K. Tone

1.8k citations
40 papers · 610 · h-index 16

Impact in

    • Silicon Carbide Semiconductor Technologies
    • Semiconductor materials and devices
    • Advancements in Semiconductor Devices and Circuit Design
    • Electromagnetic Compatibility and Noise Suppression
    • HVDC Systems and Fault Protection
    • Semiconductor Quantum Structures and Devices
    • Semiconductor materials and interfaces

Papers in

K. Tone

39 papers receiving 545 citations

Peers

K. Tone
Comparison fields: 5 of 37
  • Electrical and Electronic Engineering 540
  • Atomic and Molecular Physics, and Optics 175
  • Surfaces, Coatings and Films 30
  • Condensed Matter Physics 47
  • Electronic, Optical and Magnetic Materials 53
Replace M. Otsubo with:
M. Otsubo Japan
S. Habermehl United States
R. Carin France
Andrew S. Alimonda United States
B. Ghyselen France
M. K. Linnarsson Sweden
W. Langheinrich Germany
D. Bolze Germany
T. Wetteroth United States
K. Koizumi Japan
K. Tone relative to M. Otsubo Japan M. Otsubo's profile →
Citations per field
00.5×12×
M. Otsubo · 1×
Citations per year

Countries citing papers authored by K. Tone

Since Specialization
Citations

This map shows the geographic impact of K. Tone's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by K. Tone with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites K. Tone more than expected).

Fields of papers citing papers by K. Tone

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by K. Tone. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by K. Tone. The network helps show where K. Tone may publish in the future.

Co-authors

The 25 scholars most cited alongside K. Tone, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with K. Tone Line = papers co-authored together K. Tone links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown

Showing the 20 most-cited of 40 papers — load more, or switch the sort, to bring in the rest.

#Work
1 199263
2 200357
3 199251
4 200543
5 200038
6 200130
7 199928
8 199728
9 200327
10 199321
11 201821
12 198620
13 198420
14 200217
15 200116
16 200415
17 199912
18 200012
19 200612
20 200210

About K. Tone

K. Tone is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, Condensed Matter Physics and Surfaces, Coatings and Films, having authored 40 papers that have together received 610 indexed citations. Recurring topics across this work include Silicon Carbide Semiconductor Technologies (26 papers), Semiconductor materials and devices (21 papers), Semiconductor materials and interfaces (8 papers), Advancements in Semiconductor Devices and Circuit Design (8 papers), GaN-based semiconductor devices and materials (5 papers), Multilevel Inverters and Converters (3 papers), Electron and X-Ray Spectroscopy Techniques (3 papers) and Silicon and Solar Cell Technologies (3 papers). The work is most often cited by research in Electrical and Electronic Engineering (540 citations), Atomic and Molecular Physics, and Optics (175 citations), Surfaces, Coatings and Films (30 citations), Condensed Matter Physics (47 citations) and Electronic, Optical and Magnetic Materials (53 citations). K. Tone has collaborated with scholars based in United States, Japan and Netherlands. Frequent co-authors include J.H. Zhao, Yuichi Ide, Masamichi Yamada, M. Weiner, Leonid Fursin, P. Alexandrov, Jian Hui Zhao, Yoshifumi Katayama, Steve Weiner and Xueqing Li. Their work appears in journals such as Japanese Journal of Applied Physics, Electronics Letters, IEEE Electron Device Letters, Applied Physics Letters and Surface and Interface Analysis.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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