Mark C. Hakey
Impact in
- Hardware and Architecture top 10%
- VLSI and Analog Circuit Testing
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- Radiation Effects in Electronics
- Semiconductor materials and devices
- Integrated Circuits and Semiconductor Failure Analysis
- Advancements in Semiconductor Devices and Circuit Design
- Advancements in Photolithography Techniques
Papers in
-
- Integrated Circuits and Semiconductor Failure Analysis 6
- Advancements in Photolithography Techniques 6
- Semiconductor materials and devices 3
- Advancements in Semiconductor Devices and Circuit Design 2
- Radiation Effects in Electronics 2
-
- Nanofabrication and Lithography Techniques 2
- Co-authors
- M.R. Shaneyfelt (4 shared papers)David F. Heidel (4 shared papers)P.E. Dodd (4 shared papers)Paul W. Marshall (4 shared papers)Kenneth A. LaBel (4 shared papers)James R. Schwank (4 shared papers)Kenneth P. Rodbell (4 shared papers)M.A. Xapsos (2 shared papers)
- Journals
- IEEE Transactions on Nuclear Science (3 papers)IBM Journal of Research and Development (1 paper)Journal of Electronic Materials (1 paper)Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (4 papers)
- Partner nations
- United StatesNetherlands
In The Last Decade
Mark C. Hakey
10 papers receiving 356 citations
Peers
Comparison fields: 5 of 41
- Hardware and Architecture 74
- Electrical and Electronic Engineering 355
- Radiation 49
- Nuclear and High Energy Physics 28
- Surfaces, Coatings and Films 13
Countries citing papers authored by Mark C. Hakey
This map shows the geographic impact of Mark C. Hakey's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Mark C. Hakey with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Mark C. Hakey more than expected).
Fields of papers citing papers by Mark C. Hakey
This network shows the impact of papers produced by Mark C. Hakey. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Mark C. Hakey. The network helps show where Mark C. Hakey may publish in the future.
Co-authors
The 25 scholars most cited alongside Mark C. Hakey, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 2009 | 137 | |
| 2 | 2008 | 135 | |
| 3 | 2010 | 30 | |
| 4 | 1997 | 23 | |
| 5 | 1990 | 21 | |
| 6 | 1990 | 20 | |
| 7 | 1999 | 5 | |
| 8 | 1982 | 3 | |
| 9 | 1993 | 3 | |
| 10 | 2009 | 2 | |
| 11 | 1982 | 1 |
About Mark C. Hakey
Mark C. Hakey is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering, Hardware and Architecture, Materials Chemistry and Atomic and Molecular Physics, and Optics, having authored 11 papers that have together received 380 indexed citations. Recurring topics across this work include Integrated Circuits and Semiconductor Failure Analysis (6 papers), Advancements in Photolithography Techniques (6 papers), Semiconductor materials and devices (3 papers), VLSI and Analog Circuit Testing (2 papers), Diamond and Carbon-based Materials Research (2 papers), Advancements in Semiconductor Devices and Circuit Design (2 papers), Nanofabrication and Lithography Techniques (2 papers) and Radiation Effects in Electronics (2 papers). The work is most often cited by research in Hardware and Architecture (74 citations), Electrical and Electronic Engineering (355 citations), Radiation (49 citations), Nuclear and High Energy Physics (28 citations) and Surfaces, Coatings and Films (13 citations). Mark C. Hakey has collaborated with scholars based in United States and Netherlands. Frequent co-authors include M.R. Shaneyfelt, David F. Heidel, P.E. Dodd, Paul W. Marshall, Kenneth A. LaBel, James R. Schwank, Kenneth P. Rodbell, M.A. Xapsos, Melanie D. Berg and Anthony Phan. Their work appears in journals such as IEEE Transactions on Nuclear Science, IBM Journal of Research and Development, Journal of Electronic Materials and Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.