Vacuum

243.9k citations
17.5k papers · · active since 1950

Impact in

Papers in

Vacuum

16.3k papers receiving 230.3k citations

Peers

Vacuum
Comparison fields: 5 of 228
  • Materials Chemistry 124.0k
  • Mechanics of Materials 52.5k
  • Surfaces, Coatings and Films 11.6k
  • Ceramics and Composites 9.2k
  • Mechanical Engineering 59.8k
Replace Applied Physics A with:
Applied Physics A China
Computational Materials Science China
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films United States
Journal of Applied Crystallography United States
physica status solidi (b) Germany
Materials science forum China
MRS Bulletin United States
Journal of materials research/Pratt's guide to venture capital sources United States
Review of Scientific Instruments United States
Optics & Laser Technology China
Vacuum relative to Applied Physics A China Applied Physics A's profile →
Citations per field
00.5×1.5×2.0×
Applied Physics A · 1×
Citations per year

Countries where authors publish in Vacuum

Since Specialization
Citations

This map shows the geographic impact of research published in Vacuum. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by papers published in Vacuum with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Vacuum more than expected).

Fields of papers published in Vacuum

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers published in Vacuum. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers published in Vacuum.

About Vacuum

The 17.5k papers published in Vacuum in the last decades have received a total of 243.9k indexed citations . Papers published in Vacuum usually cover Materials Chemistry (7.6k papers), Surfaces, Coatings and Films (1.1k papers), Mechanics of Materials (3.8k papers), Electrical and Electronic Engineering (7.0k papers) and Computational Mechanics (2.1k papers) specifically the topics of Metal and Thin Film Mechanics (3.0k papers), Semiconductor materials and devices (1.9k papers), Ion-surface interactions and analysis (1.7k papers), Diamond and Carbon-based Materials Research (1.7k papers), Plasma Diagnostics and Applications (1.4k papers), ZnO doping and properties (1.3k papers), Advanced materials and composites (851 papers) and Gas Sensing Nanomaterials and Sensors (828 papers). The most active scholars publishing in Vacuum are P. A. Redhead, W Steckelmacher, M.E. Haine, Lars Hultman, Peter Kelly, R.D. Arnell, M.K. Miller, J. Azoulay, J. Musil and Yong Pan.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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