J. Pender
Impact in
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- Laser-induced spectroscopy and plasma
- Metal and Thin Film Mechanics
Papers in
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- Plasma Diagnostics and Applications 9
- Semiconductor materials and devices 9
- Advancements in Photolithography Techniques 2
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- Metal and Thin Film Mechanics 3
- Laser-induced spectroscopy and plasma 3
- Co-authors
- M.L. Brake (10 shared papers)Tyrone L. Vincent (3 shared papers)James Paul Holloway (2 shared papers)Peter L. G. Ventzek (1 shared paper)M.E. Elta (5 shared papers)J. Holloway (2 shared papers)J. Davis (1 shared paper)J. P. Apruzese (1 shared paper)
- Journals
- IEEE Transactions on Plasma Science (3 papers)Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2 papers)Applied Physics Letters (1 paper)Physics of Plasmas (1 paper)Journal of Applied Physics (1 paper)
- Partner nations
- United StatesGermanySingapore
In The Last Decade
J. Pender
17 papers receiving 157 citations
Peers
Comparison fields: 5 of 37
- Mechanics of Materials 64
- Modeling and Simulation 9
- Electrical and Electronic Engineering 116
- Atomic and Molecular Physics, and Optics 42
- Electronic, Optical and Magnetic Materials 21
Countries citing papers authored by J. Pender
This map shows the geographic impact of J. Pender's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by J. Pender with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites J. Pender more than expected).
Fields of papers citing papers by J. Pender
This network shows the impact of papers produced by J. Pender. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by J. Pender. The network helps show where J. Pender may publish in the future.
Co-authors
The 25 scholars most cited alongside J. Pender, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 1996 | 46 | |
| 2 | 1998 | 24 | |
| 3 | 1993 | 17 | |
| 4 | 1995 | 10 | |
| 5 | 1988 | 10 | |
| 6 | 1999 | 9 | |
| 7 | 1995 | 8 | |
| 8 | 2009 | 6 | |
| 9 | 2011 | 5 | |
| 10 | 1994 | 5 | |
| 11 | 2010 | 5 | |
| 12 | 1996 | 5 | |
| 13 | 1998 | 4 | |
| 14 | 2013 | 4 | |
| 15 | A comparison of etching conditions in the GEC reference cell to a commercial reactive ion etcher. | 1995 | 3 |
| 16 | 2011 | 2 | |
| 17 | 1992 | 2 | |
| 18 | 2005 | 0 |
About J. Pender
J. Pender is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials, Electronic, Optical and Magnetic Materials, Computer Networks and Communications and Atomic and Molecular Physics, and Optics, having authored 18 papers that have together received 165 indexed citations. Recurring topics across this work include Plasma Diagnostics and Applications (9 papers), Semiconductor materials and devices (9 papers), Copper Interconnects and Reliability (5 papers), Analytical Chemistry and Sensors (3 papers), Metal and Thin Film Mechanics (3 papers), Laser-induced spectroscopy and plasma (3 papers), Bluetooth and Wireless Communication Technologies (2 papers) and Advancements in Photolithography Techniques (2 papers). The work is most often cited by research in Mechanics of Materials (64 citations), Modeling and Simulation (9 citations), Electrical and Electronic Engineering (116 citations), Atomic and Molecular Physics, and Optics (42 citations) and Electronic, Optical and Magnetic Materials (21 citations). J. Pender has collaborated with scholars based in United States, Germany and Singapore. Frequent co-authors include M.L. Brake, Tyrone L. Vincent, James Paul Holloway, Peter L. G. Ventzek, M.E. Elta, J. Holloway, J. Davis, J. P. Apruzese, P. Kepple and Alessandro Ricci. Their work appears in journals such as IEEE Transactions on Plasma Science, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Applied Physics Letters, Physics of Plasmas and Journal of Applied Physics.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.