David E. Seeger
Impact in
- Surfaces, Coatings and Films top 5%
- Electron and X-Ray Spectroscopy Techniques
- Computational Mechanics top 5%
- Laser Material Processing Techniques
Papers in
-
- Advancements in Photolithography Techniques 29
- 3D IC and TSV technologies 7
- Integrated Circuits and Semiconductor Failure Analysis 5
-
- Electron and X-Ray Spectroscopy Techniques 18
- Co-authors
- Bodil Braren (4 shared papers)R. Srinivasan (3 shared papers)R. W. Dreyfus (2 shared papers)Jerome A. Berson (5 shared papers)L. M. HADEL (1 shared paper)Karen Petrillo (7 shared papers)Hiroshi Itô (3 shared papers)Ratnam Sooriyakumaran (2 shared papers)
- Journals
- Microelectronic Engineering (6 papers)Journal of the American Chemical Society (4 papers)IBM Journal of Research and Development (2 papers)Applied Physics Letters (1 paper)Journal of Micro/Nanolithography MEMS and MOEMS (1 paper)
- Partner nations
- United StatesGermany
In The Last Decade
David E. Seeger
44 papers receiving 719 citations
Peers
Comparison fields: 5 of 68
- Surfaces, Coatings and Films 101
- Computational Mechanics 209
- Ophthalmology 76
- Electrical and Electronic Engineering 407
- Physical and Theoretical Chemistry 58
Countries citing papers authored by David E. Seeger
This map shows the geographic impact of David E. Seeger's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by David E. Seeger with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites David E. Seeger more than expected).
Fields of papers citing papers by David E. Seeger
This network shows the impact of papers produced by David E. Seeger. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by David E. Seeger. The network helps show where David E. Seeger may publish in the future.
Co-authors
The 25 scholars most cited alongside David E. Seeger, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 45 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 1986 | 164 | |
| 2 | 1986 | 147 | |
| 3 | 1994 | 78 | |
| 4 | 1986 | 46 | |
| 5 | 1982 | 44 | |
| 6 | 1989 | 21 | |
| 7 | 2002 | 21 | |
| 8 | 1993 | 20 | |
| 9 | 2004 | 19 | |
| 10 | 1983 | 19 | |
| 11 | 1997 | 18 | |
| 12 | 1990 | 18 | |
| 13 | 1986 | 15 | |
| 14 | 1988 | 13 | |
| 15 | 1981 | 13 | |
| 16 | Emerging Lithographic Technologies | 1997 | 11 |
| 17 | 1990 | 11 | |
| 18 | 1988 | 11 | |
| 19 | 1992 | 9 | |
| 20 | 1983 | 9 |
About David E. Seeger
David E. Seeger is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films, Biomedical Engineering, Computational Mechanics and Mechanical Engineering, having authored 45 papers that have together received 790 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (29 papers), Electron and X-Ray Spectroscopy Techniques (18 papers), 3D IC and TSV technologies (7 papers), Laser Material Processing Techniques (5 papers), Integrated Circuits and Semiconductor Failure Analysis (5 papers), Nanofabrication and Lithography Techniques (5 papers), Welding Techniques and Residual Stresses (4 papers) and Advanced Surface Polishing Techniques (4 papers). The work is most often cited by research in Surfaces, Coatings and Films (101 citations), Computational Mechanics (209 citations), Ophthalmology (76 citations), Electrical and Electronic Engineering (407 citations) and Physical and Theoretical Chemistry (58 citations). David E. Seeger has collaborated with scholars based in United States and Germany. Frequent co-authors include Bodil Braren, R. Srinivasan, R. W. Dreyfus, Jerome A. Berson, L. M. HADEL, Karen Petrillo, Hiroshi Itô, Ratnam Sooriyakumaran, Greg Breyta and Paul M. Lahti. Their work appears in journals such as Microelectronic Engineering, Journal of the American Chemical Society, IBM Journal of Research and Development, Applied Physics Letters and Journal of Micro/Nanolithography MEMS and MOEMS.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.