C. Krug

1.6k citations
72 papers · 1.2k · h-index 19

Impact in

Papers in

    • Semiconductor materials and devices 49
    • Integrated Circuits and Semiconductor Failure Analysis 12
    • Advancements in Semiconductor Devices and Circuit Design 12
    • Ferroelectric and Negative Capacitance Devices 6
    • Silicon Carbide Semiconductor Technologies 5
    • Ion-surface interactions and analysis 15

C. Krug

69 papers receiving 1.2k citations

Peers

C. Krug
Comparison fields: 5 of 75
  • Process Chemistry and Technology 47
  • Electrical and Electronic Engineering 922
  • Materials Chemistry 551
  • Electronic, Optical and Magnetic Materials 186
  • Surfaces, Coatings and Films 53
Replace M. C. Wood with:
M. C. Wood United States
S. S. Sun China
Osamu Urakawa Japan
R. P. Pezzi Brazil
Conan Weiland United States
Paul‐Henri Haumesser France
S. Rushworth United Kingdom
S. Greulich‐Weber Germany
M. Heinrich Germany
Peter Frantz United States
C. Krug relative to M. C. Wood United States M. C. Wood's profile →
Citations per field
00.5×3.8×
M. C. Wood · 1×
Citations per year

Countries citing papers authored by C. Krug

Since Specialization
Citations

This map shows the geographic impact of C. Krug's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by C. Krug with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites C. Krug more than expected).

Fields of papers citing papers by C. Krug

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by C. Krug. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by C. Krug. The network helps show where C. Krug may publish in the future.

Co-authors

The 25 scholars most cited alongside C. Krug, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with C. Krug Line = papers co-authored together C. Krug links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown

Showing the 20 most-cited of 72 papers — load more, or switch the sort, to bring in the rest.

#Work
1 2000355
2 200761
3 200059
4 200554
5 201443
6 200143
7 200440
8 199940
9
High-resolution depth profiling in ultrathin Al/sub 2/O/sub 3/ films on Si
200038
10 199931
11 201230
12 200730
13 200426
14 201326
15 200825
16 199925
17 200422
18 200521
19 201421
20 200618

About C. Krug

C. Krug is a scholar working on Electrical and Electronic Engineering, Computational Mechanics, Materials Chemistry, Atomic and Molecular Physics, and Optics and Electronic, Optical and Magnetic Materials, having authored 72 papers that have together received 1.2k indexed citations. Recurring topics across this work include Semiconductor materials and devices (49 papers), Ion-surface interactions and analysis (15 papers), Integrated Circuits and Semiconductor Failure Analysis (12 papers), Advancements in Semiconductor Devices and Circuit Design (12 papers), Semiconductor materials and interfaces (8 papers), Electronic and Structural Properties of Oxides (7 papers), Ferroelectric and Negative Capacitance Devices (6 papers) and Silicon Carbide Semiconductor Technologies (5 papers). The work is most often cited by research in Process Chemistry and Technology (47 citations), Electrical and Electronic Engineering (922 citations), Materials Chemistry (551 citations), Electronic, Optical and Magnetic Materials (186 citations) and Surfaces, Coatings and Films (53 citations). C. Krug has collaborated with scholars based in Brazil, United States and France. Frequent co-authors include I. J. R. Baumvol, M. Copel, E. P. Gusev, E. Cartier, I. J. R. Baumvol, M. Gribelyuk, F. C. Stedile, G. Lucovsky, C. Radtke and Jaı̈rton Dupont. Their work appears in journals such as Applied Physics Letters, Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms, Journal of Applied Physics, Electrochemical and Solid-State Letters and Journal of Vacuum Science & Technology A Vacuum Surfaces and Films.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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