F. Leverd

1.4k citations
36 papers · 413 · h-index 11

Impact in

    • Semiconductor materials and devices
    • Advancements in Semiconductor Devices and Circuit Design
    • Integrated Circuits and Semiconductor Failure Analysis
    • Plasma Diagnostics and Applications
    • Silicon Carbide Semiconductor Technologies
    • Thin-Film Transistor Technologies

Papers in

    • Semiconductor materials and devices 23
    • Advancements in Semiconductor Devices and Circuit Design 18
    • Integrated Circuits and Semiconductor Failure Analysis 14
    • Photonic and Optical Devices 4
    • 3D IC and TSV technologies 4
    • Advancements in Photolithography Techniques 3
    • Silicon and Solar Cell Technologies 3
    • Semiconductor materials and interfaces 5

F. Leverd

30 papers receiving 386 citations

Peers

F. Leverd
Comparison fields: 5 of 28
  • Electrical and Electronic Engineering 408
  • Instrumentation 6
  • Biomedical Engineering 71
  • Atomic and Molecular Physics, and Optics 46
  • Surfaces, Coatings and Films 10
Replace F.N. Cubaynes with:
F.N. Cubaynes Belgium
Yee-Chia Yeo Singapore
K. Rim United States
G. Fuse Japan
C. Weber United States
Naoki Mitsugi Japan
J.F. Nijs Belgium
C. Arvet France
P. Charvát United States
F. Leverd relative to F.N. Cubaynes Belgium F.N. Cubaynes's profile →
Citations per field
00.5×1.5×2×2.5×
F.N. Cubaynes · 1×
Citations per year

Countries citing papers authored by F. Leverd

Since Specialization
Citations

This map shows the geographic impact of F. Leverd's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by F. Leverd with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites F. Leverd more than expected).

Fields of papers citing papers by F. Leverd

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by F. Leverd. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by F. Leverd. The network helps show where F. Leverd may publish in the future.

Co-authors

The 25 scholars most cited alongside F. Leverd, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with F. Leverd Line = papers co-authored together F. Leverd links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown

Showing the 20 most-cited of 36 papers — load more, or switch the sort, to bring in the rest.

#Work
1 200346
2 200245
3 200238
4 201336
5 200436
6 200626
7 201424
8 200321
9 200419
10 201018
11 201416
12 201410
13 200510
14 20209
15 20089
16 20138
17 20057
18 20046
19 20035
20 20034

About F. Leverd

F. Leverd is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials and Biomedical Engineering, having authored 36 papers that have together received 413 indexed citations. Recurring topics across this work include Semiconductor materials and devices (23 papers), Advancements in Semiconductor Devices and Circuit Design (18 papers), Integrated Circuits and Semiconductor Failure Analysis (14 papers), Semiconductor materials and interfaces (5 papers), Photonic and Optical Devices (4 papers), 3D IC and TSV technologies (4 papers), Advancements in Photolithography Techniques (3 papers) and Silicon and Solar Cell Technologies (3 papers). The work is most often cited by research in Electrical and Electronic Engineering (408 citations), Instrumentation (6 citations), Biomedical Engineering (71 citations), Atomic and Molecular Physics, and Optics (46 citations) and Surfaces, Coatings and Films (10 citations). F. Leverd has collaborated with scholars based in France, Switzerland and United States. Frequent co-authors include T. Skotnicki, Romuald Blanc, D. Dutartre, O. Joubert, R. Pantel, S. Monfray, Y. Morand, D. Louis, M. Rivoire and C. Vizioz. Their work appears in journals such as Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena, Solid-State Electronics, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Materials Science in Semiconductor Processing and IEEE Transactions on Nanotechnology.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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