Douglas Yu

1.7k citations
58 papers · 1.2k · h-index 19

Impact in

    • 3D IC and TSV technologies
    • Electronic Packaging and Soldering Technologies
    • Semiconductor materials and devices
    • Electromagnetic Compatibility and Noise Suppression
    • Semiconductor Lasers and Optical Devices
    • VLSI and FPGA Design Techniques

Papers in

    • 3D IC and TSV technologies 40
    • Semiconductor materials and devices 20
    • Electronic Packaging and Soldering Technologies 16
    • Integrated Circuits and Semiconductor Failure Analysis 6
    • Semiconductor Lasers and Optical Devices 6
    • Photonic and Optical Devices 6
    • Electromagnetic Compatibility and Noise Suppression 6
    • Copper Interconnects and Reliability 11
Journals
IEEE Transactions on Electron Devices (3 papers)2021 IEEE International Electron Devices Meeting (IEDM) (1 paper)Symposium on VLSI Technology (1 paper)2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits) (1 paper)2022 IEEE 72nd Electronic Components and Technology Conference (ECTC) (1 paper)
Partner nations
TaiwanUnited StatesChina

In The Last Decade

Douglas Yu

54 papers receiving 1.1k citations

Peers

Douglas Yu
Comparison fields: 5 of 39
  • Electrical and Electronic Engineering 1.1k
  • Hardware and Architecture 115
  • Electronic, Optical and Magnetic Materials 147
  • Automotive Engineering 93
  • Computer Networks and Communications 78
Replace R. Polastre with:
R. Polastre United States
B. Dang United States
Seung Wook Yoon Singapore
E. Sprogis United States
Anne Jourdain Belgium
Katsuyuki Sakuma Japan
Cornelia Tsang United States
R. Horton United States
Michele Stucchi Belgium
S.J. Souri United States
Douglas Yu relative to R. Polastre United States R. Polastre's profile →
Citations per field
00.5×4.2×
R. Polastre · 1×
Citations per year

Countries citing papers authored by Douglas Yu

Since Specialization
Citations

This map shows the geographic impact of Douglas Yu's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Douglas Yu with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Douglas Yu more than expected).

Fields of papers citing papers by Douglas Yu

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Douglas Yu. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Douglas Yu. The network helps show where Douglas Yu may publish in the future.

Co-authors

The 25 scholars most cited alongside Douglas Yu, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Douglas Yu Line = papers co-authored together Douglas Yu links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown

Showing the 20 most-cited of 58 papers — load more, or switch the sort, to bring in the rest.

#Work
1 2016195
2 2017139
3 2012101
4 202155
5 202050
6 201544
7 201842
8 201935
9 202034
10 202033
11 201828
12 202128
13 202026
14 201626
15 201422
16 202119
17 202018
18 202118
19 201618
20 202318

About Douglas Yu

Douglas Yu is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Hardware and Architecture, Mechanics of Materials and Atomic and Molecular Physics, and Optics, having authored 58 papers that have together received 1.2k indexed citations. Recurring topics across this work include 3D IC and TSV technologies (40 papers), Semiconductor materials and devices (20 papers), Electronic Packaging and Soldering Technologies (16 papers), Copper Interconnects and Reliability (11 papers), Integrated Circuits and Semiconductor Failure Analysis (6 papers), Semiconductor Lasers and Optical Devices (6 papers), Photonic and Optical Devices (6 papers) and Electromagnetic Compatibility and Noise Suppression (6 papers). The work is most often cited by research in Electrical and Electronic Engineering (1.1k citations), Hardware and Architecture (115 citations), Electronic, Optical and Magnetic Materials (147 citations), Automotive Engineering (93 citations) and Computer Networks and Communications (78 citations). Douglas Yu has collaborated with scholars based in Taiwan, United States and China. Frequent co-authors include Chuei-Tang Wang, W.C. Chiou, C. T. Wang, Chung-Hao Tsai, K. C. Ting, S. Y. Hou, Christine Chiu, Cheng‐Hsien Wu, Cheng‐Chieh Hsieh and Chung-Hsien Tsai. Their work appears in journals such as IEEE Transactions on Electron Devices, 2021 IEEE International Electron Devices Meeting (IEDM), Symposium on VLSI Technology, 2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits) and 2022 IEEE 72nd Electronic Components and Technology Conference (ECTC).

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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