W.J. Chen

1.9k citations

88 papers · 1.7k · h-index 23

Impact in

Electrical and Electronic Engineering top 5%
- Semiconductor materials and devices
- Ferroelectric and Negative Capacitance Devices
- Advancements in Semiconductor Devices and Circuit Design
- Advanced Memory and Neural Computing
- Electrodeposition and Electroless Coatings
Materials Chemistry top 5%
- Electronic and Structural Properties of Oxides
- Ferroelectric and Piezoelectric Materials

Papers in

Electrical and Electronic Engineering 72
- Semiconductor materials and devices 44
- Ferroelectric and Negative Capacitance Devices 20
- Advancements in Semiconductor Devices and Circuit Design 19
- Electrodeposition and Electroless Coatings 11
- Electronic Packaging and Soldering Technologies 6
Materials Chemistry 31
- Ferroelectric and Piezoelectric Materials 7
- Electronic and Structural Properties of Oxides 7

Co-authors: Albert Chin (45 shared papers)S.H. Hsieh (24 shared papers)Yung‐Hsien Wu (10 shared papers)M.Y. Yang (1 shared paper)C.M. Kwei (1 shared paper)S. P. McAlister (7 shared papers)K.C. Chiang (6 shared papers)F. S. Yeh (8 shared papers)
Journals: IEEE Electron Device Letters (16 papers)Applied Surface Science (11 papers)Journal of The Electrochemical Society (9 papers)Applied Physics Letters (5 papers)IEEE Transactions on Electron Devices (4 papers)
Partner nations: Taiwan United States Singapore

In The Last Decade

W.J. Chen

81 papers receiving 1.6k citations

Peers

Countries citing papers authored by W.J. Chen

Since Specialization

Citations

This map shows the geographic impact of W.J. Chen's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by W.J. Chen with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites W.J. Chen more than expected).

Fields of papers citing papers by W.J. Chen

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by W.J. Chen. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by W.J. Chen. The network helps show where W.J. Chen may publish in the future.

Co-authors

The 25 scholars most cited alongside W.J. Chen, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with W.J. Chen Line = papers co-authored together W.J. Chen links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

Showing the 20 most-cited of 88 papers — load more, or switch the sort, to bring in the rest.

#	Work
1	Electrical characteristics of high quality La₂O₃ gate dielectric with equivalent oxide thickness of 5 /spl Aring/ IEEE Electron Device Letters ·Yung‐Hsien Wu, M.Y. Yang, Albert Chin, W.J. Chen, C.M. Kwei	2000	191
2	Achieving superior strength-ductility balance in a novel heterostructured strong metastable β-Ti alloy International Journal of Plasticity ·Chongle Zhang, Xiangyun Bao, D.D. Zhang, W.J. Chen, Jinyu Zhang, J. Kuang, Gang Liu, Jun Sun	2021	98
3	High-Performance$hboxSrTiO_3$MIM Capacitors for Analog Applications IEEE Transactions on Electron Devices ·K.C. Chiang, C.-C. Huang, G.L. Chen, W.J. Chen, Hsuan‐Ling Kao, Yung‐Hsien Wu, Albert Chin, S. P. McAlister	2006	83
4	Study of Pt catalyst on graphene and its application to fuel cell Applied Surface Science ·S.H. Hsieh, Ming-Tai Hsu, W.L. Liu, W.J. Chen	2013	82
5	Pt-TiO2/graphene photocatalysts for degradation of AO7 dye under visible light Applied Surface Science ·S.H. Hsieh, W.J. Chen, Chen-Tao Wu	2015	76
6	ITO as a Diffusion Barrier Between Si and Cu Journal of The Electrochemical Society ·C. M. Liu, W. L. Liu, W.J. Chen, S.H. Hsieh, T.K. Tsai, Ling Yang	2005	64
7	High Density and Low Leakage Current in $ \hbox{TiO}_{2}$ MIM Capacitors Processed at 300 $^{\circ} \hbox{C}$ IEEE Electron Device Letters ·Chao-Ching Cheng, S. H. Lin, Ke-Yin Jhou, W.J. Chen, C. P. Chou, F. S. Yeh, J. Hu, Moon Jung Hwang, T. Arikado, S. P. McAlister, Albert Chin	2008	63
8	Temperature and pH dependence of the electroless Ni–P deposition on silicon Thin Solid Films ·W.L. Liu, S.H. Hsieh, T.K. Tsai, W.J. Chen, Shin Shyan Wu	2006	54
9	Comparison of MONOS Memory Device Integrity When Using $\hbox{Hf}_{1 - x - y}\hbox{N}_{x}\hbox{O}_{y}$ Trapping Layers With Different N Compositions IEEE Transactions on Electron Devices ·Hongxiao Yang, Chun-Kai Cheng, W.J. Chen, Shih‐Kai Lin, F. S. Yeh, S. P. McAlister, Albert Chin	2008	52
10	Interfacial reactions of electroless nickel thin films on silicon Applied Surface Science ·C.M. Liu, W.L. Liu, S.H. Hsieh, Tsung-Yen Tsai, W.J. Chen	2004	42
11	Microstructure and dielectric properties of dysprosium-doped barium titanate ceramics Cerâmica ·Y. Pu, W.J. Chen, S. Chen, H. T. Langhammer	2005	39
12	Preparation of nanosized ZnO using α brass Applied Surface Science ·W.J. Chen, W.L. Liu, S.H. Hsieh, T.K. Tsai	2007	38
13	Effect of various amounts of graphene oxide on the degradation characteristics of the ZnSe/graphene nanocomposites Applied Surface Science ·S.H. Hsieh, W.J. Chen, Tzu‐Chun Yeh	2015	36
14	High-/spl kappa/ Ir/TiTaO/TaN capacitors suitable for analog IC applications IEEE Electron Device Letters ·K.C. Chiang, Chaoyi Huang, Albert Chin, W.J. Chen, S. P. McAlister, Hsin‐Yi Chiu, Jiann–Ruey Chen, C.C. Chi	2005	32
15	Thin oxides with in situ native oxide removal [n-MOSFETs] IEEE Electron Device Letters ·Albert Chin, W.J. Chen, Tian‐Sheuan Chang, R.H. Kao, Bo-Rong Lin, C. C. Tsai, J.C.-M. Huang	1997	31
16	Fully Silicided NiSi and Germanided NiGe Dual Gates on SiO 2/Si and Al 2O 3/Ge-On-Insulator MOSFETs National University of Singapore ·Cheng-Hsiung Huang, Decai Yu, Albert Chin, Chenqi Wu, W.J. Chen, Chunxiang Zhu, M. F. Li, Byung Jin Cho, Dim Lee Kwong	2003	29
17	Effect of nickel on the initial growth behavior of electroless Ni–Co–P alloy on silicon substrate Applied Surface Science ·W.L. Liu, W.J. Chen, T.K. Tsai, S.H. Hsieh, Shih‐Ying Chang	2006	29
18	3D GOI CMOSFETs with novel IrO/sub 2/2(Hf) dual gates and high-K dielectric on 1P6M-0.18μm-CMOS NPARC ·Decai Yu, Albert Chin, C.C. Laio, C.F. Lee, Chien‐Fu Cheng, W.J. Chen, Chunxiang Zhu, M.-F. Li, Won Jong Yoo, S. P. McAlister, Dim‐Lee Kwong	2005	27
19	The effect of native oxide on thin gate oxide integrity IEEE Electron Device Letters ·Albert Chin, Bo-Rong Lin, W.J. Chen, Yeou-Ming Lin, C. C. Tsai	1998	26
20	Very high K and high density TiTaO MIM capacitors for analog and RF applications National University of Singapore ·K.C. Chiang, Albert Chin, Chyong‐Huey Lai, W.J. Chen, Chien‐Fu Cheng, Byung Hun, C. C. Liao	2005	25

About W.J. Chen

W.J. Chen is a scholar working on Electrical and Electronic Engineering, Materials Chemistry, Atomic and Molecular Physics, and Optics, Renewable Energy, Sustainability and the Environment and Electronic, Optical and Magnetic Materials, having authored 88 papers that have together received 1.7k indexed citations. Recurring topics across this work include Semiconductor materials and devices (44 papers), Semiconductor materials and interfaces (22 papers), Ferroelectric and Negative Capacitance Devices (20 papers), Advancements in Semiconductor Devices and Circuit Design (19 papers), Electrodeposition and Electroless Coatings (11 papers), Ferroelectric and Piezoelectric Materials (7 papers), Electronic and Structural Properties of Oxides (7 papers) and Electronic Packaging and Soldering Technologies (6 papers). The work is most often cited by research in Electrical and Electronic Engineering (1.3k citations), Materials Chemistry (821 citations), Renewable Energy, Sustainability and the Environment (237 citations), Electronic, Optical and Magnetic Materials (214 citations) and Atomic and Molecular Physics, and Optics (289 citations). W.J. Chen has collaborated with scholars based in Taiwan, United States and Singapore. Frequent co-authors include Albert Chin, S.H. Hsieh, Yung‐Hsien Wu, M.Y. Yang, C.M. Kwei, S. P. McAlister, K.C. Chiang, F. S. Yeh, Tzu‐Chun Yeh and Hsuan‐Ling Kao. Their work appears in journals such as IEEE Electron Device Letters, Applied Surface Science, Journal of The Electrochemical Society, Applied Physics Letters and IEEE Transactions on Electron Devices.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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