R. Cheek

1.5k citations
31 papers · 837 · h-index 17

Impact in

    • Phase-change materials and chalcogenides
    • Silicon Nanostructures and Photoluminescence
    • Advanced Memory and Neural Computing
    • Chalcogenide Semiconductor Thin Films
    • Ferroelectric and Negative Capacitance Devices
    • Semiconductor materials and devices

Papers in

R. Cheek

31 papers receiving 815 citations

Peers

R. Cheek
Comparison fields: 5 of 32
  • Materials Chemistry 611
  • Electrical and Electronic Engineering 752
  • Polymers and Plastics 153
  • Electronic, Optical and Magnetic Materials 131
  • Hardware and Architecture 35
Replace Scott W. Fong with:
Scott W. Fong United States
Norma Sosa United States
Agostino Pirovano Italy
G.H. Koh South Korea
Simone Lavizzari Italy
Kyung‐Chang Ryoo South Korea
G. Navarro France
Alvaro Padilla United States
Ivan Sanchez Esqueda United States
Mattia Boniardi Italy
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Citations per field
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Citations per year

Countries citing papers authored by R. Cheek

Since Specialization
Citations

This map shows the geographic impact of R. Cheek's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by R. Cheek with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites R. Cheek more than expected).

Fields of papers citing papers by R. Cheek

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by R. Cheek. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by R. Cheek. The network helps show where R. Cheek may publish in the future.

Co-authors

The 25 scholars most cited alongside R. Cheek, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with R. Cheek Line = papers co-authored together R. Cheek links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown

Showing the 20 most-cited of 31 papers — load more, or switch the sort, to bring in the rest.

#Work
1 1992141
2 2013124
3 201174
4 200650
5 201244
6 201144
7 200943
8 201236
9 200829
10 200828
11 201127
12 200921
13 200920
14 200820
15 200818
16 201417
17 201116
18 201015
19 201515
20
A method to maintain phase-change memory pre-coding data retention after high temperature solder bonding process in embedded systems
20118

About R. Cheek

R. Cheek is a scholar working on Electrical and Electronic Engineering, Materials Chemistry, Electronic, Optical and Magnetic Materials, Computer Networks and Communications and Hardware and Architecture, having authored 31 papers that have together received 837 indexed citations. Recurring topics across this work include Phase-change materials and chalcogenides (26 papers), Advanced Memory and Neural Computing (17 papers), Liquid Crystal Research Advancements (9 papers), Chalcogenide Semiconductor Thin Films (8 papers), Semiconductor materials and devices (3 papers), Transition Metal Oxide Nanomaterials (2 papers), Photonic and Optical Devices (2 papers) and Parallel Computing and Optimization Techniques (2 papers). The work is most often cited by research in Materials Chemistry (611 citations), Electrical and Electronic Engineering (752 citations), Polymers and Plastics (153 citations), Electronic, Optical and Magnetic Materials (131 citations) and Hardware and Architecture (35 citations). R. Cheek has collaborated with scholars based in United States, Taiwan and Italy. Frequent co-authors include M. Breitwisch, Simone Raoux, A. G. Schrott, C. Lam, H.L. Lung, Eric Joseph, Huai‐Yu Cheng, Bipin Rajendran, Erh-Kun Lai and Yu Zhu. Their work appears in journals such as IEEE Electron Device Letters, ACM Journal on Emerging Technologies in Computing Systems, physica status solidi (b), Applied Physics Letters and Journal of The Electrochemical Society.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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