Uwe Schroeder

22.9k citations
256 papers · 18.1k · 10 hit papers · h-index 72

Impact in

    • Ferroelectric and Negative Capacitance Devices
    • Semiconductor materials and devices
    • Advanced Memory and Neural Computing
    • Advancements in Semiconductor Devices and Circuit Design
    • MXene and MAX Phase Materials
    • Ferroelectric and Piezoelectric Materials
    • Electronic and Structural Properties of Oxides

Papers in

    • Ferroelectric and Negative Capacitance Devices 212
    • Semiconductor materials and devices 165
    • Advanced Memory and Neural Computing 70
    • Advancements in Photolithography Techniques 18
    • Advancements in Semiconductor Devices and Circuit Design 13
    • MXene and MAX Phase Materials 83
    • Ferroelectric and Piezoelectric Materials 73
    • Electronic and Structural Properties of Oxides 20

Uwe Schroeder

245 papers receiving 17.8k citations

Uwe Schroeder's Hit Papers

The fundamentals and applications of ferroelectric HfO2 2022 · 458 citations
4580+4+9Years since publication250500750

Peers

Uwe Schroeder
Comparison fields: 5 of 75
  • Electrical and Electronic Engineering 17.0k
  • Materials Chemistry 13.4k
  • Electronic, Optical and Magnetic Materials 750
  • Biomedical Engineering 1.1k
  • Mechanics of Materials 305
Replace Min Hyuk Park with:
Min Hyuk Park South Korea
Won Jong Yoo South Korea
U. Böttger Germany
Hyoungsub Kim South Korea
Gang Shi China
Byoung Hun Lee South Korea
Thomas Mikolajick Germany
Allen Hsu United States
Joonki Suh United States
Haidong Lu United States
Uwe Schroeder relative to Min Hyuk Park South Korea Min Hyuk Park's profile →
Citations per field
00.5×1.5×1.9×
Min Hyuk Park · 1×
Citations per year

Countries citing papers authored by Uwe Schroeder

Since Specialization
Citations

This map shows the geographic impact of Uwe Schroeder's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Uwe Schroeder with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Uwe Schroeder more than expected).

Fields of papers citing papers by Uwe Schroeder

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Uwe Schroeder. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Uwe Schroeder. The network helps show where Uwe Schroeder may publish in the future.

Co-authors

The 25 scholars most cited alongside Uwe Schroeder, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Uwe Schroeder Line = papers co-authored together Uwe Schroeder links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown

Showing the 20 most-cited of 256 papers — load more, or switch the sort, to bring in the rest.

#Work
1
Ferroelectricity and Antiferroelectricity of Doped Thin HfO2‐Based Films
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2015940
2
Physical Mechanisms behind the Field‐Cycling Behavior of HfO2‐Based Ferroelectric Capacitors
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2016774
3
Incipient Ferroelectricity in Al‐Doped HfO2 Thin Films
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2012737
4
On the structural origins of ferroelectricity in HfO2 thin films
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2015536
5
Stabilizing the ferroelectric phase in doped hafnium oxide
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2015493
6
The fundamentals and applications of ferroelectric HfO2
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2022458
7
Review and perspective on ferroelectric HfO2-based thin films for memory applications
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2018453
8
Structural Changes Underlying Field‐Cycling Phenomena in Ferroelectric HfO2 Thin Films
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2016358
9
The Past, the Present, and the Future of Ferroelectric Memories
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2020350
10 2014336
11 2017321
12 2019320
13
Next generation ferroelectric materials for semiconductor process integration and their applications
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2021315
14 2018302
15 2016301
16 2017286
17 2017280
18 2017273
19 2018264
20 2012247

About Uwe Schroeder

Uwe Schroeder is a scholar working on Electrical and Electronic Engineering, Materials Chemistry, Biomedical Engineering, Atomic and Molecular Physics, and Optics and Hardware and Architecture, having authored 256 papers that have together received 18.1k indexed citations. Recurring topics across this work include Ferroelectric and Negative Capacitance Devices (212 papers), Semiconductor materials and devices (165 papers), MXene and MAX Phase Materials (83 papers), Ferroelectric and Piezoelectric Materials (73 papers), Advanced Memory and Neural Computing (70 papers), Electronic and Structural Properties of Oxides (20 papers), Advancements in Photolithography Techniques (18 papers) and Advancements in Semiconductor Devices and Circuit Design (13 papers). The work is most often cited by research in Electrical and Electronic Engineering (17.0k citations), Materials Chemistry (13.4k citations), Electronic, Optical and Magnetic Materials (750 citations), Biomedical Engineering (1.1k citations) and Mechanics of Materials (305 citations). Uwe Schroeder has collaborated with scholars based in Germany, United States and South Korea. Frequent co-authors include Thomas Mikolajick, Tony Schenk, Min Hyuk Park, Stefan Slesazeck, Michael Hoffmann, Cheol Seong Hwang, Milan Pešić, Everett D. Grimley, James M. LeBeau and Johannes Müller. Their work appears in journals such as Applied Physics Letters, Journal of Applied Physics, ACS Applied Materials & Interfaces, Advanced Electronic Materials and Advanced Functional Materials.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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