Warren W. Flack
Impact in
- Computational Mechanics top 10%
- Fluid Dynamics and Thin Films
Papers in
-
- Advancements in Photolithography Techniques 40
- 3D IC and TSV technologies 15
- Electronic Packaging and Soldering Technologies 15
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- Nanofabrication and Lithography Techniques 14
- Advanced Surface Polishing Techniques 10
- Co-authors
- David S. Soong (2 shared papers)Alexis T. Bell (2 shared papers)Dennis W. Hess (2 shared papers)Robert Hsieh (7 shared papers)Andy Miller (4 shared papers)John Slabbekoorn (4 shared papers)Samuel Suhard (1 shared paper)David W. Minsek (1 shared paper)
- Journals
- Journal of Applied Physics (1 paper)Journal of The Electrochemical Society (1 paper)Proceedings of SPIE, the International Society for Optical Engineering (1 paper)Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (37 papers)
- Partner nations
- United StatesBelgiumGermany
In The Last Decade
Warren W. Flack
42 papers receiving 352 citations
Peers
Comparison fields: 5 of 63
- Surfaces, Coatings and Films 40
- Computational Mechanics 88
- Electrical and Electronic Engineering 232
- Biomedical Engineering 150
- Polymers and Plastics 46
Countries citing papers authored by Warren W. Flack
This map shows the geographic impact of Warren W. Flack's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Warren W. Flack with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Warren W. Flack more than expected).
Fields of papers citing papers by Warren W. Flack
This network shows the impact of papers produced by Warren W. Flack. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Warren W. Flack. The network helps show where Warren W. Flack may publish in the future.
Co-authors
The 25 scholars most cited alongside Warren W. Flack, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 49 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 1984 | 199 | |
| 2 | 2018 | 18 | |
| 3 | 2017 | 15 | |
| 4 | The optimization and characterization of ultra-thick photoresist films | 1998 | 12 |
| 5 | 1998 | 12 | |
| 6 | 1999 | 12 | |
| 7 | Process characterization of one hundred micron thick photoresist films | 1999 | 11 |
| 8 | 1996 | 10 | |
| 9 | 2007 | 9 | |
| 10 | 1993 | 7 | |
| 11 | 1998 | 7 | |
| 12 | 2014 | 7 | |
| 13 | 1994 | 6 | |
| 14 | 1997 | 6 | |
| 15 | 2000 | 6 | |
| 16 | 2020 | 6 | |
| 17 | 2005 | 5 | |
| 18 | 2003 | 4 | |
| 19 | 2001 | 4 | |
| 20 | 1993 | 3 |
About Warren W. Flack
Warren W. Flack is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering, Mechanical Engineering, Industrial and Manufacturing Engineering and Computational Mechanics, having authored 49 papers that have together received 403 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (40 papers), 3D IC and TSV technologies (15 papers), Electronic Packaging and Soldering Technologies (15 papers), Nanofabrication and Lithography Techniques (14 papers), Advanced Surface Polishing Techniques (10 papers), Advanced Measurement and Metrology Techniques (8 papers), Industrial Vision Systems and Defect Detection (7 papers) and Optical measurement and interference techniques (3 papers). The work is most often cited by research in Surfaces, Coatings and Films (40 citations), Computational Mechanics (88 citations), Electrical and Electronic Engineering (232 citations), Biomedical Engineering (150 citations) and Polymers and Plastics (46 citations). Warren W. Flack has collaborated with scholars based in United States, Belgium and Germany. Frequent co-authors include David S. Soong, Alexis T. Bell, Dennis W. Hess, Robert Hsieh, Andy Miller, John Slabbekoorn, Samuel Suhard, David W. Minsek, Craig L. Franklin and Eric Beyne. Their work appears in journals such as Journal of Applied Physics, Journal of The Electrochemical Society, Proceedings of SPIE, the International Society for Optical Engineering and Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.