J. P. Doyle
Impact in
- Mechanics of Materials top 2%
- Metal and Thin Film Mechanics
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- Liquid Crystal Research Advancements
- Copper Interconnects and Reliability
Papers in
-
- Semiconductor materials and devices 14
- Silicon Carbide Semiconductor Technologies 7
- Thin-Film Transistor Technologies 6
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- Copper Interconnects and Reliability 8
- Co-authors
- Jerome J. Cuomo (7 shared papers)J. Bruley (7 shared papers)David L. Pappas (5 shared papers)Joyce C. Liu (3 shared papers)K. L. Saenger (4 shared papers)M. O. Aboelfotoh (5 shared papers)P. Chaudhari (2 shared papers)J. A. Lacey (1 shared paper)
- Journals
- Journal of Applied Physics (6 papers)Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (5 papers)Applied Physics Letters (3 papers)Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms (3 papers)Criminal Justice and Behavior (1 paper)
- Partner nations
- United StatesSwedenJapan
In The Last Decade
J. P. Doyle
37 papers receiving 1.5k citations
Peers
Comparison fields: 5 of 82
- Mechanics of Materials 593
- Electronic, Optical and Magnetic Materials 389
- Materials Chemistry 839
- Atomic and Molecular Physics, and Optics 334
- Electrical and Electronic Engineering 595
Countries citing papers authored by J. P. Doyle
This map shows the geographic impact of J. P. Doyle's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by J. P. Doyle with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites J. P. Doyle more than expected).
Fields of papers citing papers by J. P. Doyle
This network shows the impact of papers produced by J. P. Doyle. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by J. P. Doyle. The network helps show where J. P. Doyle may publish in the future.
Co-authors
The 25 scholars most cited alongside J. P. Doyle, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 39 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 2001 | 268 | |
| 2 | 1991 | 223 | |
| 3 | 1991 | 214 | |
| 4 | 1994 | 189 | |
| 5 | 1995 | 108 | |
| 6 | 1992 | 73 | |
| 7 | 1998 | 64 | |
| 8 | 1999 | 60 | |
| 9 | 1991 | 52 | |
| 10 | 2003 | 41 | |
| 11 | 1992 | 30 | |
| 12 | 1997 | 22 | |
| 13 | 1995 | 21 | |
| 14 | 2007 | 16 | |
| 15 | 1996 | 15 | |
| 16 | 1996 | 14 | |
| 17 | 2006 | 14 | |
| 18 | 1997 | 13 | |
| 19 | 2012 | 13 | |
| 20 | 2005 | 10 |
About J. P. Doyle
J. P. Doyle is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Mechanics of Materials, Computational Mechanics and Materials Chemistry, having authored 39 papers that have together received 1.5k indexed citations. Recurring topics across this work include Semiconductor materials and devices (14 papers), Metal and Thin Film Mechanics (9 papers), Ion-surface interactions and analysis (9 papers), Diamond and Carbon-based Materials Research (8 papers), Copper Interconnects and Reliability (8 papers), Silicon Carbide Semiconductor Technologies (7 papers), Semiconductor materials and interfaces (7 papers) and Thin-Film Transistor Technologies (6 papers). The work is most often cited by research in Mechanics of Materials (593 citations), Electronic, Optical and Magnetic Materials (389 citations), Materials Chemistry (839 citations), Atomic and Molecular Physics, and Optics (334 citations) and Electrical and Electronic Engineering (595 citations). J. P. Doyle has collaborated with scholars based in United States, Sweden and Japan. Frequent co-authors include Jerome J. Cuomo, J. Bruley, David L. Pappas, Joyce C. Liu, K. L. Saenger, M. O. Aboelfotoh, P. Chaudhari, J. A. Lacey, M. G. Samant and J. Lüning. Their work appears in journals such as Journal of Applied Physics, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Applied Physics Letters, Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms and Criminal Justice and Behavior.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.