Daniel Flamm

7.4k citations
152 papers · 6.3k · 2 hit papers · h-index 42

Impact in

Papers in

Daniel Flamm

139 papers receiving 5.7k citations

Daniel Flamm's Hit Papers

Plasma etching : an introduction 1989 · 407 citations
4070+16+32Years since publication100200300400

Peers

Daniel Flamm
Comparison fields: 5 of 101
  • Electrical and Electronic Engineering 4.4k
  • Mechanics of Materials 1.4k
  • Surfaces, Coatings and Films 374
  • Atomic and Molecular Physics, and Optics 1.6k
  • Computational Mechanics 1.1k
Replace А. А. Ионин with:
А. А. Ионин Russia
Kunihide Tachibana Japan
Michael E. Coltrin United States
Richard M. Osgood United States
Kazuto Yamauchi Japan
Herbert H. Sawin United States
J. Perrin France
Uwe Kortshagen United States
Martin Richardson United States
Vincent M. Donnelly United States
Daniel Flamm relative to А. А. Ионин Russia А. А. Ионин's profile →
Citations per field
00.5×1.5×2.2×
А. А. Ионин · 1×
Citations per year

Countries citing papers authored by Daniel Flamm

Since Specialization
Citations

This map shows the geographic impact of Daniel Flamm's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Daniel Flamm with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Daniel Flamm more than expected).

Fields of papers citing papers by Daniel Flamm

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Daniel Flamm. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Daniel Flamm. The network helps show where Daniel Flamm may publish in the future.

Co-authors

The 25 scholars most cited alongside Daniel Flamm, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Daniel Flamm Line = papers co-authored together Daniel Flamm links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown

Showing the 20 most-cited of 152 papers — load more, or switch the sort, to bring in the rest.

#Work
1
Plasma etching of Si and SiO2—The effect of oxygen additions to CF4 plasmas
Hit paper breakdown →
1978479
2
Plasma etching : an introduction
Hit paper breakdown →
1989407
3 1981294
4 1981272
5 1981245
6 1989228
7 2009195
8 1984192
9 1988173
10 1980156
11 1983140
12 1984136
13 2012123
14 1989108
15 2013104
16 198499
17 198299
18 197795
19 199094
20 198493

About Daniel Flamm

Daniel Flamm is a scholar working on Electrical and Electronic Engineering, Computational Mechanics, Atomic and Molecular Physics, and Optics, Biomedical Engineering and Materials Chemistry, having authored 152 papers that have together received 6.3k indexed citations. Recurring topics across this work include Semiconductor materials and devices (40 papers), Plasma Diagnostics and Applications (37 papers), Laser Material Processing Techniques (35 papers), Orbital Angular Momentum in Optics (20 papers), Photonic Crystal and Fiber Optics (19 papers), Advanced Fiber Optic Sensors (17 papers), Diamond and Carbon-based Materials Research (13 papers) and Ion-surface interactions and analysis (12 papers). The work is most often cited by research in Electrical and Electronic Engineering (4.4k citations), Mechanics of Materials (1.4k citations), Surfaces, Coatings and Films (374 citations), Atomic and Molecular Physics, and Optics (1.6k citations) and Computational Mechanics (1.1k citations). Daniel Flamm has collaborated with scholars based in Germany, United States and South Africa. Frequent co-authors include Vincent M. Donnelly, D. E. Ibbotson, J. A. Mucha, Michael Duparré, D. Manos, C. J. Mogab, A. C. Adams, Christian Schulze, Riccardo d’Agostino and Andrew Forbes. Their work appears in journals such as Journal of Applied Physics, Optics Letters, Environmental Science & Technology, Optics Express and Applied Optics.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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