, Biomedical Engineering, Mechanical Engineering and Industrial and Manufacturing Engineering, having authored 132 papers that have together received 934 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (123 papers), Integrated Circuits and Semiconductor Failure Analysis (53 papers), Electron and X-Ray Spectroscopy Techniques (39 papers), Nanofabrication and Lithography Techniques (20 papers), Optical Coatings and Gratings (18 papers), Advanced Surface Polishing Techniques (17 papers), 3D IC and TSV technologies (17 papers) and Advanced optical system design (16 papers). The work is most often cited by research in Surfaces, Coatings and Films (293 citations), Electrical and Electronic Engineering (846 citations), Hardware and Architecture (49 citations), Industrial and Manufacturing Engineering (63 citations) and Biomedical Engineering (271 citations). Kurt Ronse has collaborated with scholars based in Belgium, United States and Netherlands. Frequent co-authors include R. Jonckheere, Eric Hendrickx, Geert Vandenberghe, Luc Van den hove, Julien Ryckaert, Jan Hermans, Gian F. Lorusso, Alan Myers, Diederik Verkest and Naoto Horiguchi. Their work appears in journals such as Microelectronic Engineering, Journal of Photopolymer Science and Technology, IEEE Transactions on Circuits and Systems I Regular Papers, Micro and Nano Engineering and Japanese Journal of Applied Physics.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.