Mark Neisser
Impact in
- Surfaces, Coatings and Films top 1%
- Electron and X-Ray Spectroscopy Techniques
- Optical Coatings and Gratings
-
- Advancements in Photolithography Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- Semiconductor materials and devices
Papers in
-
- Advancements in Photolithography Techniques 74
- Integrated Circuits and Semiconductor Failure Analysis 30
- Semiconductor materials and devices 14
-
- Electron and X-Ray Spectroscopy Techniques 28
- Optical Coatings and Gratings 11
- Co-authors
- Stefan Wurm (4 shared papers)Umberto Celano (3 shared papers)C. Beitia (2 shared papers)Ndubuisi G. Orji (3 shared papers)Robert L. Brainard (14 shared papers)Yaw S. Obeng (2 shared papers)R. Joseph Kline (2 shared papers)Mustafa Badaroglu (2 shared papers)
- Journals
- Journal of Photopolymer Science and Technology (10 papers)Journal of Micro/Nanolithography MEMS and MOEMS (4 papers)Nature Electronics (2 papers)Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena (2 papers)Journal of the American Chemical Society (1 paper)
- Partner nations
- United StatesSwitzerlandChina
In The Last Decade
Mark Neisser
84 papers receiving 1.1k citations
Peers
Comparison fields: 5 of 73
- Surfaces, Coatings and Films 421
- Electrical and Electronic Engineering 923
- Structural Biology 18
- Biomedical Engineering 422
- Radiation 46
Countries citing papers authored by Mark Neisser
This map shows the geographic impact of Mark Neisser's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Mark Neisser with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Mark Neisser more than expected).
Fields of papers citing papers by Mark Neisser
This network shows the impact of papers produced by Mark Neisser. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Mark Neisser. The network helps show where Mark Neisser may publish in the future.
Co-authors
The 25 scholars most cited alongside Mark Neisser, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 89 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 2018 | 323 | |
| 2 | 2015 | 87 | |
| 3 | 2021 | 52 | |
| 4 | 2014 | 49 | |
| 5 | 2015 | 46 | |
| 6 | 2015 | 46 | |
| 7 | 2015 | 43 | |
| 8 | 1981 | 42 | |
| 9 | 2015 | 41 | |
| 10 | 1998 | 29 | |
| 11 | 1992 | 25 | |
| 12 | 2015 | 24 | |
| 13 | 2015 | 19 | |
| 14 | 2015 | 18 | |
| 15 | 2013 | 16 | |
| 16 | 2012 | 16 | |
| 17 | 2015 | 15 | |
| 18 | 2015 | 15 | |
| 19 | 2012 | 14 | |
| 20 | 2015 | 13 |
About Mark Neisser
Mark Neisser is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films, Biomedical Engineering, Polymers and Plastics and Electronic, Optical and Magnetic Materials, having authored 89 papers that have together received 1.2k indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (74 papers), Integrated Circuits and Semiconductor Failure Analysis (30 papers), Electron and X-Ray Spectroscopy Techniques (28 papers), Nanofabrication and Lithography Techniques (21 papers), Semiconductor materials and devices (14 papers), Advanced Surface Polishing Techniques (11 papers), Optical Coatings and Gratings (11 papers) and Copper Interconnects and Reliability (8 papers). The work is most often cited by research in Surfaces, Coatings and Films (421 citations), Electrical and Electronic Engineering (923 citations), Structural Biology (18 citations), Biomedical Engineering (422 citations) and Radiation (46 citations). Mark Neisser has collaborated with scholars based in United States, Switzerland and China. Frequent co-authors include Stefan Wurm, Umberto Celano, C. Beitia, Ndubuisi G. Orji, Robert L. Brainard, Yaw S. Obeng, R. Joseph Kline, Mustafa Badaroglu, B Bunday and András Vládar. Their work appears in journals such as Journal of Photopolymer Science and Technology, Journal of Micro/Nanolithography MEMS and MOEMS, Nature Electronics, Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena and Journal of the American Chemical Society.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.