B.E. Stine

833 citations
23 papers · 567 · h-index 12

Impact in

    • VLSI and Analog Circuit Testing
    • Integrated Circuits and Semiconductor Failure Analysis
    • Low-power high-performance VLSI design
    • Advancements in Photolithography Techniques
    • Semiconductor materials and devices
    • VLSI and FPGA Design Techniques
    • Advancements in Semiconductor Devices and Circuit Design

Papers in

B.E. Stine

23 papers receiving 531 citations

Peers

B.E. Stine
Comparison fields: 5 of 31
  • Hardware and Architecture 208
  • Electrical and Electronic Engineering 474
  • Industrial and Manufacturing Engineering 54
  • Biomedical Engineering 161
  • Statistics, Probability and Uncertainty 22
Replace Jeong-Taek Kong with:
Jeong-Taek Kong South Korea
Jason P. Cain United States
F.G. Kuper Netherlands
Yongchan Ban United States
Jongwook Kye United States
Cyrus Tabery United States
A.V. Ferris-Prabhu United States
Luigi Capodieci United States
Navin Srivastava United States
Masafumi Asano Japan
B.E. Stine relative to Jeong-Taek Kong South Korea Jeong-Taek Kong's profile →
Citations per field
00.5×11×
Jeong-Taek Kong · 1×
Citations per year

Countries citing papers authored by B.E. Stine

Since Specialization
Citations

This map shows the geographic impact of B.E. Stine's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by B.E. Stine with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites B.E. Stine more than expected).

Fields of papers citing papers by B.E. Stine

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by B.E. Stine. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by B.E. Stine. The network helps show where B.E. Stine may publish in the future.

Co-authors

The 25 scholars most cited alongside B.E. Stine, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with B.E. Stine Line = papers co-authored together B.E. Stine links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown

Showing the 20 most-cited of 23 papers — load more, or switch the sort, to bring in the rest.

#Work
1 1997172
2 1998112
3 199890
4 200320
5 199619
6 200219
7
EFFECT OF FINE-LINE DENSITY AND PITCH ON INTERCONNECT ILD THICKNESS VARIATION IN OXIDE CMP PROCESSES
199718
8 199817
9 200114
10 200313
11 200212
12 199711
13 200210
14 20029
15 20028
16
Comparison of Oxide Planarization Pattern Dependencies between Two Different CMP Tools Using Statistical Metrology
19966
17 19975
18 19983
19 20023
20 20022

About B.E. Stine

B.E. Stine is a scholar working on Electrical and Electronic Engineering, Hardware and Architecture, Biomedical Engineering, Industrial and Manufacturing Engineering and Mechanical Engineering, having authored 23 papers that have together received 567 indexed citations. Recurring topics across this work include Integrated Circuits and Semiconductor Failure Analysis (11 papers), Advancements in Photolithography Techniques (9 papers), Advanced Surface Polishing Techniques (7 papers), VLSI and Analog Circuit Testing (7 papers), Industrial Vision Systems and Defect Detection (6 papers), Semiconductor materials and devices (6 papers), VLSI and FPGA Design Techniques (4 papers) and Copper Interconnects and Reliability (4 papers). The work is most often cited by research in Hardware and Architecture (208 citations), Electrical and Electronic Engineering (474 citations), Industrial and Manufacturing Engineering (54 citations), Biomedical Engineering (161 citations) and Statistics, Probability and Uncertainty (22 citations). B.E. Stine has collaborated with scholars based in United States and Japan. Frequent co-authors include Duane S. Boning, J.E. Chung, Dennis O. Ouma, Soo‐Young Oh, O.S. Nakagawa, Dale L. Hetherington, Christopher P. Hess, L.E. Camilletti, M. Muthukrishnan and Michael R. Berman. Their work appears in journals such as IEEE Transactions on Semiconductor Manufacturing, Journal of The Electrochemical Society, Microelectronic Engineering, IEEE Transactions on Electron Devices and Computer Standards & Interfaces.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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