G. Ruhl
Impact in
- Materials Chemistry top 10%
- Graphene research and applications
- 2D Materials and Applications
- Electronic and Structural Properties of Oxides
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- Semiconductor materials and devices
- Ferroelectric and Negative Capacitance Devices
- Advanced Memory and Neural Computing
Papers in
-
- Semiconductor materials and devices 23
- Advancements in Photolithography Techniques 11
- Ferroelectric and Negative Capacitance Devices 10
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- Graphene research and applications 6
- Ferroelectric and Piezoelectric Materials 6
- Co-authors
- Christian Wenger (15 shared papers)Mindaugas Lukosius (14 shared papers)I. Costina (4 shared papers)Max C. Lemme (3 shared papers)Grzegorz Łupina (3 shared papers)Christophe Müller (1 shared paper)Sam Vaziri (2 shared papers)Wolfgang Mehr (2 shared papers)
- Journals
- Microelectronic Engineering (5 papers)Thin Solid Films (3 papers)Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena (2 papers)ECS Journal of Solid State Science and Technology (2 papers)Applied Surface Science (1 paper)
- Partner nations
- GermanyUnited StatesLithuania
In The Last Decade
G. Ruhl
37 papers receiving 675 citations
Peers
Comparison fields: 5 of 42
- Materials Chemistry 475
- Electrical and Electronic Engineering 428
- Electronic, Optical and Magnetic Materials 114
- Polymers and Plastics 73
- Surfaces, Coatings and Films 32
Countries citing papers authored by G. Ruhl
This map shows the geographic impact of G. Ruhl's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by G. Ruhl with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites G. Ruhl more than expected).
Fields of papers citing papers by G. Ruhl
This network shows the impact of papers produced by G. Ruhl. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by G. Ruhl. The network helps show where G. Ruhl may publish in the future.
Co-authors
The 25 scholars most cited alongside G. Ruhl, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 39 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 2015 | 239 | |
| 2 | 1998 | 94 | |
| 3 | 1995 | 50 | |
| 4 | 2014 | 40 | |
| 5 | 2015 | 32 | |
| 6 | 2009 | 28 | |
| 7 | 2017 | 26 | |
| 8 | 1996 | 26 | |
| 9 | 2011 | 13 | |
| 10 | 2011 | 12 | |
| 11 | 2011 | 12 | |
| 12 | 1995 | 11 | |
| 13 | 2000 | 11 | |
| 14 | 2014 | 9 | |
| 15 | 2010 | 9 | |
| 16 | 2019 | 9 | |
| 17 | 2012 | 9 | |
| 18 | 2012 | 8 | |
| 19 | 2011 | 7 | |
| 20 | 2002 | 7 |
About G. Ruhl
G. Ruhl is a scholar working on Electrical and Electronic Engineering, Materials Chemistry, Electronic, Optical and Magnetic Materials, Mechanics of Materials and Surfaces, Coatings and Films, having authored 39 papers that have together received 696 indexed citations. Recurring topics across this work include Semiconductor materials and devices (23 papers), Copper Interconnects and Reliability (13 papers), Advancements in Photolithography Techniques (11 papers), Ferroelectric and Negative Capacitance Devices (10 papers), Metal and Thin Film Mechanics (7 papers), Electron and X-Ray Spectroscopy Techniques (6 papers), Graphene research and applications (6 papers) and Ferroelectric and Piezoelectric Materials (6 papers). The work is most often cited by research in Materials Chemistry (475 citations), Electrical and Electronic Engineering (428 citations), Electronic, Optical and Magnetic Materials (114 citations), Polymers and Plastics (73 citations) and Surfaces, Coatings and Films (32 citations). G. Ruhl has collaborated with scholars based in Germany, United States and Lithuania. Frequent co-authors include Christian Wenger, Mindaugas Lukosius, I. Costina, Max C. Lemme, Grzegorz Łupina, Christophe Müller, Sam Vaziri, Wolfgang Mehr, Mikael Östling and Amit Gahoi. Their work appears in journals such as Microelectronic Engineering, Thin Solid Films, Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena, ECS Journal of Solid State Science and Technology and Applied Surface Science.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.