Dag Andersson
Impact in
- General Materials Science top 2%
-
- Advanced Chemical Physics Studies
- Atomic and Molecular Physics
- Dust and Plasma Wave Phenomena
Papers in
-
- Electronic Packaging and Soldering Technologies 17
- 3D IC and TSV technologies 10
- Plasma Diagnostics and Applications 6
- Silicon Carbide Semiconductor Technologies 5
-
- Advanced Chemical Physics Studies 7
- Co-authors
- S. Torvén (1 shared paper)B. H. Cooper (6 shared papers)J. B. Marston (5 shared papers)Per‐Erik Tegehall (10 shared papers)Aart W. Kleyn (2 shared papers)Udo van Slooten (2 shared papers)Eric A. Gislason (2 shared papers)B. Kasemo (3 shared papers)
- Journals
- Microelectronics Reliability (4 papers)Journal of Physics D Applied Physics (4 papers)Physical review. B, Condensed matter (3 papers)Surface Science (2 papers)Chemical Physics Letters (2 papers)
- Partner nations
- SwedenGermanyUnited States
In The Last Decade
Dag Andersson
58 papers receiving 922 citations
Peers
Comparison fields: 5 of 79
- General Materials Science 62
- Atomic and Molecular Physics, and Optics 387
- Surfaces, Coatings and Films 53
- Electrical and Electronic Engineering 429
- Acoustics and Ultrasonics 6
Countries citing papers authored by Dag Andersson
This map shows the geographic impact of Dag Andersson's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Dag Andersson with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Dag Andersson more than expected).
Fields of papers citing papers by Dag Andersson
This network shows the impact of papers produced by Dag Andersson. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Dag Andersson. The network helps show where Dag Andersson may publish in the future.
Co-authors
The 25 scholars most cited alongside Dag Andersson, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 61 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 2006 | 132 | |
| 2 | 1979 | 91 | |
| 3 | 1993 | 90 | |
| 4 | 2012 | 69 | |
| 5 | 1992 | 48 | |
| 6 | 1996 | 41 | |
| 7 | 1985 | 38 | |
| 8 | 1991 | 32 | |
| 9 | 1981 | 29 | |
| 10 | 2019 | 27 | |
| 11 | Current and future applications for biochar | 2016 | 27 |
| 12 | 1977 | 23 | |
| 13 | 1993 | 22 | |
| 14 | 2005 | 22 | |
| 15 | 2004 | 21 | |
| 16 | 2008 | 18 | |
| 17 | 2005 | 18 | |
| 18 | 1974 | 16 | |
| 19 | 1983 | 14 | |
| 20 | 2009 | 11 |
About Dag Andersson
Dag Andersson is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics, Mechanical Engineering, Materials Chemistry and Automotive Engineering, having authored 61 papers that have together received 964 indexed citations. Recurring topics across this work include Electronic Packaging and Soldering Technologies (17 papers), 3D IC and TSV technologies (10 papers), Advanced Chemical Physics Studies (7 papers), Plasma Diagnostics and Applications (6 papers), Silicon Carbide Semiconductor Technologies (5 papers), Ion-surface interactions and analysis (4 papers), Thermal properties of materials (4 papers) and Metallurgical and Alloy Processes (4 papers). The work is most often cited by research in General Materials Science (62 citations), Atomic and Molecular Physics, and Optics (387 citations), Surfaces, Coatings and Films (53 citations), Electrical and Electronic Engineering (429 citations) and Acoustics and Ultrasonics (6 citations). Dag Andersson has collaborated with scholars based in Sweden, Germany and United States. Frequent co-authors include S. Torvén, B. H. Cooper, J. B. Marston, Per‐Erik Tegehall, Aart W. Kleyn, Udo van Slooten, Eric A. Gislason, B. Kasemo, Johan Liu and L. Walldén. Their work appears in journals such as Microelectronics Reliability, Journal of Physics D Applied Physics, Physical review. B, Condensed matter, Surface Science and Chemical Physics Letters.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.