Will Conley

1.0k citations
129 papers · 820 · h-index 16

Impact in

Papers in

    • Advancements in Photolithography Techniques 122
    • Integrated Circuits and Semiconductor Failure Analysis 32
    • 3D IC and TSV technologies 18
    • Semiconductor materials and devices 11
    • Nanofabrication and Lithography Techniques 44
    • Advanced Surface Polishing Techniques 23

Will Conley

116 papers receiving 713 citations

Peers

Will Conley
Comparison fields: 5 of 58
  • Surfaces, Coatings and Films 108
  • Electrical and Electronic Engineering 574
  • Biomedical Engineering 406
  • Process Chemistry and Technology 24
  • Pharmaceutical Science 50
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Wenfu Lin China
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Elaine R. Chan United States
Tianyu Yan China
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Will Conley relative to Wenfu Lin China Wenfu Lin's profile →
Citations per field
00.5×2×4×6×8.7×
Wenfu Lin · 1×
Citations per year

Countries citing papers authored by Will Conley

Since Specialization
Citations

This map shows the geographic impact of Will Conley's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Will Conley with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Will Conley more than expected).

Fields of papers citing papers by Will Conley

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Will Conley. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Will Conley. The network helps show where Will Conley may publish in the future.

Co-authors

The 25 scholars most cited alongside Will Conley, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Will Conley Line = papers co-authored together Will Conley links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown

Showing the 20 most-cited of 129 papers — load more, or switch the sort, to bring in the rest.

#Work
1 200253
2 200352
3 200034
4 200228
5 200025
6 200223
7 200723
8 200020
9 200419
10 199618
11 200118
12 201116
13 200516
14 200515
15 200215
16 200415
17 200514
18 200714
19 200114
20 200212

About Will Conley

Will Conley is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials and Polymers and Plastics, having authored 129 papers that have together received 820 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (122 papers), Nanofabrication and Lithography Techniques (44 papers), Integrated Circuits and Semiconductor Failure Analysis (32 papers), Electron and X-Ray Spectroscopy Techniques (25 papers), Advanced Surface Polishing Techniques (23 papers), 3D IC and TSV technologies (18 papers), Semiconductor materials and devices (11 papers) and Optical Coatings and Gratings (10 papers). The work is most often cited by research in Surfaces, Coatings and Films (108 citations), Electrical and Electronic Engineering (574 citations), Biomedical Engineering (406 citations), Process Chemistry and Technology (24 citations) and Pharmaceutical Science (50 citations). Will Conley has collaborated with scholars based in United States, Netherlands and Belgium. Frequent co-authors include C. Grant Willson, Paul Zimmerman, Raymond Hung, Takashi Chiba, Brian C. Trinque, Daniel P. Sanders, Shintaro Yamada, Robert H. Grubbs, Eric F. Connor and Ralph R. Dammel. Their work appears in journals such as Journal of Photopolymer Science and Technology, Microelectronic Engineering, Chemistry of Materials, Macromolecules and Journal of Micro/Nanolithography MEMS and MOEMS.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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