B. E. E. Kastenmeier
Impact in
- Mechanics of Materials top 5%
- Metal and Thin Film Mechanics
-
- Plasma Diagnostics and Applications
- Semiconductor materials and devices
- Thin-Film Transistor Technologies
- Advancements in Semiconductor Devices and Circuit Design
Papers in
-
- Semiconductor materials and devices 12
- Plasma Diagnostics and Applications 8
-
- Metal and Thin Film Mechanics 5
- Muon and positron interactions and applications 1
- Co-authors
- G. S. Oehrlein (10 shared papers)P. J. Matsuo (9 shared papers)JJ Beulens (4 shared papers)J.G. Langan (3 shared papers)M. F. Doemling (2 shared papers)M. Schaepkens (2 shared papers)R.E. Ellefson (1 shared paper)William R. Entley (1 shared paper)
- Journals
- Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (7 papers)Microelectronic Engineering (1 paper)Applied Physics Letters (1 paper)IBM Journal of Research and Development (1 paper)Plasma Sources Science and Technology (1 paper)
- Partner nations
- United StatesGermanyCanada
In The Last Decade
B. E. E. Kastenmeier
14 papers receiving 537 citations
Peers
Comparison fields: 5 of 39
- Mechanics of Materials 220
- Electrical and Electronic Engineering 477
- Electronic, Optical and Magnetic Materials 77
- Materials Chemistry 188
- Surfaces, Coatings and Films 22
Countries citing papers authored by B. E. E. Kastenmeier
This map shows the geographic impact of B. E. E. Kastenmeier's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by B. E. E. Kastenmeier with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites B. E. E. Kastenmeier more than expected).
Fields of papers citing papers by B. E. E. Kastenmeier
This network shows the impact of papers produced by B. E. E. Kastenmeier. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by B. E. E. Kastenmeier. The network helps show where B. E. E. Kastenmeier may publish in the future.
Co-authors
The 23 scholars most cited alongside B. E. E. Kastenmeier, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 1996 | 120 | |
| 2 | 1999 | 85 | |
| 3 | 1998 | 85 | |
| 4 | 1997 | 63 | |
| 5 | 1999 | 38 | |
| 6 | 2001 | 36 | |
| 7 | 1999 | 31 | |
| 8 | 1996 | 27 | |
| 9 | 1995 | 25 | |
| 10 | 2000 | 25 | |
| 11 | 2005 | 9 | |
| 12 | 2005 | 2 | |
| 13 | 2006 | 1 | |
| 14 | 2007 | 1 |
About B. E. E. Kastenmeier
B. E. E. Kastenmeier is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials, Electronic, Optical and Magnetic Materials, Biomedical Engineering and Materials Chemistry, having authored 14 papers that have together received 548 indexed citations. Recurring topics across this work include Semiconductor materials and devices (12 papers), Plasma Diagnostics and Applications (8 papers), Metal and Thin Film Mechanics (5 papers), Copper Interconnects and Reliability (4 papers), Diamond and Carbon-based Materials Research (2 papers), Muon and positron interactions and applications (1 paper), Ion-surface interactions and analysis (1 paper) and Ga2O3 and related materials (1 paper). The work is most often cited by research in Mechanics of Materials (220 citations), Electrical and Electronic Engineering (477 citations), Electronic, Optical and Magnetic Materials (77 citations), Materials Chemistry (188 citations) and Surfaces, Coatings and Films (22 citations). B. E. E. Kastenmeier has collaborated with scholars based in United States, Germany and Canada. Frequent co-authors include G. S. Oehrlein, P. J. Matsuo, JJ Beulens, J.G. Langan, M. F. Doemling, M. Schaepkens, R.E. Ellefson, William R. Entley, T. E. F. M. Standaert and N. R. Rueger. Their work appears in journals such as Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Microelectronic Engineering, Applied Physics Letters, IBM Journal of Research and Development and Plasma Sources Science and Technology.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.