F. Roozeboom

8.3k citations
214 papers · 7.2k · h-index 45

Impact in

Papers in

    • Semiconductor materials and devices 120
    • Silicon and Solar Cell Technologies 40
    • Thin-Film Transistor Technologies 27
    • Electronic and Structural Properties of Oxides 44
    • Catalytic Processes in Materials Science 28
    • ZnO doping and properties 21

F. Roozeboom

209 papers receiving 7.0k citations

Peers

F. Roozeboom
Comparison fields: 5 of 85
  • Catalysis 669
  • Electrical and Electronic Engineering 5.5k
  • Materials Chemistry 3.8k
  • Electronic, Optical and Magnetic Materials 1.1k
  • Atomic and Molecular Physics, and Optics 1.1k
Replace Shishen Yan with:
Shishen Yan China
Bernard A. Boukamp Netherlands
A. Chroneos United Kingdom
Xiahan Sang China
Daisuke Mori Japan
Vladan Stevanović United States
Si‐Young Choi South Korea
Andriy Zakutayev United States
Zhufeng Hou China
Dongzhi Chi Singapore
F. Roozeboom relative to Shishen Yan China Shishen Yan's profile →
Citations per field
00.5×1.5×
Shishen Yan · 1×
Citations per year

Countries citing papers authored by F. Roozeboom

Since Specialization
Citations

This map shows the geographic impact of F. Roozeboom's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by F. Roozeboom with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites F. Roozeboom more than expected).

Fields of papers citing papers by F. Roozeboom

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by F. Roozeboom. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by F. Roozeboom. The network helps show where F. Roozeboom may publish in the future.

Co-authors

The 25 scholars most cited alongside F. Roozeboom, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with F. Roozeboom Line = papers co-authored together F. Roozeboom links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown

Showing the 20 most-cited of 214 papers — load more, or switch the sort, to bring in the rest.

#Work
1 1980353
2 2011333
3 2008305
4 2007304
5 2010293
6 1999276
7 2007249
8 2017169
9 2015133
10 2008133
11 1979119
12 2007116
13 1996116
14 2011101
15 2006100
16 198197
17 200894
18 201692
19 199891
20 199091

About F. Roozeboom

F. Roozeboom is a scholar working on Electrical and Electronic Engineering, Materials Chemistry, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials and Mechanical Engineering, having authored 214 papers that have together received 7.2k indexed citations. Recurring topics across this work include Semiconductor materials and devices (120 papers), Electronic and Structural Properties of Oxides (44 papers), Silicon and Solar Cell Technologies (40 papers), Semiconductor materials and interfaces (32 papers), Catalytic Processes in Materials Science (28 papers), Thin-Film Transistor Technologies (27 papers), ZnO doping and properties (21 papers) and Copper Interconnects and Reliability (18 papers). The work is most often cited by research in Catalysis (669 citations), Electrical and Electronic Engineering (5.5k citations), Materials Chemistry (3.8k citations), Electronic, Optical and Magnetic Materials (1.1k citations) and Atomic and Molecular Physics, and Optics (1.1k citations). F. Roozeboom has collaborated with scholars based in Netherlands, Belgium and Finland. Frequent co-authors include W. M. M. Kessels, Paul Poodt, R.A.H. Niessen, Peter H. L. Notten, Loïc Baggetto, M. C. M. van de Sanden, A. Illiberi, J.H. Klootwijk, Harm C. M. Knoops and S. B. S. Heil. Their work appears in journals such as Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Applied Physics Letters, Journal of Applied Physics, Journal of The Electrochemical Society and ECS Journal of Solid State Science and Technology.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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