C.S. Rafferty

3k citations
108 papers · 2.6k · 1 hit paper · h-index 26

Impact in

Papers in

C.S. Rafferty

101 papers receiving 2.4k citations

C.S. Rafferty's Hit Papers

Physical mechanisms of transient enhanced dopant diffusion in ion-implanted silicon 1997 · 516 citations
5160+9+19Years since publication100200300400500

Peers

C.S. Rafferty
Comparison fields: 5 of 81
  • Atomic and Molecular Physics, and Optics 1.3k
  • Electrical and Electronic Engineering 2.1k
  • Computational Mechanics 584
  • Computer Graphics and Computer-Aided Design 84
  • Structural Biology 19
Replace MASSIMO RUDAN with:
MASSIMO RUDAN Italy
Jangwoo Kim South Korea
J.B. Davies United Kingdom
Patrick P Naulleau United States
Peter L. G. Ventzek United States
Sergey A. Babin Russia
Yoonchan Jeong South Korea
Kristin De Meyer Belgium
Catherine G. Caneau United States
Dragica Vasileska United States
C.S. Rafferty relative to MASSIMO RUDAN Italy MASSIMO RUDAN's profile →
Citations per field
00.5×2×4×6×7×
MASSIMO RUDAN · 1×
Citations per year

Countries citing papers authored by C.S. Rafferty

Since Specialization
Citations

This map shows the geographic impact of C.S. Rafferty's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by C.S. Rafferty with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites C.S. Rafferty more than expected).

Fields of papers citing papers by C.S. Rafferty

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by C.S. Rafferty. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by C.S. Rafferty. The network helps show where C.S. Rafferty may publish in the future.

Co-authors

The 25 scholars most cited alongside C.S. Rafferty, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with C.S. Rafferty Line = papers co-authored together C.S. Rafferty links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown

Showing the 20 most-cited of 108 papers — load more, or switch the sort, to bring in the rest.

#Work
1
Physical mechanisms of transient enhanced dopant diffusion in ion-implanted silicon
Hit paper breakdown →
1997516
2 1997186
3 1999131
4 1996125
5 198896
6 199578
7 199374
8 199864
9 198559
10 200354
11 199952
12 199847
13 198942
14 199636
15 199635
16 198533
17 199332
18 200032
19 202132
20 199130

About C.S. Rafferty

C.S. Rafferty is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics, Computational Mechanics, Materials Chemistry and Numerical Analysis, having authored 108 papers that have together received 2.6k indexed citations. Recurring topics across this work include Semiconductor materials and devices (49 papers), Advancements in Semiconductor Devices and Circuit Design (42 papers), Semiconductor materials and interfaces (41 papers), Silicon and Solar Cell Technologies (17 papers), Ion-surface interactions and analysis (10 papers), Fusion materials and technologies (8 papers), Low-power high-performance VLSI design (4 papers) and CCD and CMOS Imaging Sensors (4 papers). The work is most often cited by research in Atomic and Molecular Physics, and Optics (1.3k citations), Electrical and Electronic Engineering (2.1k citations), Computational Mechanics (584 citations), Computer Graphics and Computer-Aided Design (84 citations) and Structural Biology (19 citations). C.S. Rafferty has collaborated with scholars based in United States, France and Spain. Frequent co-authors include H. -J. L. Gossmann, George H. Gilmer, Martín Jaraíz, David J Eaglesham, John M. Poate, R.W. Dutton, Henry S. Luftman, Lourdes Pelaz, Dale C. Jacobson and Mark R. Pinto. Their work appears in journals such as Applied Physics Letters, Journal of Applied Physics, IEEE Transactions on Electron Devices, IEEE Electron Device Letters and Journal of The Electrochemical Society.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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