D. Werho
Impact in
- Radiation top 10%
- X-ray Spectroscopy and Fluorescence Analysis
- Surfaces, Coatings and Films top 10%
- Electron and X-Ray Spectroscopy Techniques
Papers in
-
- Semiconductor materials and devices 9
- Ferroelectric and Negative Capacitance Devices 3
- Silicon Carbide Semiconductor Technologies 2
-
- Electronic and Structural Properties of Oxides 5
- Co-authors
- Dina H. Triyoso (4 shared papers)D. Roan (3 shared papers)B. E. White (3 shared papers)Philip J. Tobin (3 shared papers)R. Gregory (3 shared papers)Theresa Hopson (1 shared paper)M. Ramón (2 shared papers)Andrew E. Hooper (1 shared paper)
- Journals
- Journal of The Electrochemical Society (2 papers)Journal of Applied Physics (2 papers)Spectrochimica Acta Part B Atomic Spectroscopy (2 papers)Thin Solid Films (2 papers)Langmuir (1 paper)
- Partner nations
- United StatesMexico
In The Last Decade
D. Werho
22 papers receiving 443 citations
Peers
Comparison fields: 5 of 52
- Radiation 59
- Surfaces, Coatings and Films 45
- Electrical and Electronic Engineering 349
- Materials Chemistry 219
- Electronic, Optical and Magnetic Materials 38
Countries citing papers authored by D. Werho
This map shows the geographic impact of D. Werho's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by D. Werho with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites D. Werho more than expected).
Fields of papers citing papers by D. Werho
This network shows the impact of papers produced by D. Werho. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by D. Werho. The network helps show where D. Werho may publish in the future.
Co-authors
The 25 scholars most cited alongside D. Werho, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 22 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 2004 | 151 | |
| 2 | 2005 | 71 | |
| 3 | 2004 | 57 | |
| 4 | 2001 | 53 | |
| 5 | 2000 | 31 | |
| 6 | 2007 | 20 | |
| 7 | 2001 | 15 | |
| 8 | 2005 | 15 | |
| 9 | 2001 | 12 | |
| 10 | 1997 | 9 | |
| 11 | 2004 | 6 | |
| 12 | 1998 | 5 | |
| 13 | 1997 | 4 | |
| 14 | 1999 | 3 | |
| 15 | 1996 | 3 | |
| 16 | Application of synchrotron radiation to TXRF analysis of metal contamination on silicon wafer surfaces | 1999 | 2 |
| 17 | 2001 | 2 | |
| 18 | 1999 | 2 | |
| 19 | 2001 | 1 | |
| 20 | 2006 | 1 |
About D. Werho
D. Werho is a scholar working on Electrical and Electronic Engineering, Materials Chemistry, Radiation, Surfaces, Coatings and Films and Atomic and Molecular Physics, and Optics, having authored 22 papers that have together received 465 indexed citations. Recurring topics across this work include Semiconductor materials and devices (9 papers), X-ray Spectroscopy and Fluorescence Analysis (6 papers), Electron and X-Ray Spectroscopy Techniques (5 papers), Electronic and Structural Properties of Oxides (5 papers), Ferroelectric and Negative Capacitance Devices (3 papers), Force Microscopy Techniques and Applications (3 papers), Silicon Carbide Semiconductor Technologies (2 papers) and Semiconductor materials and interfaces (2 papers). The work is most often cited by research in Radiation (59 citations), Surfaces, Coatings and Films (45 citations), Electrical and Electronic Engineering (349 citations), Materials Chemistry (219 citations) and Electronic, Optical and Magnetic Materials (38 citations). D. Werho has collaborated with scholars based in United States and Mexico. Frequent co-authors include Dina H. Triyoso, D. Roan, B. E. White, Philip J. Tobin, R. Gregory, Theresa Hopson, M. Ramón, Andrew E. Hooper, J. Baker and L.B. La. Their work appears in journals such as Journal of The Electrochemical Society, Journal of Applied Physics, Spectrochimica Acta Part B Atomic Spectroscopy, Thin Solid Films and Langmuir.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.