Will Conley

1.0k citations
124 papers · 763 · h-index 15

Impact in

Papers in

    • Advancements in Photolithography Techniques 117
    • Integrated Circuits and Semiconductor Failure Analysis 31
    • 3D IC and TSV technologies 17
    • Semiconductor materials and devices 11
    • Nanofabrication and Lithography Techniques 42
    • Advanced Surface Polishing Techniques 22

Will Conley

112 papers receiving 671 citations

Peers

Will Conley
Comparison fields: 5 of 58
  • Surfaces, Coatings and Films 105
  • Electrical and Electronic Engineering 531
  • Biomedical Engineering 364
  • Process Chemistry and Technology 24
  • Pharmaceutical Science 48
Replace Wenfu Lin with:
Wenfu Lin China
Franz Schrank Austria
Jong-Il Park South Korea
Young Yong Kim South Korea
Tianyu Yan China
Daniel K. Angell United States
Anuja De Silva United States
Mitsunori Sugimoto Japan
Jens Höpken Bulgaria
Will Conley relative to Wenfu Lin China Wenfu Lin's profile →
Citations per field
00.5×6.3×
Wenfu Lin · 1×
Citations per year

Countries citing papers authored by Will Conley

Since Specialization
Citations

This map shows the geographic impact of Will Conley's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Will Conley with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Will Conley more than expected).

Fields of papers citing papers by Will Conley

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Will Conley. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Will Conley. The network helps show where Will Conley may publish in the future.

Co-authors

The 25 scholars most cited alongside Will Conley, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Will Conley Line = papers co-authored together Will Conley links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown

Showing the 20 most-cited of 124 papers — load more, or switch the sort, to bring in the rest.

#Work
1 200252
2 200348
3 200032
4 200226
5 200023
6 200723
7 200220
8 200019
9 200418
10 199617
11 201116
12 200516
13 200515
14 200215
15 200115
16 200414
17 200114
18 200713
19 200512
20 200211

About Will Conley

Will Conley is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials and Polymers and Plastics, having authored 124 papers that have together received 763 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (117 papers), Nanofabrication and Lithography Techniques (42 papers), Integrated Circuits and Semiconductor Failure Analysis (31 papers), Electron and X-Ray Spectroscopy Techniques (25 papers), Advanced Surface Polishing Techniques (22 papers), 3D IC and TSV technologies (17 papers), Semiconductor materials and devices (11 papers) and Optical Coatings and Gratings (10 papers). The work is most often cited by research in Surfaces, Coatings and Films (105 citations), Electrical and Electronic Engineering (531 citations), Biomedical Engineering (364 citations), Process Chemistry and Technology (24 citations) and Pharmaceutical Science (48 citations). Will Conley has collaborated with scholars based in United States, Netherlands and Belgium. Frequent co-authors include C. Grant Willson, Paul Zimmerman, Raymond Hung, Takashi Chiba, Brian C. Trinque, Robert H. Grubbs, Ralph R. Dammel, Daniel A. Miller, Daniel P. Sanders and Eric F. Connor. Their work appears in journals such as Journal of Photopolymer Science and Technology, Microelectronic Engineering, Chemistry of Materials, Macromolecules and Earth Surface Processes and Landforms.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact