J.T. Scheuer
Impact in
- Mechanics of Materials top 2%
- Metal and Thin Film Mechanics
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- Plasma Diagnostics and Applications
- Semiconductor materials and devices
Papers in
-
- Plasma Diagnostics and Applications 19
- Silicon and Solar Cell Technologies 10
- Integrated Circuits and Semiconductor Failure Analysis 8
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- Metal and Thin Film Mechanics 20
- Co-authors
- J. R. Conrad (7 shared papers)M. Shamim (3 shared papers)G.A. Emmert (3 shared papers)R. P. Fetherston (1 shared paper)M. Tuszewski (4 shared papers)K.C. Walter (6 shared papers)I. Henins (8 shared papers)K. Sridharan (2 shared papers)
- Journals
- Surface and Coatings Technology (6 papers)Journal of Applied Physics (4 papers)IEEE Transactions on Plasma Science (4 papers)Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2 papers)Nuclear Materials and Energy (1 paper)
- Partner nations
- United StatesGermanyNepal
In The Last Decade
J.T. Scheuer
35 papers receiving 885 citations
Peers
Comparison fields: 5 of 39
- Mechanics of Materials 629
- Electrical and Electronic Engineering 678
- Nuclear and High Energy Physics 120
- Materials Chemistry 338
- Computational Mechanics 145
Countries citing papers authored by J.T. Scheuer
This map shows the geographic impact of J.T. Scheuer's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by J.T. Scheuer with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites J.T. Scheuer more than expected).
Fields of papers citing papers by J.T. Scheuer
This network shows the impact of papers produced by J.T. Scheuer. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by J.T. Scheuer. The network helps show where J.T. Scheuer may publish in the future.
Co-authors
The 25 scholars most cited alongside J.T. Scheuer, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 38 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 1990 | 152 | |
| 2 | 1991 | 103 | |
| 3 | 1991 | 96 | |
| 4 | 1990 | 83 | |
| 5 | 1996 | 52 | |
| 6 | 1991 | 50 | |
| 7 | 1988 | 40 | |
| 8 | 1988 | 36 | |
| 9 | 1998 | 34 | |
| 10 | 1990 | 34 | |
| 11 | 1996 | 32 | |
| 12 | 1995 | 27 | |
| 13 | 1997 | 27 | |
| 14 | 1994 | 21 | |
| 15 | 1993 | 21 | |
| 16 | 1995 | 19 | |
| 17 | 1995 | 17 | |
| 18 | 2002 | 11 | |
| 19 | 2002 | 11 | |
| 20 | 1994 | 10 |
About J.T. Scheuer
J.T. Scheuer is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials, Computational Mechanics, Materials Chemistry and Nuclear and High Energy Physics, having authored 38 papers that have together received 935 indexed citations. Recurring topics across this work include Metal and Thin Film Mechanics (20 papers), Plasma Diagnostics and Applications (19 papers), Silicon and Solar Cell Technologies (10 papers), Ion-surface interactions and analysis (9 papers), Integrated Circuits and Semiconductor Failure Analysis (8 papers), Magnetic confinement fusion research (7 papers), Diamond and Carbon-based Materials Research (6 papers) and Ionosphere and magnetosphere dynamics (4 papers). The work is most often cited by research in Mechanics of Materials (629 citations), Electrical and Electronic Engineering (678 citations), Nuclear and High Energy Physics (120 citations), Materials Chemistry (338 citations) and Computational Mechanics (145 citations). J.T. Scheuer has collaborated with scholars based in United States, Germany and Nepal. Frequent co-authors include J. R. Conrad, M. Shamim, G.A. Emmert, R. P. Fetherston, M. Tuszewski, K.C. Walter, I. Henins, K. Sridharan, M. Nastasi and Seunghee Han. Their work appears in journals such as Surface and Coatings Technology, Journal of Applied Physics, IEEE Transactions on Plasma Science, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films and Nuclear Materials and Energy.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.