K. Eisele
Impact in
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- Semiconductor materials and devices
- Thin-Film Transistor Technologies
- Silicon and Solar Cell Technologies
- Photonic and Optical Devices
- Semiconductor Lasers and Optical Devices
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- Silicon Nanostructures and Photoluminescence
Papers in
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- Semiconductor Lasers and Optical Devices 5
- Photonic and Optical Devices 4
- Semiconductor materials and devices 4
- Plasma Diagnostics and Applications 3
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- Semiconductor Quantum Structures and Devices 4
- Co-authors
- Gernot S. Pomrenke (1 shared paper)A. Axmann (1 shared paper)H. Ennen (1 shared paper)W.H. Haydl (1 shared paper)J. Schneider (1 shared paper)Kazuya Kurokawa (1 shared paper)Rainer Engelbrecht (1 shared paper)J.D. Ralston (7 shared papers)
- Journals
- Journal of The Electrochemical Society (3 papers)Applied Physics Letters (2 papers)Vacuum (2 papers)IEEE Transactions on Instrumentation and Measurement (1 paper)IEEE Transactions on Electron Devices (1 paper)
- Partner nations
- GermanyUnited States
In The Last Decade
K. Eisele
20 papers receiving 456 citations
Peers
Comparison fields: 5 of 43
- Electrical and Electronic Engineering 401
- Materials Chemistry 273
- Atomic and Molecular Physics, and Optics 137
- Surfaces, Coatings and Films 26
- Ceramics and Composites 16
Countries citing papers authored by K. Eisele
This map shows the geographic impact of K. Eisele's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by K. Eisele with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites K. Eisele more than expected).
Fields of papers citing papers by K. Eisele
This network shows the impact of papers produced by K. Eisele. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by K. Eisele. The network helps show where K. Eisele may publish in the future.
Co-authors
The 25 scholars most cited alongside K. Eisele, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 23 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 1985 | 282 | |
| 2 | 1981 | 71 | |
| 3 | 1965 | 34 | |
| 4 | 1994 | 26 | |
| 5 | 1995 | 11 | |
| 6 | 1958 | 10 | |
| 7 | 1995 | 9 | |
| 8 | 1964 | 9 | |
| 9 | 1975 | 7 | |
| 10 | 1996 | 6 | |
| 11 | 1963 | 6 | |
| 12 | 1996 | 3 | |
| 13 | 1994 | 3 | |
| 14 | 1986 | 2 | |
| 15 | 1978 | 2 | |
| 16 | 1977 | 2 | |
| 17 | 1977 | 2 | |
| 18 | 1978 | 2 | |
| 19 | 1979 | 2 | |
| 20 | 1994 | 1 |
About K. Eisele
K. Eisele is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics, Biomedical Engineering, Materials Chemistry and Computational Mechanics, having authored 23 papers that have together received 490 indexed citations. Recurring topics across this work include Semiconductor Lasers and Optical Devices (5 papers), Photonic and Optical Devices (4 papers), Semiconductor materials and devices (4 papers), Semiconductor Quantum Structures and Devices (4 papers), Laser Material Processing Techniques (3 papers), Plasma Diagnostics and Applications (3 papers), Advanced Surface Polishing Techniques (2 papers) and Laser-induced spectroscopy and plasma (2 papers). The work is most often cited by research in Electrical and Electronic Engineering (401 citations), Materials Chemistry (273 citations), Atomic and Molecular Physics, and Optics (137 citations), Surfaces, Coatings and Films (26 citations) and Ceramics and Composites (16 citations). K. Eisele has collaborated with scholars based in Germany and United States. Frequent co-authors include Gernot S. Pomrenke, A. Axmann, H. Ennen, W.H. Haydl, J. Schneider, Kazuya Kurokawa, Rainer Engelbrecht, J.D. Ralston, R. E. Sah and S. Weisser. Their work appears in journals such as Journal of The Electrochemical Society, Applied Physics Letters, Vacuum, IEEE Transactions on Instrumentation and Measurement and IEEE Transactions on Electron Devices.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.