W. Stenzel
Impact in
- Surfaces, Coatings and Films top 5%
- Electron and X-Ray Spectroscopy Techniques
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- Advanced Chemical Physics Studies
- Quantum, superfluid, helium dynamics
- Surface and Thin Film Phenomena
Papers in
-
- Advanced Chemical Physics Studies 23
- Atomic and Molecular Physics 4
- Surface and Thin Film Phenomena 3
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- Electron and X-Ray Spectroscopy Techniques 11
- Co-authors
- H. Conrad (32 shared papers)Martin E. Kordesch (15 shared papers)R. Scala (3 shared papers)R. Unwin (3 shared papers)A. M. Bradshaw (7 shared papers)A.M. Bradshaw (6 shared papers)M. Ondřejček (5 shared papers)V. Cháb (5 shared papers)
- Journals
- Surface Science (12 papers)Journal of Electron Spectroscopy and Related Phenomena (5 papers)The Journal of Chemical Physics (3 papers)Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2 papers)Chemical Physics Letters (2 papers)
- Partner nations
- GermanyCzechiaUnited States
In The Last Decade
W. Stenzel
33 papers receiving 829 citations
Peers
Comparison fields: 5 of 42
- Surfaces, Coatings and Films 151
- Atomic and Molecular Physics, and Optics 591
- Catalysis 120
- Materials Chemistry 472
- Atmospheric Science 141
Countries citing papers authored by W. Stenzel
This map shows the geographic impact of W. Stenzel's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by W. Stenzel with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites W. Stenzel more than expected).
Fields of papers citing papers by W. Stenzel
This network shows the impact of papers produced by W. Stenzel. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by W. Stenzel. The network helps show where W. Stenzel may publish in the future.
Co-authors
The 25 scholars most cited alongside W. Stenzel, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 34 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 1984 | 82 | |
| 2 | 1986 | 62 | |
| 3 | 1984 | 61 | |
| 4 | 1987 | 60 | |
| 5 | 1984 | 58 | |
| 6 | 1987 | 43 | |
| 7 | 1987 | 42 | |
| 8 | 1987 | 39 | |
| 9 | 1993 | 38 | |
| 10 | 1986 | 34 | |
| 11 | 1986 | 34 | |
| 12 | 1993 | 31 | |
| 13 | 1991 | 27 | |
| 14 | 1986 | 26 | |
| 15 | 1998 | 25 | |
| 16 | 1996 | 24 | |
| 17 | 1988 | 23 | |
| 18 | 1993 | 19 | |
| 19 | 1995 | 19 | |
| 20 | 1997 | 18 |
About W. Stenzel
W. Stenzel is a scholar working on Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Materials Chemistry, Atmospheric Science and Electrical and Electronic Engineering, having authored 34 papers that have together received 862 indexed citations. Recurring topics across this work include Advanced Chemical Physics Studies (23 papers), Electron and X-Ray Spectroscopy Techniques (11 papers), Catalytic Processes in Materials Science (8 papers), nanoparticles nucleation surface interactions (8 papers), Molecular Junctions and Nanostructures (5 papers), Atomic and Molecular Physics (4 papers), Advanced Physical and Chemical Molecular Interactions (3 papers) and Surface and Thin Film Phenomena (3 papers). The work is most often cited by research in Surfaces, Coatings and Films (151 citations), Atomic and Molecular Physics, and Optics (591 citations), Catalysis (120 citations), Materials Chemistry (472 citations) and Atmospheric Science (141 citations). W. Stenzel has collaborated with scholars based in Germany, Czechia and United States. Frequent co-authors include H. Conrad, Martin E. Kordesch, R. Scala, R. Unwin, A. M. Bradshaw, A.M. Bradshaw, M. Ondřejček, V. Cháb, F. Michael Hoffmann and M. Šunjić. Their work appears in journals such as Surface Science, Journal of Electron Spectroscopy and Related Phenomena, The Journal of Chemical Physics, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films and Chemical Physics Letters.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.