Daniel Flamm

7.4k citations
142 papers · 5.7k · 2 hit papers · h-index 42

Impact in

Papers in

Daniel Flamm

129 papers receiving 5.3k citations

Daniel Flamm's Hit Papers

Plasma etching : an introduction 1989 · 370 citations
3700+16+32Years since publication100200300400

Peers

Daniel Flamm
Comparison fields: 5 of 98
  • Electrical and Electronic Engineering 4.0k
  • Mechanics of Materials 1.2k
  • Atomic and Molecular Physics, and Optics 1.6k
  • Surfaces, Coatings and Films 332
  • Computational Mechanics 952
Replace А. А. Ионин with:
А. А. Ионин Russia
David Attwood United States
Kunihide Tachibana Japan
Michael E. Coltrin United States
Martin Richardson United States
P. E. Dyer United Kingdom
Kazuto Yamauchi Japan
J. Perrin France
Herbert H. Sawin United States
J. G. Lunney Ireland
Daniel Flamm relative to А. А. Ионин Russia А. А. Ионин's profile →
Citations per field
00.5×1.5×2.0×
А. А. Ионин · 1×
Citations per year

Countries citing papers authored by Daniel Flamm

Since Specialization
Citations

This map shows the geographic impact of Daniel Flamm's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Daniel Flamm with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Daniel Flamm more than expected).

Fields of papers citing papers by Daniel Flamm

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Daniel Flamm. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Daniel Flamm. The network helps show where Daniel Flamm may publish in the future.

Co-authors

The 25 scholars most cited alongside Daniel Flamm, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Daniel Flamm Line = papers co-authored together Daniel Flamm links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown

Showing the 20 most-cited of 142 papers — load more, or switch the sort, to bring in the rest.

#Work
1
Plasma etching of Si and SiO2—The effect of oxygen additions to CF4 plasmas
Hit paper breakdown →
1978435
2
Plasma etching : an introduction
Hit paper breakdown →
1989370
3 1981270
4 1981237
5 1981232
6 1989212
7 2009194
8 1984169
9 1988154
10 1980140
11 1984131
12 1983128
13 2012123
14 2013104
15 198997
16 197792
17 199090
18 198487
19 201386
20 198286

About Daniel Flamm

Daniel Flamm is a scholar working on Electrical and Electronic Engineering, Computational Mechanics, Atomic and Molecular Physics, and Optics, Biomedical Engineering and Materials Chemistry, having authored 142 papers that have together received 5.7k indexed citations. Recurring topics across this work include Laser Material Processing Techniques (35 papers), Semiconductor materials and devices (35 papers), Plasma Diagnostics and Applications (32 papers), Orbital Angular Momentum in Optics (20 papers), Photonic Crystal and Fiber Optics (19 papers), Advanced Fiber Optic Sensors (17 papers), Advanced Surface Polishing Techniques (11 papers) and Plasma Applications and Diagnostics (11 papers). The work is most often cited by research in Electrical and Electronic Engineering (4.0k citations), Mechanics of Materials (1.2k citations), Atomic and Molecular Physics, and Optics (1.6k citations), Surfaces, Coatings and Films (332 citations) and Computational Mechanics (952 citations). Daniel Flamm has collaborated with scholars based in Germany, United States and South Africa. Frequent co-authors include Vincent M. Donnelly, D. E. Ibbotson, J. A. Mucha, Michael Duparré, D. Manos, C. J. Mogab, Christian Schulze, A. C. Adams, Riccardo d’Agostino and Andrew Forbes. Their work appears in journals such as Journal of Applied Physics, Optics Letters, Optics Express, Environmental Science & Technology and Applied Optics.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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