I. Hoflijk

52 papers and 613 indexed citations i.

I. Hoflijk is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Radiation. According to data from OpenAlex, I. Hoflijk has authored 52 papers receiving a total of 613 indexed citations (citations by other indexed papers that have themselves been cited), including 32 papers in Electrical and Electronic Engineering, 27 papers in Surfaces, Coatings and Films and 25 papers in Radiation. Recurrent topics in I. Hoflijk’s work include Electron and X-Ray Spectroscopy Techniques (27 papers), X-ray Spectroscopy and Fluorescence Analysis (24 papers) and Semiconductor materials and devices (19 papers). I. Hoflijk is often cited by papers focused on Electron and X-Ray Spectroscopy Techniques (27 papers), X-ray Spectroscopy and Fluorescence Analysis (24 papers) and Semiconductor materials and devices (19 papers). I. Hoflijk collaborates with scholars based in Belgium, United States and United Kingdom. I. Hoflijk's co-authors include Wilfried Vandervorst, Trudo Clarysse, Marc Meuris, Thierry Conard and Bert Brijs and has published in prestigious journals such as Applied Physics Letters, Journal of The Electrochemical Society and Thin Solid Films.