John Dukovic

2.5k citations
22 papers · 1.9k · 1 hit paper · h-index 14

Impact in

Papers in

    • Electrodeposition and Electroless Coatings 11
    • Electronic Packaging and Soldering Technologies 8
    • 3D IC and TSV technologies 6
    • Integrated Circuits and Semiconductor Failure Analysis 5
    • Semiconductor materials and devices 3
    • Anodic Oxide Films and Nanostructures 5

John Dukovic

22 papers receiving 1.8k citations

John Dukovic's Hit Papers

Damascene copper electroplating for chip interconnections 1998 · 1.0k citations
1.0k0+9+18Years since publication2505007501000

Peers

John Dukovic
Comparison fields: 5 of 63
  • Electrochemistry 289
  • Electronic, Optical and Magnetic Materials 623
  • Electrical and Electronic Engineering 1.6k
  • Metals and Alloys 40
  • Materials Chemistry 686
Replace Tokihiko Yokoshima with:
Tokihiko Yokoshima Japan
H. Cesiulis Lithuania
M.G. Pavlović Serbia
P. C. Andricacos United States
Hariklia Deligianni United States
Yoed Tsur Israel
Glenn O. Mallory United States
Bin He China
Tatsuya Iwasaki Japan
K. Ranganathan India
John Dukovic relative to Tokihiko Yokoshima Japan Tokihiko Yokoshima's profile →
Citations per field
00.5×
Tokihiko Yokoshima · 1×
Citations per year

Countries citing papers authored by John Dukovic

Since Specialization
Citations

This map shows the geographic impact of John Dukovic's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by John Dukovic with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites John Dukovic more than expected).

Fields of papers citing papers by John Dukovic

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by John Dukovic. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by John Dukovic. The network helps show where John Dukovic may publish in the future.

Co-authors

The 25 scholars most cited alongside John Dukovic, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with John Dukovic Line = papers co-authored together John Dukovic links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown

Showing the 20 most-cited of 22 papers — load more, or switch the sort, to bring in the rest.

#Work
1
Damascene copper electroplating for chip interconnections
Hit paper breakdown →
19981016
2 2002196
3 1987194
4 198995
5 199062
6 199260
7 200953
8 199348
9 199340
10 199036
11 199032
12 199230
13 201222
14 201020
15
Electrochemical Microfabrication II
19928
16 19983
17 20043
18 19913
19 20023
20 20082

About John Dukovic

John Dukovic is a scholar working on Electrical and Electronic Engineering, Materials Chemistry, Electronic, Optical and Magnetic Materials, Electrochemistry and Atomic and Molecular Physics, and Optics, having authored 22 papers that have together received 1.9k indexed citations. Recurring topics across this work include Electrodeposition and Electroless Coatings (11 papers), Electronic Packaging and Soldering Technologies (8 papers), 3D IC and TSV technologies (6 papers), Anodic Oxide Films and Nanostructures (5 papers), Integrated Circuits and Semiconductor Failure Analysis (5 papers), Copper Interconnects and Reliability (5 papers), Electrochemical Analysis and Applications (4 papers) and Semiconductor materials and devices (3 papers). The work is most often cited by research in Electrochemistry (289 citations), Electronic, Optical and Magnetic Materials (623 citations), Electrical and Electronic Engineering (1.6k citations), Metals and Alloys (40 citations) and Materials Chemistry (686 citations). John Dukovic has collaborated with scholars based in United States, Germany and Israel. Frequent co-authors include P. C. Andricacos, Cyprian Uzoh, Hariklia Deligianni, Jean Horkans, Charles W. Tobias, L. T. Romankiw, S. Mehdizadeh, H. Y. Cheh, A. Simon and H. Rathore. Their work appears in journals such as Journal of The Electrochemical Society, IBM Journal of Research and Development, The Electrochemical Society Interface, IEEE Transactions on Device and Materials Reliability and ECS Transactions.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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