W. Hirschwald
Impact in
- Catalysis top 2%
- Catalysis and Oxidation Reactions
- Materials Chemistry top 5%
- Catalytic Processes in Materials Science
- ZnO doping and properties
- Copper-based nanomaterials and applications
Papers in
-
- Catalytic Processes in Materials Science 19
- ZnO doping and properties 12
-
- Advanced Chemical Physics Studies 24
- Co-authors
- G. Neumann (8 shared papers)Chak‐Tong Au (4 shared papers)W. Hirsch (4 shared papers)M. Grunze (13 shared papers)K. Christmann (5 shared papers)Joseph Cunningham (3 shared papers)M. Ehsasi (3 shared papers)J.H. Block (3 shared papers)
- Journals
- Surface Science (7 papers)Berichte der Bunsengesellschaft für physikalische Chemie (5 papers)Surface and Interface Analysis (4 papers)Thin Solid Films (3 papers)Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (3 papers)
- Partner nations
- GermanyUnited StatesPoland
In The Last Decade
W. Hirschwald
66 papers receiving 1.8k citations
Peers
Comparison fields: 5 of 75
- Catalysis 391
- Materials Chemistry 1.3k
- Atomic and Molecular Physics, and Optics 664
- Surfaces, Coatings and Films 127
- Condensed Matter Physics 169
Countries citing papers authored by W. Hirschwald
This map shows the geographic impact of W. Hirschwald's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by W. Hirschwald with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites W. Hirschwald more than expected).
Fields of papers citing papers by W. Hirschwald
This network shows the impact of papers produced by W. Hirschwald. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by W. Hirschwald. The network helps show where W. Hirschwald may publish in the future.
Co-authors
The 25 scholars most cited alongside W. Hirschwald, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 68 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 1989 | 210 | |
| 2 | 1984 | 193 | |
| 3 | 1983 | 133 | |
| 4 | 1985 | 116 | |
| 5 | 1988 | 84 | |
| 6 | 1988 | 81 | |
| 7 | 1985 | 68 | |
| 8 | 1986 | 63 | |
| 9 | 1973 | 59 | |
| 10 | 1981 | 53 | |
| 11 | 1983 | 46 | |
| 12 | 1989 | 46 | |
| 13 | 1986 | 44 | |
| 14 | 1986 | 42 | |
| 15 | 1986 | 39 | |
| 16 | 1981 | 38 | |
| 17 | 1984 | 37 | |
| 18 | 1989 | 34 | |
| 19 | 1986 | 33 | |
| 20 | 1989 | 32 |
About W. Hirschwald
W. Hirschwald is a scholar working on Materials Chemistry, Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering, Atmospheric Science and Mechanical Engineering, having authored 68 papers that have together received 1.9k indexed citations. Recurring topics across this work include Advanced Chemical Physics Studies (24 papers), Catalytic Processes in Materials Science (19 papers), ZnO doping and properties (12 papers), nanoparticles nucleation surface interactions (11 papers), Gas Sensing Nanomaterials and Sensors (9 papers), Molecular Junctions and Nanostructures (5 papers), Catalysis and Oxidation Reactions (5 papers) and Chalcogenide Semiconductor Thin Films (4 papers). The work is most often cited by research in Catalysis (391 citations), Materials Chemistry (1.3k citations), Atomic and Molecular Physics, and Optics (664 citations), Surfaces, Coatings and Films (127 citations) and Condensed Matter Physics (169 citations). W. Hirschwald has collaborated with scholars based in Germany, United States and Poland. Frequent co-authors include G. Neumann, Chak‐Tong Au, W. Hirsch, M. Grunze, K. Christmann, Joseph Cunningham, M. Ehsasi, J.H. Block, D.M. Hofmann and M. Golze. Their work appears in journals such as Surface Science, Berichte der Bunsengesellschaft für physikalische Chemie, Surface and Interface Analysis, Thin Solid Films and Journal of Vacuum Science & Technology A Vacuum Surfaces and Films.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.