Kurt Ronse

1.4k citations
132 papers · 920 · h-index 18

Impact in

    • Electron and X-Ray Spectroscopy Techniques
    • Advancements in Photolithography Techniques
    • Integrated Circuits and Semiconductor Failure Analysis
    • Semiconductor materials and devices
    • Advancements in Semiconductor Devices and Circuit Design
    • 3D IC and TSV technologies

Papers in

Kurt Ronse

122 papers receiving 831 citations

Peers

Kurt Ronse
Comparison fields: 5 of 49
  • Surfaces, Coatings and Films 292
  • Electrical and Electronic Engineering 836
  • Hardware and Architecture 49
  • Industrial and Manufacturing Engineering 62
  • Biomedical Engineering 269
Replace Mircea Dusa with:
Mircea Dusa Netherlands
Jo Finders Netherlands
Yayi Wei China
Donis G. Flagello United States
Kafai Lai United States
Yunfei Deng United States
Jan van Schoot Netherlands
Naoya Hayashi Japan
Winfried Kaiser Germany
John A. Allgair United States
Kurt Ronse relative to Mircea Dusa Netherlands Mircea Dusa's profile →
Citations per field
00.5×7.5×
Mircea Dusa · 1×
Citations per year

Countries citing papers authored by Kurt Ronse

Since Specialization
Citations

This map shows the geographic impact of Kurt Ronse's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Kurt Ronse with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Kurt Ronse more than expected).

Fields of papers citing papers by Kurt Ronse

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Kurt Ronse. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Kurt Ronse. The network helps show where Kurt Ronse may publish in the future.

Co-authors

The 25 scholars most cited alongside Kurt Ronse, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Kurt Ronse Line = papers co-authored together Kurt Ronse links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown

Showing the 20 most-cited of 132 papers — load more, or switch the sort, to bring in the rest.

#Work
1 202082
2 200736
3 200330
4 201526
5 199926
6 200624
7 200724
8 201524
9 200124
10 200923
11 200723
12 201421
13 201120
14 200820
15 201219
16 201018
17 200717
18 201317
19 201517
20 200817

About Kurt Ronse

Kurt Ronse is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films, Biomedical Engineering, Mechanical Engineering and Industrial and Manufacturing Engineering, having authored 132 papers that have together received 920 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (123 papers), Integrated Circuits and Semiconductor Failure Analysis (53 papers), Electron and X-Ray Spectroscopy Techniques (39 papers), Nanofabrication and Lithography Techniques (20 papers), Optical Coatings and Gratings (18 papers), 3D IC and TSV technologies (17 papers), Advanced Surface Polishing Techniques (17 papers) and Advanced optical system design (16 papers). The work is most often cited by research in Surfaces, Coatings and Films (292 citations), Electrical and Electronic Engineering (836 citations), Hardware and Architecture (49 citations), Industrial and Manufacturing Engineering (62 citations) and Biomedical Engineering (269 citations). Kurt Ronse has collaborated with scholars based in Belgium, United States and Netherlands. Frequent co-authors include R. Jonckheere, Eric Hendrickx, Geert Vandenberghe, Luc Van den hove, Julien Ryckaert, Jan Hermans, Gian F. Lorusso, Alan Myers, Diederik Verkest and Zsolt Tökei. Their work appears in journals such as Microelectronic Engineering, Journal of Photopolymer Science and Technology, Japanese Journal of Applied Physics, Micro and Nano Engineering and Comptes Rendus Physique.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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