Peter Evanschitzky
Impact in
- Surfaces, Coatings and Films top 1%
- Electron and X-Ray Spectroscopy Techniques
- Optical Coatings and Gratings
- Radiation top 5%
- Advanced X-ray Imaging Techniques
Papers in
-
- Advancements in Photolithography Techniques 81
- Integrated Circuits and Semiconductor Failure Analysis 19
- Advancements in Semiconductor Devices and Circuit Design 7
-
- Electron and X-Ray Spectroscopy Techniques 44
- Optical Coatings and Gratings 27
- Co-authors
- Andreas Erdmann (81 shared papers)Tim Fühner (23 shared papers)Vicky Philipsen (12 shared papers)Eric Hendrickx (8 shared papers)Dongbo Xu (7 shared papers)Feng Shao (12 shared papers)Peter De Bisschop (4 shared papers)J. Lorenz (10 shared papers)
- Journals
- Journal of Micro/Nanolithography MEMS and MOEMS (8 papers)Microelectronic Engineering (4 papers)Advanced Optical Materials (1 paper)Nano Futures (1 paper)Journal of Modern Optics (1 paper)
- Partner nations
- GermanyBelgiumNetherlands
In The Last Decade
Peter Evanschitzky
85 papers receiving 786 citations
Peers
Comparison fields: 5 of 47
- Surfaces, Coatings and Films 480
- Radiation 178
- Electrical and Electronic Engineering 802
- Industrial and Manufacturing Engineering 64
- Structural Biology 9
Countries citing papers authored by Peter Evanschitzky
This map shows the geographic impact of Peter Evanschitzky's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Peter Evanschitzky with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Peter Evanschitzky more than expected).
Fields of papers citing papers by Peter Evanschitzky
This network shows the impact of papers produced by Peter Evanschitzky. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Peter Evanschitzky. The network helps show where Peter Evanschitzky may publish in the future.
Co-authors
The 25 scholars most cited alongside Peter Evanschitzky, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 93 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 2017 | 56 | |
| 2 | 2007 | 34 | |
| 3 | 2017 | 29 | |
| 4 | 2020 | 27 | |
| 5 | 2016 | 27 | |
| 6 | 2017 | 26 | |
| 7 | 2018 | 25 | |
| 8 | 2014 | 24 | |
| 9 | 2006 | 24 | |
| 10 | 2022 | 20 | |
| 11 | 2018 | 19 | |
| 12 | 2019 | 19 | |
| 13 | 2006 | 18 | |
| 14 | 2011 | 17 | |
| 15 | 2009 | 17 | |
| 16 | 2005 | 17 | |
| 17 | 2018 | 17 | |
| 18 | 2018 | 16 | |
| 19 | 2013 | 16 | |
| 20 | 2017 | 15 |
About Peter Evanschitzky
Peter Evanschitzky is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films, Biomedical Engineering, Radiation and Mechanical Engineering, having authored 93 papers that have together received 853 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (81 papers), Electron and X-Ray Spectroscopy Techniques (44 papers), Optical Coatings and Gratings (27 papers), Integrated Circuits and Semiconductor Failure Analysis (19 papers), Advanced X-ray Imaging Techniques (15 papers), Welding Techniques and Residual Stresses (8 papers), Advancements in Semiconductor Devices and Circuit Design (7 papers) and Surface Roughness and Optical Measurements (6 papers). The work is most often cited by research in Surfaces, Coatings and Films (480 citations), Radiation (178 citations), Electrical and Electronic Engineering (802 citations), Industrial and Manufacturing Engineering (64 citations) and Structural Biology (9 citations). Peter Evanschitzky has collaborated with scholars based in Germany, Belgium and Netherlands. Frequent co-authors include Andreas Erdmann, Tim Fühner, Vicky Philipsen, Eric Hendrickx, Dongbo Xu, Feng Shao, Peter De Bisschop, J. Lorenz, Jens Timo Neumann and M. Bauer. Their work appears in journals such as Journal of Micro/Nanolithography MEMS and MOEMS, Microelectronic Engineering, Advanced Optical Materials, Nano Futures and Journal of Modern Optics.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.