R. E. Klinger

20 papers receiving 267 citations

Peers

R. E. Klinger
Comparison fields: 5 of 37
  • Surfaces, Coatings and Films 41
  • Computational Mechanics 104
  • Mechanics of Materials 93
  • Materials Chemistry 147
  • Electrical and Electronic Engineering 179
Replace E. F. Krimmel with:
E. F. Krimmel Germany
P. Geittner Germany
Chr. Weißmantel Germany
M. Terauchi Japan
D. A. Pawlik United States
D. Barr United States
M. S. Ameen United States
D. Wolfframm Germany
Mark Wiggins United States
Yukinori Kurogi Japan
R. E. Klinger relative to E. F. Krimmel Germany E. F. Krimmel's profile →
Citations per field
00.5×
E. F. Krimmel · 1×
Citations per year

Countries citing papers authored by R. E. Klinger

Since Specialization
Citations

This map shows the geographic impact of R. E. Klinger's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by R. E. Klinger with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites R. E. Klinger more than expected).

Fields of papers citing papers by R. E. Klinger

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by R. E. Klinger. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by R. E. Klinger. The network helps show where R. E. Klinger may publish in the future.

Co-authors

The 25 scholars most cited alongside R. E. Klinger, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with R. E. Klinger Line = papers co-authored together R. E. Klinger links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown
#Work
1 198559
2 198045
3 200434
4 198130
5 197926
6 199222
7 198320
8 197717
9 19878
10 19776
11 19796
12 20065
13 20045
14 20064
15 19784
16 19864
17 20022
18 20061
19 19921
20 19601

About R. E. Klinger

R. E. Klinger is a scholar working on Electrical and Electronic Engineering, Materials Chemistry, Computational Mechanics, Mechanics of Materials and Atomic and Molecular Physics, and Optics, having authored 20 papers that have together received 300 indexed citations. Recurring topics across this work include Semiconductor materials and devices (7 papers), Metal and Thin Film Mechanics (4 papers), Ion-surface interactions and analysis (4 papers), Advanced Surface Polishing Techniques (3 papers), Semiconductor Quantum Structures and Devices (2 papers), Advanced Fiber Optic Sensors (2 papers), Diamond and Carbon-based Materials Research (2 papers) and Surface Roughness and Optical Measurements (2 papers). The work is most often cited by research in Surfaces, Coatings and Films (41 citations), Computational Mechanics (104 citations), Mechanics of Materials (93 citations), Materials Chemistry (147 citations) and Electrical and Electronic Engineering (179 citations). R. E. Klinger has collaborated with scholars based in United States, Canada and Australia. Frequent co-authors include J. E. Greene, C. K. Carniglia, J. E. Greene, L. B. Welsh, Vı́tor Baranauskas, Tery L. Barr, John P. Lehan, F. R. Szofran, G. Ockenfuß and R. P. Netterfield. Their work appears in journals such as Applied Physics Letters, Journal of Crystal Growth, Microscopy and Microanalysis, Solid State Ionics and Chemical Physics Letters.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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